公开(公告)号：US11699608B2

公开(公告)日：2023-07-11

申请号：US16487533

申请日：2018-02-15

Applicant: Tokyo Electron Limited

Inventor： Akihiro Matsumoto ,  Michiaki Matsushita ,  Akira Murata ,  Minoru Tashiro

IPC: H01L21/673 ,  B65G49/05 ,  H01L21/677

CPC classification number: H01L21/67386 ,  B65G49/05 ,  H01L21/67373 ,  H01L21/67393 ,  H01L21/67772

Abstract: A substrate storage apparatus includes a stage on which a cassette that has a lid detachably mounted to an opening is disposed, a lid attaching/detaching plate that performs attaching/detaching of the lid to/from the opening of the cassette disposed on the stage, and is provided to be movable between a mounting position in contact with the lid disposed at a position of the opening and a retracted position not in contact with the lid disposed at the position of the opening, a lid holding sensor that detects whether the lid is being held by the lid attaching/detaching plate, and a controller that determines presence/absence of abnormality related to attachment/detachment of the lid based on a detection result of the lid holding sensor.

公开(公告)号：US20140234058A1

公开(公告)日：2014-08-21

申请号：US14183651

申请日：2014-02-19

Applicant: Tokyo Electron Limited

Inventor： Akira Murata ,  Katsuhiro Morikawa ,  Issei Ueda

IPC: H01L21/673

CPC classification number: H01L21/67265

Abstract: A substrate can be appropriately accommodated in a cassette. A substrate transfer device includes a substrate transfer unit that delivers the substrate with respect to the cassette configured to accommodate the substrate; a detection unit that detects the substrate accommodated in the cassette; and a control device than controls the substrate transfer unit. Further, the control device includes a transfer control unit configured to control the substrate transfer unit to accommodate the substrate at a predetermined target accommodation position; a determination unit configured to determine an actual accommodation position for the substrate based on a detection result of the detection unit after the detection unit detects the substrate accommodated in the cassette; and a correction unit configured to correct a predetermined target accommodation position as an accommodation position for another substrate based on a difference between the actual accommodation position and the target accommodation position for the substrate.

Abstract translation: 衬底可以适当地容纳在盒中。 衬底传送装置包括：衬底传送单元，其相对于被配置为容纳衬底的盒子传送衬底; 检测单元，其检测容纳在所述盒中的所述基板; 以及控制装置而不是控制衬底转移单元。 此外，控制装置包括传送控制单元，其被配置为控制基板传送单元以将基板容纳在预定的目标收纳位置; 确定单元，被配置为在所述检测单元检测到容纳在所述盒中的所述基板之后，基于所述检测单元的检测结果来确定所述基板的实际收纳位置; 以及校正单元，被配置为基于所述实际收纳位置和所述基板的所述目标收纳位置之间的差异，将预定的目标收纳位置校正为用于另一基板的收纳位置。

公开(公告)号：US09666463B2

公开(公告)日：2017-05-30

申请号：US14580703

申请日：2014-12-23

Applicant: Tokyo Electron Limited

Inventor： Katsuhiro Morikawa ,  Issei Ueda ,  Akira Murata ,  Junya Minamida

IPC: H01L21/677 ,  H01L21/67

CPC classification number: H01L21/67742 ,  H01L21/67178 ,  H01L21/67754 ,  H01L21/67757

Abstract: A throughput can be improved. A substrate processing apparatus includes processing units arranged in a vertical direction and configured to process substrates; and a substrate transfer device configured to be moved in the vertical direction and perform loading/unloading of the substrates into/from the processing units. Further, the substrate transfer device comprises a first transfer arm and a second transfer arm which are arranged in the vertical direction and configured to be moved in the vertical direction independently, and movement ranges of the first transfer arm and the second transfer arm in the vertical direction are overlapped with each other.

公开(公告)号：US09373531B2

公开(公告)日：2016-06-21

申请号：US14183651

申请日：2014-02-19

Applicant: Tokyo Electron Limited

Inventor： Akira Murata ,  Katsuhiro Morikawa ,  Issei Ueda

IPC: H01L21/67

CPC classification number: H01L21/67265

Abstract: A substrate can be appropriately accommodated in a cassette. A substrate transfer device includes a substrate transfer unit that delivers the substrate with respect to the cassette configured to accommodate the substrate; a detection unit that detects the substrate accommodated in the cassette; and a control device than controls the substrate transfer unit. Further, the control device includes a transfer control unit configured to control the substrate transfer unit to accommodate the substrate at a predetermined target accommodation position; a determination unit configured to determine an actual accommodation position for the substrate based on a detection result of the detection unit after the detection unit detects the substrate accommodated in the cassette; and a correction unit configured to correct a predetermined target accommodation position as an accommodation position for another substrate based on a difference between the actual accommodation position and the target accommodation position for the substrate.

Abstract translation: 衬底可以适当地容纳在盒中。 衬底传送装置包括：衬底传送单元，其相对于被配置为容纳衬底的盒子传送衬底; 检测单元，其检测容纳在所述盒中的所述基板; 以及控制装置而不是控制衬底转移单元。 此外，控制装置包括传送控制单元，其被配置为控制基板传送单元以将基板容纳在预定的目标收纳位置; 确定单元，被配置为在所述检测单元检测到容纳在所述盒中的所述基板之后，基于所述检测单元的检测结果来确定所述基板的实际收纳位置; 以及校正单元，被配置为基于所述实际收纳位置和所述基板的所述目标收纳位置之间的差异，将预定的目标收纳位置校正为用于另一基板的收纳位置。

公开(公告)号：US20180010252A1

公开(公告)日：2018-01-11

申请号：US15635388

申请日：2017-06-28

Applicant: Tokyo Electron Limited

Inventor： Akira Murata ,  Satoshi Kaneko ,  Kazuki Motomatsu ,  Kazunori Sakamoto

IPC: C23C18/16

Abstract: A substrate processing apparatus can suppress particle generation on a substrate, and can reduce a consumption amount of a processing liquid. A substrate processing apparatus 1 includes a processing chamber 30 having a processing space 31 in which a substrate W is processed; a vaporizing tank 60, configured to store the processing liquid therein, having a vaporization space 61 in which the stored processing liquid is allowed to be vaporized; a decompression driving unit 70 configured to decompress the vaporization space 61; and a control unit 18. The control unit 18 vaporizes the processing liquid into the processing gas by decompressing the vaporization space 61 without through the processing space 31, and then, vaporizes the processing liquid into the processing gas by decompressing the vaporization space 61 through the processing space 31, and supplies an inert gas into the vaporization space 61.

公开(公告)号：US10689762B2

公开(公告)日：2020-06-23

申请号：US15635388

申请日：2017-06-28

Applicant: Tokyo Electron Limited

Inventor： Akira Murata ,  Satoshi Kaneko ,  Kazuki Motomatsu ,  Kazunori Sakamoto

IPC: C23C18/16 ,  H01L21/67 ,  H01L21/687 ,  H01L21/677 ,  C23C18/18

Abstract: A substrate processing apparatus can suppress particle generation on a substrate, and can reduce a consumption amount of a processing liquid. A substrate processing apparatus 1 includes a processing chamber 30 having a processing space 31 in which a substrate W is processed; a vaporizing tank 60, configured to store the processing liquid therein, having a vaporization space 61 in which the stored processing liquid is allowed to be vaporized; a decompression driving unit 70 configured to decompress the vaporization space 61; and a control unit 18. The control unit 18 vaporizes the processing liquid into the processing gas by decompressing the vaporization space 61 without through the processing space 31, and then, vaporizes the processing liquid into the processing gas by decompressing the vaporization space 61 through the processing space 31, and supplies an inert gas into the vaporization space 61.

公开(公告)号：US20150187621A1

公开(公告)日：2015-07-02

申请号：US14580703

申请日：2014-12-23

Applicant: Tokyo Electron Limited

Inventor： Katsuhiro Morikawa ,  Issei Ueda ,  Akira Murata ,  Junya Minamida

IPC: H01L21/677 ,  H01L21/683 ,  H01L21/67

CPC classification number: H01L21/67742 ,  H01L21/67178 ,  H01L21/67754 ,  H01L21/67757

Abstract: A throughput can be improved. A substrate processing apparatus includes processing units arranged in a vertical direction and configured to process substrates; and a substrate transfer device configured to be moved in the vertical direction and perform loading/unloading of the substrates into/from the processing units. Further, the substrate transfer device comprises a first transfer arm and a second transfer arm which are arranged in the vertical direction and configured to be moved in the vertical direction independently, and movement ranges of the first transfer arm and the second transfer arm in the vertical direction are overlapped with each other.

Abstract translation: 可以提高吞吐量。 衬底处理设备包括沿垂直方向布置并被配置为处理衬底的处理单元; 以及基板输送装置，其构造成在垂直方向上移动，并且将基板装载/卸载到处理单元中。 此外，基板转印装置包括沿垂直方向布置并且被构造成独立地在垂直方向上移动的第一传送臂和第二传送臂，以及第一传送臂和第二传送臂在垂直方向上的移动范围 方向相互重叠。