摘要:
As improved corrosion inhibitors, reaction products of alkylene oxides and blocked phenols wherein two substituents of the phenol are non-oxyalkylatable, saturated tertiary-amino alkylene groups, and acid-stable salts of these products.
摘要:
A light-sensitive composition comprising novel arylglyoxyalkyl acrylates that exhibits useful light sensitivity. The basic structure of the new compositions, which may also themselves be polymerized are as follows: ##STR1## wherein Ar represents an aromatic structure selected from the group consisting of benzene, naphthalene and substituted products of each, R.sub.1 represents an alkyl group having from one to ten carbon atoms, R.sub.2 represents a grouping selected from the group consisting of hydrogen, or a lower alkyl group having from one to five carbon atoms and R.sub.3 represents an alkenyl group having from one to ten carbon atoms and singular unsaturation. The light-sensitive compositions may themselves be utilized in photochemistry as photopolymers, they may be combined with suitable solvents and additives or polymerized with suitable backbone polymers to provide substances which can be used as light-sensitive coatings. These coatings may be placed on substrates and in one instance as presensitized lithographic plates.
摘要:
A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
摘要:
A photopolymerizable system is provided as a latex system that is an oil-in-water polymer emulsion including particulates of water-insoluble polymers in combination with a water-soluble or water-dispersible, light-sensitive polymer having multiple light-sensitive moieties. Prior to coating onto a substrate, the system is a three-phase precursor emulsion of the emulsion particulates, the water phase, and the light-sensitive polymer. After coating, the bulk of the water phase is evaporated off, leaving a two-phase system of the emulsion particulates surrounded by the light-sensitive polymer. When selected areas are subjected to actinic radiation, a water-insoluble matrix is formed, the matrix containing cross-linked light-sensitive polymer having dispersed therethrough and/or included therein the water-insoluble polymer particulates, thus forming oleophilic image areas. Those portions of the system that were not subjected to actinic radiation are then readily washed from the coated item to form the hydrophilic, non-image areas.
摘要:
A photoreactive composition containing an effective amount of a compound having at least two alkoxyaromaticglyoxy substituents per molecule, which substituents have the following general formula: ##EQU1## wherein R is selected from the class consisting of H, aryl, alkyl, halo and arakyl having up to 10 carbon atoms, n is an integer from 1 to 18, Ar is an aromatic substituent, and M is selected from the class consisting of H, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
摘要:
A light-sensitive composition comprising novel arylglyoxyalkyl acrylates that exhibits useful light sensitivity. The basic structure of the new compositions, which may also themselves be polymerized are as follows: ##EQU1## wherein Ar represents an aromatic structure selected from the group consisting of benzene, naphthalene and substituted products of each, R.sub.1 represents an alkyl group having from one to ten carbon atoms, R.sub.2 represents a grouping selected from the group consisting of hydrogen, or a lower alkyl group having from one to five carbon atoms and R.sub.3 represents an alkenyl group having from one to 10 carbon atoms and singular unsaturation. The light-sensitive compositions may themselves be utilized in photochemistry as photopolymers, they may be combined with suitable solvents and additives or polymerized with suitable backbone polymers to provide substances which can be used as light-sensitive coatings. These coatings may be placed on substrates and in one instance as presensitized lithographic plates.
摘要:
A photopolymerizable system is provided as a latex system that is an oil-in-water polymer emulsion including particulates of water-insoluble polymers in combination with a water-soluble or water-dispersible, light-sensitive polymer having multiple light-sensitive moieties. Prior to coating onto a substrate, the system is a three-phase precursor emulsion of the emulsion particulates, the water phase, and the light-sensitive polymer. After coating, the bulk of the water phase is evaporated off, leaving a two-phase system of the emulsion particulates surrounded by the light-sensitive polymer. When selected areas are subjected to actinic radiation, a water-insoluble matrix is formed, the matrix containing cross-linked light-sensitive polymer having dispersed therethrough and/or included therein the water-insoluble polymer particulates, thus forming oleophilic image areas. Those portions of the system that were not subjected to actinic radiation are then readily washed from the coated item to form the hydrophilic, non-image areas.
摘要:
A photoreactive coating composition, particularly suited for use in a lithographic plate, is characterized by both reduced exposure time requirements and an intense visual image which is immediately produced upon exposure of the composition to light permitting visual inspection during imaging. The photoreactive composition has a diazo resin layer and an overlayer which includes a photochromic compound (e.g. an indolinobenzospiropyran compound) and a light sensitive polymer selected from the group cinnamoylated and acrylated photopolymer resins.
摘要:
A light-sensitive composition comprising novel arylglyoxyalkyl acrylates that exhibits useful light sensitivity. The basic structure of the new compositions, which may also themselves be polymerized are as follows: ##STR1## wherein Ar represents an aromatic structure selected from the group consisting of benzene, naphthalene and substituted products of each, R.sub.1 represents an alkyl group having from one to ten carbon atoms, R.sub.2 represents a grouping selected from the group consisting of hydrogen, or a lower alkyl group having from one to five carbon atoms and R.sub.3 represents an alkenyl group having from one to ten carbon atoms and singular unsaturation. The light-sensitive compositions may themselves be utilized in photochemistry as photopolymers, they may be combined with suitable solvents and additives or polymerized with suitable backbone polymers to provide substances which can be used as light-sensitive coatings. These coatings may be placed on substrates and in one instance as presensitized lithographic plates.
摘要:
Compositions comprising the reaction product of a novel, highly branched polyalkylenimine-urea-aldehyde resin and a polyacrylic resin provide useful intermediate coatings when applied to preconditioned metal surfaces which may be subsequently coated with light sensitive materials to make photolithographic plates. The intermediate coating, particularly when applied to a grained or ungrained aluminum support member which has been anodized and finally coated with light sensitive materials produces a highly durable plate that possesses good storage characteristics and is capable of unusually extended press runs.