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    Lithographic apparatus and apparatus adjustment method
    4.
    发明申请
    Lithographic apparatus and apparatus adjustment method 有权
    平版印刷设备和设备调整方法

    公开(公告)号：US20050061995A1

    公开(公告)日：2005-03-24

    申请号：US10915702

    申请日：2004-08-11

    申请人： Jacob Vink ,  Sjoerd Donders ,  Theodorus Modderman ,  Theodorus Cadee

    发明人： Jacob Vink ,  Sjoerd Donders ,  Theodorus Modderman ,  Theodorus Cadee

    IPC分类号： H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  G21G5/00

    CPC分类号： G03F7/707 ,  G03F7/70783 ,  G03F7/70925 ,  G03F7/70975

    摘要： A lithographic projection apparatus includes a beam production system for projecting a patterned beam of radiation onto a target portion of a substrate, and a support table for supporting an article. The support table has a support surface and an array of protrusions extending from the support surface to support the article on the protrusions. The apparatus also includes a detector for detecting height deviations of the protrusions that affect a surface flatness of the article, a height adjustment device arranged to independently modify a height of the individual protrusions when the support table is operable in the apparatus, and a controller coupled between the detector and the height adjustment device and arranged to control the height adjustment device to adjust the height of the protrusions corresponding to the detected height deviations of the protrusions that affect the surface flatness of the article.

    摘要翻译： 光刻投影装置包括用于将图案化的辐射束投射到基板的目标部分上的光束产生系统和用于支撑物品的支撑台。 支撑台具有从支撑表面延伸的支撑表面和突出的阵列，以将物品支撑在突起上。 该装置还包括检测器，用于检测影响物品的表面平坦度的突起的高度偏差;高度调节装置，其布置成当支撑台在装置中可操作时独立地改变各个突起的高度;以及控制器 在所述检测器和所述高度调节装置之间，并布置成控制所述高度调节装置，以根据检测到的突出物的高度偏差来调节所述突起的高度，所述高度偏差影响所述物品的表面平坦度。

    Lithographic projection apparatus and actuator
    5.
    发明申请
    Lithographic projection apparatus and actuator 有权
    平版印刷设备和执行机构

    公开(公告)号：US20060119810A1

    公开(公告)日：2006-06-08

    申请号：US11006821

    申请日：2004-12-08

    申请人： Theodorus Cadee

    发明人： Theodorus Cadee

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70341 ,  F16F6/00 ,  F16F15/00 ,  F16F15/03 ,  G03F7/709 ,  H01J37/3056

    摘要： A lithographic projection apparatus is disclosed. The apparatus includes a substrate support constructed to support a substrate, a projection system configured to project a patterned radiation beam onto a target portion of the substrate, and a frame onto which at least a part of the projection system is mounted. A fluid provider is arranged to provide a fluid between the substrate and a downstream end of the projection system. The apparatus also includes an actuator associated with the frame and with the fluid provider and arranged to position the fluid provider, and a cushion system for cushioning vibrational forces when the actuator positions the fluid provider.

    摘要翻译： 公开了一种光刻投影装置。 该装置包括构造成支撑基板的基板支撑件，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，以及安装投影系统的至少一部分的框架。 流体供应器被布置成在基板和投影系统的下游端之间提供流体。 该装置还包括与框架相关联并与流体提供者相关联并且被布置成定位流体提供者的致动器，以及用于当致动器定位流体供应器时缓冲振动力的缓冲系统。

    Lithographic apparatus and device manufacturing method
    6.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20060197036A1

    公开(公告)日：2006-09-07

    申请号：US11062773

    申请日：2005-02-22

    申请人： Ronald Walther Severijns ,  Marcel Johannus Hubertus Muitjens ,  Sonia Skelly ,  Theodorus Cadee

    发明人： Ronald Walther Severijns ,  Marcel Johannus Hubertus Muitjens ,  Sonia Skelly ,  Theodorus Cadee

    IPC分类号： G21G5/00 ,  A61N5/00

    CPC分类号： G03F7/707

    摘要： A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; a gas pressure controlled article clamp for clamping an article to be placed in a beam path of the projection beam of radiation; and a pressure circuit for controlling the article clamp, comprising a supply line for connection with the article clamp. According to the invention, a buffer volume is provided for providing a buffered gas pressure pulse in the supply line. In this way, faster clamp response times can be realized.

    摘要翻译： 一种光刻设备，包括：用于提供投射辐射束的照明系统; 气体压力控制物品夹具，用于夹紧要放置在投影射线束的光束路径中的物品; 以及用于控制物品夹具的压力回路，包括用于与物品夹具连接的供应管线。 根据本发明，提供缓冲体积以在供应管线中提供缓冲的气体压力脉冲。 以这种方式，可以实现更快的钳位响应时间。