公开(公告)号：US12007692B2

公开(公告)日：2024-06-11

申请号：US18077577

申请日：2022-12-08

Applicant: Tokyo Electron Limited

Inventor： Hiroki Sakurai ,  Nobuhiro Ogata ,  Daisuke Goto ,  Kanta Mori ,  Kenji Yada ,  Yusuke Hashimoto ,  Shoki Mizuguchi ,  Yenrui Hsu

IPC: G03F7/30 ,  G03F7/42

CPC classification number: G03F7/3021 ,  G03F7/426

Abstract: A nozzle that mixes fluid containing steam or mist of pressurized pure water and processing liquid containing at least sulfuric acid and ejects mixed fluid of the fluid and the processing liquid, the nozzle comprising: at least one first ejection port ejecting the fluid; at least one second ejection port ejecting the processing liquid; and at least one lead-out path being in fluid communication with the at least one first ejection port and the at least one second ejection port and leading out the mixed fluid of the fluid ejected from the at least one first ejection port and the processing liquid ejected from the at least one second ejection port, wherein the at least one first ejection port or the at least one second ejection port is arranged to be directed to position deviated from central axis of the at least one lead-out path in a plan view.

公开(公告)号：US20230001458A1

公开(公告)日：2023-01-05

申请号：US17810385

申请日：2022-07-01

Applicant: Tokyo Electron Limited

Inventor： Yusuke Hashimoto ,  Daisuke Goto ,  Kanta Mori ,  Jiro Higashijima ,  Nobuhiro Ogata

IPC: B08B3/04 ,  B05B1/10 ,  B08B3/08

Abstract: A substrate processing apparatus includes a holder configured to hold a substrate; a driving unit configured to rotate the holder; an inner cup body provided in the holder to surround the substrate held by the holder; a mist guard, surrounding the holder and the inner cup body, configured to be moved up and down; a cleaning liquid supply configured to supply a cleaning liquid; and a controller. The controller is configured to perform: supplying a processing liquid to the substrate from a processing liquid supply, in a state that the substrate is held by the holder and the mist guard is raised; and dispersing, after the supplying of the processing liquid, the cleaning liquid supplied from the cleaning liquid supply to an entire inner peripheral surface of the mist guard, in a state that the substrate is carried out from the holder and the mist guard is raised.

公开(公告)号：US12051605B2

公开(公告)日：2024-07-30

申请号：US17495833

申请日：2021-10-07

Applicant: Tokyo Electron Limited

Inventor： Nobuhiro Ogata ,  Hiroki Sakurai ,  Daisuke Goto ,  Takahiro Koga ,  Kanta Mori ,  Yusuke Hashimoto

IPC: H01L21/67 ,  B05B1/14

CPC classification number: H01L21/6715 ,  B05B1/14 ,  H01L21/67051

Abstract: A substrate processing apparatus includes a fluid supply unit that supplies a fluid that includes a pressurized vapor or mist of a purified water, a processing liquid supply unit that supplies a processing liquid that includes at least sulfuric acid, and a nozzle that includes a first discharge port that discharges a fluid that is supplied from the fluid supply unit, a second discharge port that discharges a processing liquid that is supplied from the processing liquid supply unit, and a guiding route that is communicated with the first discharge port and the second discharge port and guides a mixed fluid of a fluid that is discharged from the first discharge port and a processing liquid that is discharged from the second discharge port, where a cross-sectional area of the guiding route is greater than a cross-sectional area of the first discharge port.

公开(公告)号：US12148632B2

公开(公告)日：2024-11-19

申请号：US17810385

申请日：2022-07-01

Applicant: Tokyo Electron Limited

Inventor： Yusuke Hashimoto ,  Daisuke Goto ,  Kanta Mori ,  Jiro Higashijima ,  Nobuhiro Ogata

IPC: H01L21/67 ,  B05B1/10 ,  B08B3/04 ,  B08B3/08

Abstract: A substrate processing apparatus includes a holder configured to hold a substrate; a driving unit configured to rotate the holder; an inner cup body provided in the holder to surround the substrate held by the holder; a mist guard, surrounding the holder and the inner cup body, configured to be moved up and down; a cleaning liquid supply configured to supply a cleaning liquid; and a controller. The controller is configured to perform: supplying a processing liquid to the substrate from a processing liquid supply, in a state that the substrate is held by the holder and the mist guard is raised; and dispersing, after the supplying of the processing liquid, the cleaning liquid supplied from the cleaning liquid supply to an entire inner peripheral surface of the mist guard, in a state that the substrate is carried out from the holder and the mist guard is raised.