Coordinate input device
    1.
    发明授权
    Coordinate input device 失效
    坐标输入装置

    公开(公告)号:US4752655A

    公开(公告)日:1988-06-21

    申请号:US798231

    申请日:1985-11-14

    IPC分类号: G06F3/033 G06F3/045 G08C21/00

    CPC分类号: G06F3/045

    摘要: A transparent coordinate input device can be used integrally with a display unit or overlap it and has a coordinate input panel (i.e., a transparent drawing pad). The input panel has a transparent insulating substrate, a flat transparent resistor film of a rectangular shape which is formed on the substrate, and detection electrodes, electrically connected to four sides of the transparent resistor film, for causing a current to flow along one of current flow-in and flow-out directions with respect to the transparent resistor film. The transparent coordinate input device also has a coordinate correction table for storing correction data representing the relationship between the input coordinate signals representing an input position of the electrical pen and the output coordinate signals representing a position and detected by a detector, and an operation circuit for performing coordinate correction by accessing the coordinate correction table.

    摘要翻译: 透明坐标输入装置可以与显示单元一体使用或重叠,并具有坐标输入面板(即透明绘图板)。 输入面板具有透明绝缘基板,形成在基板上的矩形形状的平坦的透明电阻膜以及电连接到透明电阻膜的四侧的检测电极,用于使电流沿着电流流过 相对于透明电阻膜的流入和流出方向。 透明坐标输入装置还具有坐标校正表,用于存储表示表示电笔的输入位置的输入坐标信号与表示位置并由检测器检测的输出坐标信号之间的关系的校正数据,以及用于 通过访问坐标校正表执行坐标校正。

    Method for manufacturing semiconductor device
    4.
    发明授权
    Method for manufacturing semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US08859330B2

    公开(公告)日:2014-10-14

    申请号:US13419468

    申请日:2012-03-14

    摘要: A semiconductor device including an oxide semiconductor, which has stable electric characteristics and high reliability, is provided. In a method for manufacturing a transistor including an oxide semiconductor film, an implantation step where rare gas ions are implanted to the oxide semiconductor film is performed, and the oxide semiconductor film to which rare gas ions are implanted is subjected to a heating step under reduced pressure, in a nitrogen atmosphere, or in a rare gas atmosphere, whereby hydrogen or water contained in the oxide semiconductor film to which rare gas ions are implanted is released; thus, the oxide semiconductor film is highly purified.

    摘要翻译: 提供了包括具有稳定的电特性和高可靠性的氧化物半导体的半导体器件。 在制造包括氧化物半导体膜的晶体管的方法中,执行将稀有气体离子注入到氧化物半导体膜中的注入步骤,并且将减少稀有气体离子的氧化物半导体膜在减小的温度下进行加热步骤 压力,在氮气气氛中或在稀有气体气氛中,由此释放在其中植入稀有气体离子的氧化物半导体膜中所含的氢或水; 因此,氧化物半导体膜被高度纯化。

    Method for processing oxide semiconductor film and method for manufacturing semiconductor device
    5.
    发明授权
    Method for processing oxide semiconductor film and method for manufacturing semiconductor device 有权
    氧化物半导体膜的制造方法及半导体装置的制造方法

    公开(公告)号:US08716073B2

    公开(公告)日:2014-05-06

    申请号:US13547451

    申请日:2012-07-12

    IPC分类号: H01L21/336

    摘要: To provide an oxide semiconductor film including a low-resistance region, which can be applied to a transistor. To provide a transistor including the oxide semiconductor film, which can perform at high speed. To provide a high-performance semiconductor device including the transistor including the oxide semiconductor film, which can perform at high speed, with high yield. A film having a reducing property is formed over the oxide semiconductor film. Next, part of oxygen atoms are transferred from the oxide semiconductor film to the film having a reducing property. Next, an impurity is added to the oxide semiconductor film through the film having a reducing property and then, the film having a reducing property is removed, so that a low-resistance region is formed in the oxide semiconductor film.

    摘要翻译: 提供一种可以应用于晶体管的包含低电阻区域的氧化物半导体膜。 提供可以高速执行的包括氧化物半导体膜的晶体管。 提供一种高性能半导体器件,其包括能够以高产率高速执行的包括氧化物半导体膜的晶体管。 在氧化物半导体膜上形成具有还原性的膜。 接下来,氧原子的一部分从氧化物半导体膜转移到具有还原性的膜。 接下来,通过具有还原性的膜向氧化物半导体膜添加杂质,然后去除具有还原性的膜,从而在氧化物半导体膜中形成低电阻区域。

    Alloy with high glass forming ability and alloy-plated metal material using same
    6.
    发明授权
    Alloy with high glass forming ability and alloy-plated metal material using same 有权
    具有高玻璃形成能力的合金和使用其的合金镀金属材料

    公开(公告)号:US08637163B2

    公开(公告)日:2014-01-28

    申请号:US12309391

    申请日:2007-07-19

    IPC分类号: B32B15/00 B32B15/18 C22C18/00

    摘要: An alloy with a high glass forming ability characterized by containing a group of elements A with atomic radii of less than 0.145 nm of a total of 20 to 85 atm %, a group of elements B with atomic radii of 0.145 nm to less than 0.17 nm of a total of 10 to 79.7 atm %, and a group of elements C with atomic radii of 0.17 nm or more of a total of 0.3 to 15 atm %; when the elements with the greatest contents in the group of elements A, group of elements B, and group of elements C are respectively designated as the “element a”, “element b”, and “element c”, by the ratio of the content of the element a in the group of elements A (for example, Zn and/or Al), the ratio of the content of the element b in the group of elements B (for example, Mg), and the ratio of the content of the element c in the group of elements C (for example, Ca) all being 70 atm % or more; and by the liquid forming enthalpy between any two elements selected from the element a, element b, and element c being negative.

    摘要翻译: 具有高玻璃形成能力的合金,其特征在于含有一组元素A,原子半径小于0.145nm,总数为20至85atm%的元素A,原子半径为0.145nm至小于0.17nm的元素B 总计为10〜79.7atm%,原子半径为0.17nm以上的元素C为0.3〜15atm%的组合; 当元素A,元素组B和元素C组中具有最大含量的元素分别被指定为“元素a”,“元素b”和“元素c”时,以 元素A(例如Zn和/或Al)中的元素a的含量,元素B的元素B的含量(例如Mg)的含量与含量的比例 元素C(例如Ca)中的元素c全部为70atm%以上; 并且通过在从元件a,元件b和元件c中选择的任何两个元件之间的液体形成焓是负的。

    Flush toilet
    7.
    发明授权
    Flush toilet 有权
    抽水马桶

    公开(公告)号:US08418277B2

    公开(公告)日:2013-04-16

    申请号:US12438965

    申请日:2007-08-29

    IPC分类号: E03D11/00

    CPC分类号: E03D5/01 E03D5/10 E03D2201/30

    摘要: A flush toilet in which an appropriate amount of water is supplied and that can be installed in an area where water pressure is low. The flush toilet is flushed with pressurized flush water and has a flush toilet body having a bowl and a drain trap pipe path; a pressurizing pump for pressurizing flush water to be jetted out; a water storage tank for storing flush water to be pressurized; flush control means for causing rim water discharge to be performed for a predetermined rim water discharge time by water supply pressure of running water and also causing jet water discharge to be made to flush the bowl; flush water replenishing means for replenishing, after the bowl is flushed, flush water to the water storage tank from the running water to thereby return the amount of flush water stored in the water storage tank to a specified level; timing means for measuring a water replenishing time after the flush water replenishing is started until the amount of flush water stored in the water storage tank return to the specified level; and water discharge time regulation means for regulating the rim water discharge time based on the water replenishing time.

    摘要翻译: 一种冲水马桶,其中供应适量的水,并且可以安装在水压较低的区域。 冲水马桶用加压冲洗水冲洗,并具有带有碗和排水管道通道的抽水马桶主体; 用于对冲洗水进行加压以加压的加压泵; 用于储存冲洗水以加压的储水箱; 冲洗控制装置,用于通过自来水的供水压力使预定的轮辋排水时间进行轮辋排水,并且还引起喷射水排出以冲洗碗; 冲洗水补充装置,在碗被冲洗后,从自来水冲洗水到储水箱,从而将存储在储水箱中的冲洗水量返回到指定水平; 定时装置,用于在开始冲洗水补充之后测量补水时间,直到储存在储水箱中的冲洗水量达到指定水平; 和排水时间调节装置,用于根据补水时间调节轮辋排水时间。

    POSITIVE ELECTRODE MATERIAL FOR ELECTRICAL DEVICE, AND ELECTRICAL DEVICE PRODUCED USING SAME
    8.
    发明申请
    POSITIVE ELECTRODE MATERIAL FOR ELECTRICAL DEVICE, AND ELECTRICAL DEVICE PRODUCED USING SAME 有权
    用于电气设备的正极电极材料和使用其制造的电气设备

    公开(公告)号:US20120228544A1

    公开(公告)日:2012-09-13

    申请号:US13513051

    申请日:2010-12-02

    IPC分类号: H01M4/525

    CPC分类号: H01M4/525 H01M4/505

    摘要: [Problems to be Solved] Provided is a positive electrode material for an electrical device, which has high capacity and improved initial charge-discharge efficiency.[Means for Solving the Problem] Disclosed is a positive electrode material for an electrical device, which is represented by the formula (1): aLi[Li1/3Mn2/3]O2.(1−a)Li[NixCoyMn1-x-y]O2  (1) (wherein, 0

    摘要翻译: [待解决的问题]提供一种具有高容量,提高初期充放电效率的电气装置用正极材料。 解决问题的手段公开了由式(1)表示的电气装置用正极材料:aLi [Li1 / 3Mn2 / 3] O2。(1-a)Li [NixCoyMn1-xy] O2 (1)(其中0