公开(公告)号：US20170114461A1

公开(公告)日：2017-04-27

申请号：US15296588

申请日：2016-10-18

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kiichi TAKAHASHI ,  Yuya SASAKI ,  Kosuke TAKAHASHI

IPC: C23C16/455

CPC classification number: C23C16/45563 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/45578

Abstract: A substrate processing apparatus includes a first hole portion formed through a sidewall of the process chamber and horizontally extending outward and a second hole portion formed to be contiguous with the first hole portion and defining a supply channel for a process gas. The apparatus also includes a gas nozzle, a plurality of seal members and an annular spacer. A proximal end of the gas nozzle is inserted into the first hole portion. The plurality of seal members is spaced apart from each other between an outer circumferential surface of the gas nozzle and the first hole portion. The annular spacer is inserted into the first hole portion and is pressed against an annular surface of an opening periphery of the second hole portion by the gas nozzle in a state where the proximal end of the gas nozzle is engaged with the annular spacer.

公开(公告)号：US20140347465A1

公开(公告)日：2014-11-27

申请号：US14281989

申请日：2014-05-20

Applicant: Tokyo Electron Limited

Inventor： Kiichi TAKAHASHI ,  Takeshi Kobayashi ,  Yuji Takabatake ,  Naohide Ito ,  Katsuaki Sugawara

IPC: G01C5/00 ,  G06T7/00 ,  H04N7/18

CPC classification number: G06T7/0004 ,  G06T2207/30148

Abstract: A ready for rotation state detection device is configured to detect a state in which a substrate, which is placed on a concave portion formed in a surface of a turntable, will not fly out of the concave portion when the turntable is rotated in a chamber. The ready for rotation state detection device includes a ready for rotation state detection unit configured to detect that a height of a surface of an end of the substrate is equal to or lower than a predetermined value indicating that the turntable is rotatable, upon receiving the substrate on the concave portion.

Abstract translation: 准备旋转状态检测装置被配置为检测当转盘在腔室中旋转时，放置在转盘表面上的凹部上的基板不会从凹部中飞出的状态。 准备旋转状态检测装置包括准备旋转状态检测单元，其被配置为在接收到基板时检测基板的端部的表面的高度等于或低于指示转盘是可旋转的预定值 在凹部上。

公开(公告)号：US20130204425A1

公开(公告)日：2013-08-08

申请号：US13804452

申请日：2013-03-14

Applicant: Tokyo Electron Limited

Inventor： Yo ABE ,  Kiichi TAKAHASHI ,  Junya SATO ,  Yoshinobu MOTODATE

IPC: H01L21/67

CPC classification number: H01L21/67098 ,  H01L21/67109 ,  H01L21/67766 ,  H01L21/67781

Abstract: When a substrate is transferred by a holding arm to a multiple tier wafer boat, contact between the holding arm and the substrate is prevented. When the wafer boat is not subjected to a thermal effect, a normal height position of a ring member is obtained by relatively elevating and lowering a transfer base member with respect to the wafer boat. Before a wafer, which is not yet thermally processed, is transferred to the wafer boat, a height position of the corresponding ring member is obtained. By comparing a difference between the normal height position of the ring member and the height position of the ring member before the wafer is transported, with a threshold value, whether to transfer the wafer by the wafer transfer mechanism to the wafer boat can be judged.

Abstract translation: 当基板被保持臂转移到多层晶片舟皿时，防止了保持臂和基板之间的接触。 当晶片舟不受热效应时，通过相对于晶片舟相对地升高和降低转印基底构件，获得环形构件的正常高度位置。 在尚未热处理的晶片被转移到晶片舟皿之前，获得相应的环件的高度位置。 通过比较环状构件的正常高度位置与晶片运送前环状构件的高度位置之间的差异，可以判断是否通过晶片传送机构将晶片转移到晶片舟皿上。

公开(公告)号：US20150203965A1

公开(公告)日：2015-07-23

申请号：US14591245

申请日：2015-01-07

Applicant: Tokyo Electron Limited

Inventor： Tadashi ENOMOTO ,  Kiichi TAKAHASHI ,  Keiichi TANAKA

IPC: C23C16/455 ,  C23C16/44 ,  H01L21/02 ,  C23C16/458

CPC classification number: H01L21/0228 ,  C23C16/4412 ,  C23C16/45551 ,  C23C16/4584 ,  H01L21/67748 ,  H01L21/68742 ,  H01L21/68764 ,  H01L21/68771

Abstract: A vacuum processing apparatus is configured to include a process chamber, a turntable provided in the process chamber, and a substrate receiving area provided in one surface of the turntable and including a regulation part formed therearound to regulate a position of a substrate. A transfer mechanism is provided outside the process chamber, and a lifting member is configured to support the substrate and to move up and down in order to transfer the substrate between the transfer mechanism and the turntable. An exhaust mechanism is configured to selectively evacuate a gap between the substrate receiving area and the substrate before the lifting member places the substrate on the substrate receiving area.

Abstract translation: 真空处理装置被配置为包括处理室，设置在处理室中的转台和设置在转台的一个表面中的基板接收区域，并且包括在其周围形成的调节部分以调节基板的位置。 传送机构设置在处理室外部，并且提升构件被构造成支撑基板并且上下移动，以便在传送机构和转台之间传送基板。 排气机构构造成在提升构件将基板放置在基板接收区域之前选择性地排空基板接收区域和基板之间的间隙。

公开(公告)号：US20170211181A1

公开(公告)日：2017-07-27

申请号：US15413600

申请日：2017-01-24

Applicant: Tokyo Electron Limited

Inventor： Katsuhiko OYAMA ,  Kiichi TAKAHASHI ,  Yasushi TAKEUCHI ,  Katsuyoshi AIKAWA

IPC: C23C16/455 ,  C23C16/458

CPC classification number: C23C16/4584 ,  C23C16/45551

Abstract: A film deposition apparatus for sequentially supplying reaction gases, which mutually react, into a chamber to deposit a film on a substrate includes a turntable rotatable and including a concave portion on an upper surface, a bottom portion of the concave portion having a through hole, a substrate supporting member attachable to and detachable from the concave portion, an upper surface of the substrate supporting member mounting the substrate, a lower surface of the substrate supporting member having a first protruding portion, a drive mechanism moving up and down the turntable and revolving the turntable, a lid member located lower than the turntable, an upper surface of the lid member having a second protruding portion, and a control unit revolving the turntable to cause the first protruding portion to contact the second protruding portion and cause the substrate supporting member to be spun a predetermined angle relative to the turntable.

公开(公告)号：US20180056317A1

公开(公告)日：2018-03-01

申请号：US15685375

申请日：2017-08-24

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yuya SASAKI ,  Kiichi TAKAHASHI ,  Yasushi TAKEUCHI

IPC: B05B15/06 ,  B05B1/20

Abstract: A support structure for a suspended injector includes a suspended injector having a tubular vertical portion extending in a vertical direction, one or more chamfered portions formed by chamfering an outer peripheral surface near an upper end of the tubular vertical portion, a pair of holding members each having a flat surface formed on an inner peripheral surface of each of the pair of holding members to engage with each of the chamfered portions, each of the pair of holding members holding the tubular vertical portion of the suspended injector by sandwiching the tubular vertical portion of the suspended injector from both sides each of the pair of holding members, and a support structure part configured to fixedly support the pair of holding members, and configured to suspend and support the suspended injector.

公开(公告)号：US20170241018A1

公开(公告)日：2017-08-24

申请号：US15434524

申请日：2017-02-16

Applicant: Tokyo Electron Limited

Inventor： Katsuhiko OYAMA ,  Kiichi TAKAHASHI ,  Yasushi TAKEUCHI ,  Katsuyoshi AIKAWA

IPC: C23C16/458 ,  C23C16/52 ,  C23C16/455

CPC classification number: C23C16/4584 ,  C23C16/401 ,  C23C16/455 ,  C23C16/45551 ,  C23C16/52

Abstract: A film deposition apparatus includes a chamber and a turntable provided in the chamber. The turntable includes a concave portion in its upper surface. A bottom portion of the concave portion has a through hole. A substrate supporting member is detachably placed on the concave portion so that a lower surface thereof is exposed from the through hole, and includes a substrate receiving portion. A drive mechanism moves up and down and rotates the turntable. A rotary unit rotatable by air is provided under the turntable. An air supply unit is provided. A controller causes the drive mechanism to rotate and move down the turntable so that the rotary unit supports the exposed lower surface of the substrate supporting member. The controller causes the air supply unit to supply air to the rotary unit so that the substrate supporting member rotates a predetermined angle relative to the turntable.

公开(公告)号：US20170125282A1

公开(公告)日：2017-05-04

申请号：US15297383

申请日：2016-10-19

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takahito UMEHARA ,  Masayuki HASEGAWA ,  Kiichi TAKAHASHI ,  Yuya SASAKI

IPC: H01L21/687 ,  C23C16/458 ,  C23C16/455

Abstract: A film forming apparatus for forming films on substrates mounted on a rotary table by rotating the rotary table and causing the substrates to sequentially pass through areas to which process gases are supplied, including: recess portions formed in one surface of the rotary table along a circumferential direction and configured to accommodate the substrates; mounting portions disposed with the recess portions and configured to support regions of the substrates closer to centers than peripheral edge portions thereof; groove portions formed within the recess portions so as to surround the mounting portions; communication paths formed so as to extend from regions of the groove portions existing at a side of a rotational center of the rotary table toward an external area of the recess portions; and an exhaust port through which an interior of a vacuum container is vacuum-exhausted.

公开(公告)号：US20150078864A1

公开(公告)日：2015-03-19

申请号：US14482047

申请日：2014-09-10

Applicant: Tokyo Electron Limited

Inventor： Kaoru SATO ,  Kiichi TAKAHASHI

IPC: C23C16/458 ,  H01L21/67 ,  C23C16/455 ,  H01L21/68

CPC classification number: C23C16/4586 ,  C23C16/45521 ,  C23C16/45551 ,  C23C16/45561 ,  C23C16/4584 ,  H01L21/68742 ,  H01L21/68764 ,  H01L21/68771

Abstract: A substrate processing apparatus is provided to deposit a film including a reaction product on a substrate by repeating a supply cycle of sequentially supplying at least two kinds of reaction gases reactable with each other to a surface of the substrate in a chamber. The substrate processing apparatus includes a turntable provided in the chamber and having a concave portion for receiving the substrate formed in its surface and through-holes formed in the concave portion, a lifting mechanism including lift pins used when transferring the substrate placed on the concave portion, and a control unit configured to control the lifting mechanism. The control unit controls the lifting mechanism to carry the substrate out of the concave portion by moving the lifting pins upward in a vertical direction and inward in a radial direction of the turntable after the lifting pins contact the substrate through the through-holes.

Abstract translation: 提供了一种基板处理装置，通过重复供应循环，将包含反应产物的膜沉积在基板上，该供应循环在室中顺序地将至少两种可反应的反应气体反应到基板的表面。 基板处理装置包括设置在室内的转台，具有用于接收形成在其表面上的基板的凹部和形成在凹部中的通孔的转台，提升机构包括当转印放置在凹部上的基板时使用的升降销 以及控制单元，被配置为控制提升机构。 控制单元通过在提升销通过通孔与基板接触之后，使提升销沿着垂直方向向上移动并且在转台的径向方向向内移动而将基板搬出凹部。