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    HYDRAULIC DRIVE SYSTEM
    6.
    发明申请
    HYDRAULIC DRIVE SYSTEM 有权
    液压驱动系统

    公开(公告)号：US20140123639A1

    公开(公告)日：2014-05-08

    申请号：US14129414

    申请日：2012-08-13

    申请人： Teruo Akiyama ,  Noboru Iida ,  Kenji Oshima ,  Koji Saito

    发明人： Teruo Akiyama ,  Noboru Iida ,  Kenji Oshima ,  Koji Saito

    IPC分类号： F15B15/02

    CPC分类号： F15B15/02 ,  E02F9/2235 ,  E02F9/2289 ,  E02F9/2292 ,  E02F9/2296 ,  F15B21/087 ,  F15B2211/20546 ,  F15B2211/20561 ,  F15B2211/20576 ,  F15B2211/27 ,  F15B2211/613 ,  F15B2211/633 ,  F15B2211/6336 ,  F15B2211/6346 ,  F15B2211/7053 ,  F15B2211/785

    摘要： A hydraulic driving system includes a hydraulic cylinder with a cylinder tube and a cylinder rod, a main pump, a hydraulic-fluid path, a charge pump, a stroke position detecting unit, and a pump control unit. The hydraulic-fluid path forms a closed circuit between a main pump and the hydraulic cylinder. The cylinder rod expands or contracts depending on how hydraulic fluid is supplied and exhausted to and from first and second chambers. The charge pump replenishes hydraulic-fluid in the hydraulic-fluid path. The pump control unit performs flow-rate reduction control in which the pump control unit reduces a suction flow rate so that a suction flow rate of the main pump is equal to or less than a maximum discharge flow rate of the charge pump when the stroke position becomes closer to a stroke end of the cylinder rod than a prescribed reference position during the flow rate reduction control.

    摘要翻译： 液压驱动系统包括具有气缸管和气缸杆的液压缸，主泵，液压流路，充电泵，行程位置检测单元和泵控制单元。 液压路径在主泵和液压缸之间形成闭合回路。 气缸杆根据液压油如何供给和排出到第一和第二室进行膨胀或收缩。 电荷泵补充液压流体路径中的液压流体。 泵控制单元执行流量降低控制，其中，泵控制单元降低吸入流量，使得当泵的行程位置（3）时主泵的吸入流量等于或小于电动泵的最大排出流量 在流量降低控制期间比在规定的基准位置更靠近气缸杆的行程端。

    Abrasive grains classifying apparatus
    7.
    发明授权
    Abrasive grains classifying apparatus 有权
    磨粒分级装置

    公开(公告)号：US08733554B2

    公开(公告)日：2014-05-27

    申请号：US12749774

    申请日：2010-03-30

    申请人： Fumio Sato ,  Takashi Yoshida ,  Toshiya Hirata ,  Koji Saito

    发明人： Fumio Sato ,  Takashi Yoshida ,  Toshiya Hirata ,  Koji Saito

    IPC分类号： B07B13/00 ,  B24B57/00 ,  B07B1/14

    CPC分类号： B07B1/14 ,  B07B2201/04 ,  B24B57/00

    摘要： An abrasive grains classifying apparatus is used to classify abrasive grains based on their sizes that can be determined by distances between mutually opposed surfaces of the respective abrasive grains. The abrasive grains classifying apparatus is provided with: a first gap portion 35 which includes two rollers 24 and 32 disposed at a predetermined distance L2 from each other and also which classifies the abrasive grains 60 into first abrasive grains 60b and 60c capable of passing through between the rollers 24 and 32 and second abrasive grains 60a incapable of passing through between the two rollers 24 and 32; and a second gap portion 54 which includes two rollers 54 and 69 disposed at a distance L3 smaller than the distance L2 in the first gap portion 35 from each other.

    摘要翻译： 磨粒分级装置用于根据其各自的磨粒相互相对的表面之间的距离可确定的尺寸对磨粒进行分类。 磨粒分级装置设置有：第一间隙部分35，其包括彼此以预定距离L2设置的两个辊24和32，并且还将磨粒60分类成能够穿过第二磨粒60b和60c之间的第一磨粒60b和60c 辊24和32以及不能穿过两个辊24和32之间的第二磨料颗粒60a; 以及第二间隙部分54，其包括设置在比第一间隙部分35中的距离L2小的距离L3处的彼此相对的两个辊54和69。

    Cleaning liquid used in photolithography and a method for treating substrate therewith
    8.
    发明授权
    Cleaning liquid used in photolithography and a method for treating substrate therewith 有权
    用于光刻的清洗液及其处理方法

    公开(公告)号：US08685910B2

    公开(公告)日：2014-04-01

    申请号：US12845085

    申请日：2010-07-28

    申请人： Shigeru Yokoi ,  Kazumasa Wakiya ,  Koji Saito

    发明人： Shigeru Yokoi ,  Kazumasa Wakiya ,  Koji Saito

    IPC分类号： C11D7/50 ,  C11D11/00

    CPC分类号： C11D11/0047 ,  C11D1/62 ,  C11D7/3209 ,  C11D7/3281 ,  C11D7/34 ,  G03F7/425 ,  G03F7/426

    摘要： It is disclosed a cleaning liquid for stripping and dissolving a photoresist pattern having a film thickness of 10-150 μm, which contains (a) 0.5-15 mass % of a quaternary ammonium hydroxide, such as tetrapropylammonium hydroxide and tetrabutylammonium hydroxide, (b) 65-97 mass % of a water-soluble organic solvent, such as dimethylsulfoxide or a mixed solvent thereof with N-methyl-2-pyrrolidone, sulforane, etc., and (c) 0.5-30 mass % of water, and a method for treating a substrate therewith.

    摘要翻译： 公开了一种用于剥离和溶解膜厚度为10-150μm的光致抗蚀剂图案的清洗液，其含有（a）0.5-15质量％的季铵氢氧化物，例如四丙基氢氧化铵和四丁基氢氧化铵，（b） 65-97质量％的水溶性有机溶剂，例如二甲基亚砜或其与N-甲基-2-吡咯烷酮，sulforane等的混合溶剂，和（c）0.5-30质量％的水，以及 用于处理基材。

    Photosensitive resin composition and pattern forming method using the same
    9.
    发明授权
    Photosensitive resin composition and pattern forming method using the same 有权
    感光树脂组合物和使用其的图案形成方法

    公开(公告)号：US08617795B2

    公开(公告)日：2013-12-31

    申请号：US12223913

    申请日：2007-02-15

    申请人： Takahiro Senzaki ,  Koichi Misumi ,  Atsushi Yamanouchi ,  Koji Saito

    发明人： Takahiro Senzaki ,  Koichi Misumi ,  Atsushi Yamanouchi ,  Koji Saito

    IPC分类号： G03F7/40 ,  G03F7/004 ,  G03F7/038

    CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/0385

    摘要： Problem: Providing a photosensitive resin composition that has high sensitivity, sustains a slight shrinkage in volume when cured under heating and can form resist patterns having high-aspect profiles, and a pattern forming method using such a composition.Means for Resolution: A photosensitive resin composition characterized by containing (a) a polyfunctional epoxy resin, (b) a cationic polymerization initiator and (c) an aromatic polycyclic compound as a sensitizer (such as 2,3-dihydroxynaphthalene, 1,5-dihydroxynaphthalene or 2,6-dihydroxynaphthalene), which has at least two substituents capable of forming cross-links with component (a).

    摘要翻译： 问题：提供一种具有高灵敏度的感光性树脂组合物，在加热下固化时能够容易地体积收缩，并且可以形成具有高外形轮廓的抗蚀剂图案，以及使用这种组合物的图案形成方法。 解决方法：一种感光性树脂组合物，其特征在于，含有（a）多官能环氧树脂，（b）阳离子聚合引发剂和（c）作为敏化剂的芳香族多环化合物（如2,3-二羟基萘， 二羟基萘或2,6-二羟基萘），其具有至少两个能够与组分（a）形成交联的取代基。

    Chemically amplified positive-type photoresist composition for thick film, chemically amplified dry film for thick film, and method for production of thick film resist pattern
    10.
    发明授权
    Chemically amplified positive-type photoresist composition for thick film, chemically amplified dry film for thick film, and method for production of thick film resist pattern 有权
    用于厚膜的化学放大正型光致抗蚀剂组合物，用于厚膜的化学放大干膜，以及用于生产厚膜抗蚀剂图案的方法

    公开(公告)号：US08507180B2

    公开(公告)日：2013-08-13

    申请号：US12515872

    申请日：2007-10-18

    申请人： Yasushi Washio ,  Kazuhide Uno ,  Koichi Misumi ,  Takahiro Senzaki ,  Koji Saito ,  Nobuko Ohgake

    发明人： Yasushi Washio ,  Mitsuaki Ohgake ,  Kazuhide Uno ,  Koichi Misumi ,  Takahiro Senzaki ,  Koji Saito

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  H01L21/0271

    摘要： Disclosed are a chemically amplified positive-type photoresist composition for a thick film, a chemically amplified dry film for a thick film, and a method for producing a thick film resist pattern, all of which are capable of obtaining a satisfactory resist pattern with high sensitivity even on a substrate having a portion formed of copper on an upper surface thereof. The chemically amplified positive-type photoresist composition for a thick film comprises component (A) which includes at least one compound capable of producing an acid upon irradiation with an actinic ray or radiation, and component (B) which includes at least one resin whose alkali solubility increases by the action of an acid, in which the component (A) includes an onium fluorinated alkyl fluorophosphate having a specific structure.

    摘要翻译： 公开了一种用于厚膜的化学放大正型光致抗蚀剂组合物，用于厚膜的化学放大干膜，以及制造厚膜抗蚀剂图案的方法，所有这些都能够以高灵敏度获得令人满意的抗蚀剂图案 即使在其上表面上具有由铜形成的部分的基板上。 用于厚膜的化学放大正型光致抗蚀剂组合物包含组分（A），其包含至少一种能够在用光化学射线或辐射照射时能够产生酸的化合物，和组分（B），其包含至少一种其碱 通过酸的作用，溶解度增加，其中组分（A）包括具有特定结构的鎓氟化烷基氟磷酸酯。