公开(公告)号：US08812151B2

公开(公告)日：2014-08-19

申请号：US13479518

申请日：2012-05-24

申请人： Teruo Nakata ,  Keita Nogi ,  Satomi Inoue ,  Michinori Kawaguchi

发明人： Teruo Nakata ,  Keita Nogi ,  Satomi Inoue ,  Michinori Kawaguchi

IPC分类号： G06F7/00 ,  G06F19/00

CPC分类号： G05B19/41865 ,  G05B2219/45032 ,  H01L21/67276 ,  Y02P90/18 ,  Y02P90/20

摘要： An efficient method of controlling transportation in a linear tool type vacuum process device in a state that a length of time required for a process is not stable. For each process chamber, the number of unprocessed wafers that are in process or are being transported to the process chamber is counted, and in deciding a transport destination of a wafer, when the number of unprocessed wafers is equal to or larger than a charge limit amount, a transport destination of a wafer is decided excluding the process chamber. Also, a wafer holding mechanism on a transport path to a process chamber is reserved, and a transport destination of a processed member to be transported next is decided according to a status of reservation.

摘要翻译： 一种在线性工具式真空处理装置中控制运输的有效方法，其处理过程所需的时间长度不稳定。 对于每个处理室，计数正在处理或正在运送到处理室的未处理晶片的数量，并且在确定晶片的传送目的地时，当未处理的晶片的数量等于或大于充电极限 除了处理室之外，决定晶片的传送目的地。 此外，保留了到处理室的传送路径上的晶片保持机构，并且根据预约状态来决定随后要传送的被处理部件的传送目的地。

公开(公告)号：US20120303158A1

公开(公告)日：2012-11-29

申请号：US13479518

申请日：2012-05-24

申请人： Teruo NAKATA ,  Keita Nogi ,  Satomi Inoue ,  Michinori Kawaguchi

发明人： Teruo NAKATA ,  Keita Nogi ,  Satomi Inoue ,  Michinori Kawaguchi

IPC分类号： H01L21/677 ,  G06F7/00

CPC分类号： G05B19/41865 ,  G05B2219/45032 ,  H01L21/67276 ,  Y02P90/18 ,  Y02P90/20

摘要： An efficient method of controlling transportation in a linear tool type vacuum process device in a state that a length of time required for a process is not stable. For each process chamber, the number of unprocessed wafers that are in process or are being transported to the process chamber is counted, and in deciding a transport destination of a wafer, when the number of unprocessed wafers is equal to or larger than a charge limit amount, a transport destination of a wafer is decided excluding the process chamber. Also, a wafer holding mechanism on a transport path to a process chamber is reserved, and a transport destination of a processed member to be transported next is decided according to a status of reservation.

摘要翻译： 一种在线性工具式真空处理装置中控制运输的有效方法，其处理过程所需的时间长度不稳定。 对于每个处理室，计数正在处理或正在运送到处理室的未处理晶片的数量，并且在确定晶片的传送目的地时，当未处理的晶片的数量等于或大于充电极限 除了处理室之外，决定晶片的传送目的地。 此外，保留了到处理室的传送路径上的晶片保持机构，并且根据预约状态来决定随后要传送的被处理部件的传送目的地。

公开(公告)号：US20110229289A1

公开(公告)日：2011-09-22

申请号：US13021827

申请日：2011-02-07

申请人： Keita Nogi ,  Hideaki Kondo ,  Susumu Tauchi ,  Teruo Nakata

发明人： Keita Nogi ,  Hideaki Kondo ,  Susumu Tauchi ,  Teruo Nakata

IPC分类号： H01L21/677

CPC分类号： H01L21/67201 ,  H01L21/67745

摘要： The apparatus includes a load lock adapted to store the workpiece inside and to be switched between atmosphere and vacuum; vacuum transport chambers connected to the load lock and to the corresponding process chambers in a state where the load lock and each of the process chambers are isolated mutually; transfer means for transferring the workpiece between each of the process chambers and the load lock via the corresponding vacuum transport chamber; load lock valves adapted to switch between interrupt and opening at a position between the load lock and the corresponding vacuum transport chambers; process chamber valves adapted to switch between interrupt and opening at a position between the process chambers and the corresponding vacuum transport chambers; and control means for controlling timing of the opening and closing of the valves whose timings are controlled in synchronization with the transfer of the workpieces.

摘要翻译： 该装置包括适于将工件存储在大气和真空之间并在大气和真空之间切换的装载锁; 在负载锁定和每个处理室相互隔离的状态下连接到负载锁和相应处理室的真空输送室; 用于通过相应的真空传送室在每个处理室和装载锁之间传送工件的传送装置; 适于在装载锁和相应的真空传送室之间的位置处在中断和打开之间切换的装载锁定阀; 处理室阀适于在处理室和相应的真空输送室之间的位置处在中断和打开之间切换; 以及控制装置，用于控制与工件的传送同步地控制其定时的阀的打开和关闭的定时。

公开(公告)号：US09011065B2

公开(公告)日：2015-04-21

申请号：US12871333

申请日：2010-08-30

申请人： Susumu Tauchi ,  Hideaki Kondo ,  Teruo Nakata ,  Keita Nogi ,  Atsushi Shimoda ,  Takafumi Chida

发明人： Susumu Tauchi ,  Hideaki Kondo ,  Teruo Nakata ,  Keita Nogi ,  Atsushi Shimoda ,  Takafumi Chida

IPC分类号： H01L21/677 ,  H01L21/67

CPC分类号： H01L21/67184 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67745 ,  H01L21/67769 ,  Y10S414/139

摘要： A vacuum processing apparatus which includes an atmospheric transfer chamber having a plurality of cassette stands for transferring a wafer, a lock chamber for storing the wafer, a first vacuum transfer chamber to which the wafer from the lock chamber is transferred, a transfer intermediate chamber connected to the first vacuum transfer chamber, and a second vacuum transfer chamber connected to the transfer intermediate chamber. At least one vacuum processing chamber is connected to the first vacuum transfer chamber, and two or more vacuum processing chambers are connected to a rear side of the second vacuum transfer chamber. A plurality of gate valves are disposed between the first vacuum transfer chamber and each of the lock chamber, the transfer intermediate chamber, and the vacuum processing chamber coupled to the first vacuum transfer chamber. A control unit is also provided for controlling operation of the gate valves.

摘要翻译： 一种真空处理装置，包括具有用于传送晶片的多个盒架的大气传送室，用于存储晶片的锁定室，来自锁定室的晶片被转移到的第一真空传送室，连接到传送中间室 到第一真空传送室，以及连接到传送中间室的第二真空传送室。 至少一个真空处理室连接到第一真空传送室，并且两个或更多个真空处理室连接到第二真空传送室的后侧。 多个闸阀设置在第一真空传送室与联接到第一真空传送室的锁定室，传送中间室和真空处理室中的每一个之间。 还设置有用于控制闸阀的操作的控制单元。

公开(公告)号：US20110218662A1

公开(公告)日：2011-09-08

申请号：US13021888

申请日：2011-02-07

申请人： Teruo Nakata ,  Hideaki Kondo ,  Susumu Tauchi ,  Keita Nogi

发明人： Teruo Nakata ,  Hideaki Kondo ,  Susumu Tauchi ,  Keita Nogi

IPC分类号： G06F19/00

CPC分类号： G06F19/00

摘要： Provided is a method for controlling efficient transferring operations in a vacuum processing apparatus with a linear tool. In the apparatus, plural transferring robots are arranged in transferring mechanism units in which plural process chambers are connected with each other, and to-be-processed wafers are received and passed between plural transferring robots. As the transferring robots is far from the load lock, the number of transferring operations to the process chambers is set larger, the number of times of continuous transferring operations to the process chambers is set as small as possible, and an odd number of times of continuous transferring operations to buffer rooms is set, by a destination determination unit and operation control rules. Further, transferring operations are performed based on the destination determination unit and the operation control rules.

摘要翻译： 提供了一种用于在具有线性工具的真空处理设备中控制有效传送操作的方法。 在该装置中，在多个处理室相互连接的传送机构单元中配置有多个传送机器人，在多个传送机器人之间接收并通过待处理的晶片。 由于传送机器人远离装载锁定，所以将处理室的传送操作的次数设定得较大，对处理室的连续传送操作的次数被设定得尽可能小，并且奇数次 通过目的地确定单元和操作控制规则设置对缓冲室的连续传送操作。 此外，基于目的地确定单元和操作控制规则执行传送操作。

公开(公告)号：US08538573B2

公开(公告)日：2013-09-17

申请号：US13021888

申请日：2011-02-07

申请人： Teruo Nakata ,  Hideaki Kondo ,  Susumu Tauchi ,  Keita Nogi

发明人： Teruo Nakata ,  Hideaki Kondo ,  Susumu Tauchi ,  Keita Nogi

IPC分类号： G06F19/00

CPC分类号： G06F19/00

摘要： Provided is a method for controlling efficient transferring operations in a vacuum processing apparatus with a linear tool. In the apparatus, plural transferring robots are arranged in transferring mechanism units in which plural process chambers are connected with each other, and to-be-processed wafers are received and passed between plural transferring robots. As the transferring robots is far from the load lock, the number of transferring operations to the process chambers is set larger, the number of times of continuous transferring operations to the process chambers is set as small as possible, and an odd number of times of continuous transferring operations to buffer rooms is set, by a destination determination unit and operation control rules. Further, transferring operations are performed based on the destination determination unit and the operation control rules.

摘要翻译： 提供了一种用于在具有线性工具的真空处理设备中控制有效传送操作的方法。 在该装置中，在多个处理室相互连接的传送机构单元中配置有多个传送机器人，在多个传送机器人之间接收并通过待处理的晶片。 由于传送机器人远离装载锁定，所以将处理室的传送操作的次数设定得较大，对处理室的连续传送操作的次数被设定得尽可能小，并且奇数次 通过目的地确定单元和操作控制规则设置对缓冲室的连续传送操作。 此外，基于目的地确定单元和操作控制规则执行传送操作。

公开(公告)号：US20110144792A1

公开(公告)日：2011-06-16

申请号：US12966429

申请日：2010-12-13

申请人： Teruo Nakata ,  Hideaki Kondo ,  Keita Nogi

发明人： Teruo Nakata ,  Hideaki Kondo ,  Keita Nogi

IPC分类号： H01L21/677 ,  G06F19/00

CPC分类号： H01L21/67276 ,  H01L21/67184 ,  H01L21/67748

摘要： In a processing system of a linear tool in which plural carrying robots are arranged in carrying mechanical units to which processing modules are coupled and a processing target is delivered and received between the plural carrying robots, in the case where there are plural carrying routes on which the processing target is carried, the present invention provides a technique for determining the carrying route on which the highest throughput can be obtained.In the processing system of a linear tool, in the case where there are plural carrying routes on which the processing target is carried, the throughputs of the respective carrying routes are compared to each other, and the carrying route is determined by a unit for selecting the carrying route with the highest throughput.

摘要翻译： 在一种线性工具的处理系统中，其中多个运送机器人被布置成承载处理模块耦合的机械单元并且在多个运送机器人之间传送和接收处理目标，在其上有多个运送路线的情况下， 本发明提供了一种用于确定能够获得最高吞吐量的携带路由的技术。 在线性工具的处理系统中，在携带有处理对象的多个承载路径的情况下，将各个携带路线的吞吐量相互比较，并且携带路线由用于选择的单位确定 运输路线最高。

公开(公告)号：US09343340B2

公开(公告)日：2016-05-17

申请号：US13021827

申请日：2011-02-07

申请人： Keita Nogi ,  Hideaki Kondo ,  Susumu Tauchi ,  Teruo Nakata

发明人： Keita Nogi ,  Hideaki Kondo ,  Susumu Tauchi ,  Teruo Nakata

IPC分类号： H01L21/677 ,  H01L21/67

CPC分类号： H01L21/67201 ,  H01L21/67745

摘要： A vacuum processing apparatus is disclosed for processing workpieces. The apparatus includes a load lock adapted to store the workpiece inside and to be switched between atmosphere and vacuum. Vacuum transport chambers are connected to the load lock and to the corresponding process chambers in a state where the load lock and each of the process chambers are isolated. The workpiece can be transferred between each of the process chambers and the load lock via the corresponding vacuum transport chamber. The apparatus also includes load lock valves for switching between interrupt and opening between the load lock and the corresponding vacuum transport chambers, and process chamber valves for switching between interrupt and opening between the process chambers and the corresponding vacuum transport chambers. Timing for opening and closing the valves is controlled in synchronization with the transfer of the workpieces.

摘要翻译： 公开了一种用于处理工件的真空处理装置。 该装置包括适于将工件存储在大气和真空之间并在大气和真空之间切换的负载锁定。 在负载锁定和每个处理室被隔离的状态下，真空输送室连接到负载锁和相应的处理室。 工件可以通过相应的真空输送室在每个处理室和装载锁之间传送。 该装置还包括用于在负载锁和相应的真空输送室之间的中断和开启之间切换的负载锁定阀，以及用于在处理室和相应的真空输送室之间的中断和打开之间切换的处理室阀。 用于打开和关闭阀门的时间与工件的传送同步地控制。

公开(公告)号：US20110110752A1

公开(公告)日：2011-05-12

申请号：US12883602

申请日：2010-09-16

申请人： Susumu TAUCHI ,  Hideaki Kondo ,  Teruo Nakata ,  Keita Nogi ,  Atsushi Shimoda ,  Takafumi Chida

发明人： Susumu TAUCHI ,  Hideaki Kondo ,  Teruo Nakata ,  Keita Nogi ,  Atsushi Shimoda ,  Takafumi Chida

IPC分类号： H01L21/677

CPC分类号： H01L21/67184 ,  H01L21/67196 ,  H01L21/67766 ,  H01L21/67778

摘要： The invention provides a vacuum processing system of a semiconductor processing substrate and a vacuum processing method using the same, comprising an atmospheric transfer chamber having a plurality of cassette stands, a lock chamber arranged on a rear side of the atmospheric transfer chamber, and a first vacuum transfer chamber connected to a rear side of the lock chamber, wherein the first vacuum transfer chamber does not have any vacuum processing chamber connected thereto and has transfer intermediate chambers connected thereto, and the transfer intermediate chambers have subsequent vacuum transfer chambers connected thereto, and wherein the wafers are transferred via the lock chamber to the first vacuum transfer chamber to be processed in each of the subsequent vacuum processing chambers, which are further transferred via any of the transfer intermediate chambers connected to the first vacuum transfer chamber to the subsequent vacuum transfer chambers, and the respective wafers transferred to the subsequent vacuum transfer chambers other than the first vacuum transfer chamber are transferred to the respective vacuum processing chambers connected to each of the vacuum processing chambers and processed therein.

摘要翻译： 本发明提供了一种半导体处理基板的真空处理系统和使用该真空处理方法的真空处理方法，包括具有多个盒架的大气传送室，布置在大气传送室后侧的锁定室，以及第一 真空传送室连接到锁定室的后侧，其中第一真空传送室不具有连接到其上的任何真空处理室，并且具有连接到其上的传送中间室，并且传送中间室具有连接到其上的随后的真空传送室， 其中所述晶片经由所述锁定室传送到所述第一真空传送室，以在随后的每个真空处理室中被处理，所述真空处理室进一步通过连接到所述第一真空传送室的任何转移中间室转移到随后的真空转印 室和相应的晶片tr 推送到除了第一真空转移室之后的后续真空转移室被转移到连接到每个真空处理室的各个真空处理室中并在其中处理。

公开(公告)号：US09385016B2

公开(公告)日：2016-07-05

申请号：US12966429

申请日：2010-12-13

申请人： Teruo Nakata ,  Hideaki Kondo ,  Keita Nogi

发明人： Teruo Nakata ,  Hideaki Kondo ,  Keita Nogi

IPC分类号： H01L21/67 ,  H01L21/677

CPC分类号： H01L21/67276 ,  H01L21/67184 ,  H01L21/67748

摘要： In a processing system of a linear tool in which plural carrying robots are arranged in carrying mechanical units to which processing modules are coupled and a processing target is delivered and received between the plural carrying robots, in the case where there are plural carrying routes on which the processing target is carried, the present invention provides a technique for determining the carrying route on which the highest throughput can be obtained.In the processing system of a linear tool, in the case where there are plural carrying routes on which the processing target is carried, the throughputs of the respective carrying routes are compared to each other, and the carrying route is determined by a unit for selecting the carrying route with the highest throughput.

摘要翻译： 在一种线性工具的处理系统中，其中多个运送机器人被布置成承载处理模块耦合的机械单元并且在多个运送机器人之间传送和接收处理目标，在其上有多个运送路线的情况下， 本发明提供了一种用于确定能够获得最高吞吐量的携带路由的技术。 在线性工具的处理系统中，在携带有处理对象的多个承载路径的情况下，将各个携带路线的吞吐量相互比较，并且携带路线由用于选择的单位确定 运输路线最高。