公开(公告)号：US20140079526A1

公开(公告)日：2014-03-20

申请号：US14025899

申请日：2013-09-13

Applicant: Tokyo Electron Limited

Inventor： Katsuhiko OYAMA ,  Yasushi TAKEUCHI

IPC: H01L21/677 ,  H01L21/673

CPC classification number: H01L21/677 ,  H01L21/67346 ,  H01L21/68

Abstract: According to an embodiment of present disclosure, a spacer is provided. The spacer includes at least a protrusion formed to protrude from an outer periphery of the spacer. The protrusion serves to locate the spacer in place in a transfer mechanism configured to transfer the spacer when the spacer is fixed by the transfer mechanism in such a way that the protrusion comes in contact with the transfer mechanism, and configured to allow the spacer to rotate or move in case the spacer is deviated from a predetermined transfer position when the spacer is engaged with the transfer mechanism.

Abstract translation: 根据本公开的实施例，提供了间隔件。 所述间隔件至少包括形成为从所述间隔件的外周突出的突起。 所述突起用于将所述间隔件定位在传送机构中的适当位置，所述传送机构构造成当所述间隔件通过所述传送机构固定时传送所述间隔件，使得所述突起与所述传送机构接触并且被构造成允许所述间隔件旋转 或者当间隔件与传送机构接合时，间隔件偏离预定传送位置的情况下移动。

公开(公告)号：US20170241018A1

公开(公告)日：2017-08-24

申请号：US15434524

申请日：2017-02-16

Applicant: Tokyo Electron Limited

Inventor： Katsuhiko OYAMA ,  Kiichi TAKAHASHI ,  Yasushi TAKEUCHI ,  Katsuyoshi AIKAWA

IPC: C23C16/458 ,  C23C16/52 ,  C23C16/455

CPC classification number: C23C16/4584 ,  C23C16/401 ,  C23C16/455 ,  C23C16/45551 ,  C23C16/52

Abstract: A film deposition apparatus includes a chamber and a turntable provided in the chamber. The turntable includes a concave portion in its upper surface. A bottom portion of the concave portion has a through hole. A substrate supporting member is detachably placed on the concave portion so that a lower surface thereof is exposed from the through hole, and includes a substrate receiving portion. A drive mechanism moves up and down and rotates the turntable. A rotary unit rotatable by air is provided under the turntable. An air supply unit is provided. A controller causes the drive mechanism to rotate and move down the turntable so that the rotary unit supports the exposed lower surface of the substrate supporting member. The controller causes the air supply unit to supply air to the rotary unit so that the substrate supporting member rotates a predetermined angle relative to the turntable.

公开(公告)号：US20170211181A1

公开(公告)日：2017-07-27

申请号：US15413600

申请日：2017-01-24

Applicant: Tokyo Electron Limited

Inventor： Katsuhiko OYAMA ,  Kiichi TAKAHASHI ,  Yasushi TAKEUCHI ,  Katsuyoshi AIKAWA

IPC: C23C16/455 ,  C23C16/458

CPC classification number: C23C16/4584 ,  C23C16/45551

Abstract: A film deposition apparatus for sequentially supplying reaction gases, which mutually react, into a chamber to deposit a film on a substrate includes a turntable rotatable and including a concave portion on an upper surface, a bottom portion of the concave portion having a through hole, a substrate supporting member attachable to and detachable from the concave portion, an upper surface of the substrate supporting member mounting the substrate, a lower surface of the substrate supporting member having a first protruding portion, a drive mechanism moving up and down the turntable and revolving the turntable, a lid member located lower than the turntable, an upper surface of the lid member having a second protruding portion, and a control unit revolving the turntable to cause the first protruding portion to contact the second protruding portion and cause the substrate supporting member to be spun a predetermined angle relative to the turntable.

公开(公告)号：US20140305540A1

公开(公告)日：2014-10-16

申请号：US14247371

申请日：2014-04-08

Applicant: Tokyo Electron Limited

Inventor： Katsuhiko OYAMA ,  Yasushi TAKEUCHI ,  Shinji ASARI

IPC: H01L21/673

CPC classification number: H01L21/67389 ,  H01L21/67379 ,  H01L21/67769 ,  H01L21/67772

Abstract: A method for managing an atmosphere in a storage container in a processing apparatus including a substrate transfer region and a container transfer region which are partitioned by a partition wall; a load port; a container keeping rack; and a cover opening/closing mechanism, includes substituting the internal atmosphere of the storage container that stores non-processed substrates with the inert gas for using the cover opening/closing mechanism; transferring the storage container of which the internal atmosphere has been substituted with the inert gas, to the container keeping rack and placing and keeping the storage container on the container keeping rack; and putting the storage container on standby on the container keeping rack while maintaining the atmosphere substituted with the inert gas.

Abstract translation: 一种处理装置中的管理气氛的方法，所述处理装置包括由分隔壁分隔的基板传送区域和容器传送区域; 负载端口; 集装箱架; 以及盖开闭机构，其特征在于，在所述盖开闭机构中，使用所述惰性气体代替存储未处理基板的储存容器的内部气氛; 将内部空气已经被惰性气体代替的储存容器传送到容器保持架，并将储存容器放置并保持在容器保持架上; 并将储存容器置于容器保持架上，同时保持用惰性气体取代的气氛。