公开(公告)号：US20150107631A1

公开(公告)日：2015-04-23

申请号：US14580787

申请日：2014-12-23

Applicant: Tokyo Electron Limited

Inventor： Takao Inada ,  Naoyuki Okamura ,  Hidetsugu Yano ,  Yosuke Hachiya

IPC: H01L21/67

CPC classification number: H01L21/67028 ,  H01L21/67017 ,  H01L21/67051 ,  Y10S134/902

Abstract: A liquid processing method is provided for performing a liquid process on a front surface of a substrate by using a processing solution and then performing a rinse process on the front surface of the substrate by using a rinse solution having a temperature lower than a temperature of the processing solution. The method includes performing an intermediate process between the liquid process and the rinse process, for adjusting a temperature of the front surface of the substrate to a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution. In the intermediate process, an intermediate processing solution having a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution is supplied only to a rear surface of the substrate.

Abstract translation: 提供一种液体处理方法，用于通过使用处理溶液在基板的前表面上进行液体处理，然后通过使用温度低于基板的温度的冲洗溶液在基板的前表面上进行冲洗处理 处理方案。 该方法包括在液体处理和漂洗过程之间执行中间过程，用于将衬底的前表面的温度调节到高于冲洗溶液的温度并低于处理溶液的温度的温度。 在中间方法中，将仅具有比冲洗溶液的温度高且低于处理液的温度的中间处理液供给到基板的背面。

公开(公告)号：US09224624B2

公开(公告)日：2015-12-29

申请号：US14580787

申请日：2014-12-23

Applicant: Tokyo Electron Limited

Inventor： Takao Inada ,  Naoyuki Okamura ,  Hidetsugu Yano ,  Yosuke Hachiya

IPC: B08B7/00 ,  B08B3/00 ,  B08B7/04 ,  H01L21/67

CPC classification number: H01L21/67028 ,  H01L21/67017 ,  H01L21/67051 ,  Y10S134/902

Abstract: A liquid processing method is provided for performing a liquid process on a front surface of a substrate by using a processing solution and then performing a rinse process on the front surface of the substrate by using a rinse solution having a temperature lower than a temperature of the processing solution. The method includes performing an intermediate process between the liquid process and the rinse process, for adjusting a temperature of the front surface of the substrate to a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution. In the intermediate process, an intermediate processing solution having a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution is supplied only to a rear surface of the substrate.

Abstract translation: 提供一种液体处理方法，用于通过使用处理溶液在基板的前表面上进行液体处理，然后通过使用温度低于基板的温度的冲洗溶液在基板的前表面上进行冲洗处理 处理方案。 该方法包括在液体处理和漂洗过程之间执行中间过程，用于将衬底的前表面的温度调节到高于冲洗溶液的温度并低于处理溶液的温度的温度。 在中间方法中，将仅具有比冲洗溶液的温度高且低于处理液的温度的中间处理液供给到基板的背面。

公开(公告)号：US09721813B2

公开(公告)日：2017-08-01

申请号：US13937306

申请日：2013-07-09

Applicant: Tokyo Electron Limited

Inventor： Nobuhiro Ogata ,  Hiromi Kiyose ,  Hidetsugu Yano ,  Tsukasa Hirayama

IPC: H01L21/00 ,  B08B13/00 ,  B08B3/04 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67051 ,  B08B3/04 ,  B08B13/00 ,  H01L21/68735

Abstract: The present disclosure provides a cleaning method which enables a cup and a member around the cup to be cleaned thoroughly. In this cleaning method, a cleaning liquid is supplied to a cleaning jig from the upper side of the cleaning jig while rotating the cleaning jig held by a substrate holding unit. The cleaning liquid supplied to the cleaning jig is scattered obliquely upward along an inclined surface of an inclined portion which is provided around the entire circumference of the cleaning jig in the vicinity of the outer circumferential edge of the cleaning jig, thereby cleaning cups.

公开(公告)号：US20140014134A1

公开(公告)日：2014-01-16

申请号：US13937306

申请日：2013-07-09

Applicant: Tokyo Electron Limited

Inventor： Nobuhiro Ogata ,  Hiromi Kiyose ,  Hidetsugu Yano ,  Tsukasa Hirayama

IPC: B08B3/04 ,  B08B13/00

CPC classification number: H01L21/67051 ,  B08B3/04 ,  B08B13/00 ,  H01L21/68735

Abstract: The present disclosure provides a cleaning method which enables a cup and a member around the cup to be cleaned thoroughly. In this cleaning method, a cleaning liquid is supplied to a cleaning jig from the upper side of the cleaning jig while rotating the cleaning jig held by a substrate holding unit. The cleaning liquid supplied to the cleaning jig is scattered obliquely upward along an inclined surface of an inclined portion which is provided around the entire circumference of the cleaning jig in the vicinity of the outer circumferential edge of the cleaning jig, thereby cleaning cups.

Abstract translation: 本公开提供一种清洁方法，其能够使杯和杯周围的构件被彻底清洁。 在这种清洁方法中，从旋转由基板保持单元保持的清洁夹具旋转的同时，将清洗液从清洁夹具的上侧供给到清洁夹具。 提供给清洁夹具的清洗液体沿着清洁夹具的整个周边设置在清洁夹具的外周边缘附近的倾斜部分的倾斜表面上倾斜向上散布，从而清洁杯子。