公开(公告)号：US20160138159A1

公开(公告)日：2016-05-19

申请号：US14936759

申请日：2015-11-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hitoshi KATO ,  Shigehiro MIURA ,  Hiroyuki KIKUCHI ,  Katsuyoshi AIKAWA

IPC: C23C16/455 ,  C23C16/458 ,  H01L21/677

CPC classification number: C23C16/4584 ,  C23C16/4408 ,  C23C16/45551 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68792

Abstract: A film forming apparatus of forming a film by supplying a process gas onto a substrate includes a rotation table having a loading region and is configured to revolve the substrate loaded on the loading region; a process gas supply mechanism configured to supply the process gas to a gas supply region to perform film formation on the substrate repeatedly passing through the gas supply region a plurality of times by revolution of the substrate; a first gear disposed on the other surface side of the rotation table and rotated in a rotation direction of the rotation table; a second gear configured with planetary gears engaging with the first gear, disposed to be revolved together with the loading region, and configured to rotate the loading region so as to allow the substrate to be rotated.

Abstract translation: 通过在基板上提供处理气体来形成膜的成膜装置包括具有装载区域的旋转台，其被构造成使装载在装载区域上的基板旋转; 处理气体供给机构，被配置为将处理气体供给到气体供给区域，以在基板上通过基板的旋转多次重复地穿过气体供给区域进行成膜; 第一齿轮，设置在所述旋转台的另一个表面侧，并且沿所述旋转台的旋转方向旋转; 配置有与所述第一齿轮接合的行星齿轮的第二齿轮，所述行星齿轮被设置成与所述加载区域一起旋转，并且被配置为使所述加载区域旋转以允许所述基板旋转。

公开(公告)号：US20140174351A1

公开(公告)日：2014-06-26

申请号：US14104049

申请日：2013-12-12

Applicant: Tokyo Electron Limited

Inventor： Katsuyoshi AIKAWA

IPC: C23C16/52 ,  G06T7/00

CPC classification number: C23C16/52 ,  C23C16/44 ,  C23C16/45551 ,  G01N21/15 ,  G01N21/9501 ,  H01L21/67259 ,  H01L21/681 ,  H01L21/68764 ,  H01L21/68771

Abstract: A substrate position detecting apparatus detects a position of a substrate inside a chamber from an image of a target inside the chamber. The apparatus includes an image pickup device to pick up the image of the target inside the chamber through a window, an illumination device to irradiate light upwards, an illumination reflecting plate provided above the illumination device and including a reflecting surface to reflect the light from the illumination device towards the window, and a reflection restricting part provided on the reflecting surface to form a shadow in a predetermined region that includes the target inside the chamber.

Abstract translation: 基板位置检测装置从室内的目标图像检测室内的基板的位置。 该装置包括：图像拾取装置，用于通过窗口拾取室内的目标图像，照明装置向上照射光;照明反射板，设置在照明装置上方，并包括反射表面，以反射来自 朝向窗户的照明装置，以及设置在反射面上的反射限制部，以在包围该室内的目标的预定区域内形成阴影。

公开(公告)号：US20180327906A1

公开(公告)日：2018-11-15

申请号：US16021888

申请日：2018-06-28

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hitoshi KATO ,  Shigehiro MIURA ,  Hiroyuki KIKUCHI ,  Katsuyoshi AIKAWA

IPC: C23C16/52 ,  C23C16/455 ,  C23C16/458

CPC classification number: C23C16/52 ,  C23C16/4409 ,  C23C16/45542 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/4584 ,  H01J37/321 ,  H01J37/32926 ,  H01L21/67253 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68792

Abstract: A film forming apparatus includes a rotary table having a loading area at a first surface side thereof and revolving a substrate loaded on the loading area, a rotation mechanism rotating the loading area such that the substrate rotates around its axis, a processing gas supply mechanism supplying a processing gas to a processing gas supply area so that a thin film is formed on the substrate which repeatedly passes through the processing gas supply area the revolution of the substrate, and a control part configured to perform a calculation of a rotation speed of the substrate based on a parameter including a rotation speed of the rotary table to allow an orientation of the substrate to be changed whenever the substrate is positioned in the processing gas supply area, and to output a control signal for rotating the substrate at a calculated rotation speed.

公开(公告)号：US20170211181A1

公开(公告)日：2017-07-27

申请号：US15413600

申请日：2017-01-24

Applicant: Tokyo Electron Limited

Inventor： Katsuhiko OYAMA ,  Kiichi TAKAHASHI ,  Yasushi TAKEUCHI ,  Katsuyoshi AIKAWA

IPC: C23C16/455 ,  C23C16/458

CPC classification number: C23C16/4584 ,  C23C16/45551

Abstract: A film deposition apparatus for sequentially supplying reaction gases, which mutually react, into a chamber to deposit a film on a substrate includes a turntable rotatable and including a concave portion on an upper surface, a bottom portion of the concave portion having a through hole, a substrate supporting member attachable to and detachable from the concave portion, an upper surface of the substrate supporting member mounting the substrate, a lower surface of the substrate supporting member having a first protruding portion, a drive mechanism moving up and down the turntable and revolving the turntable, a lid member located lower than the turntable, an upper surface of the lid member having a second protruding portion, and a control unit revolving the turntable to cause the first protruding portion to contact the second protruding portion and cause the substrate supporting member to be spun a predetermined angle relative to the turntable.

公开(公告)号：US20220189813A1

公开(公告)日：2022-06-16

申请号：US17549037

申请日：2021-12-13

Applicant: TOKYO ELECTRON LIMITED

Inventor： Katsuyoshi AIKAWA ,  Hiroshi SONE ,  Shinji ORIMOTO

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/687

Abstract: There is provided a mounting table. The mounting table comprises: a dielectric plate having a through-hole at an outer peripheral portion thereof and having a substrate support on which a substrate is placed; a support member; a first heat insulating member disposed between the dielectric plate and the support member; a first biasing member disposed between the first heat insulating member and the support member, and a fastening member configured to detachably fix the dielectric plate to the support member by way of penetrating through the through-hole of the dielectric plate, the first heat insulating member, and the first biasing member.

公开(公告)号：US20170241018A1

公开(公告)日：2017-08-24

申请号：US15434524

申请日：2017-02-16

Applicant: Tokyo Electron Limited

Inventor： Katsuhiko OYAMA ,  Kiichi TAKAHASHI ,  Yasushi TAKEUCHI ,  Katsuyoshi AIKAWA

IPC: C23C16/458 ,  C23C16/52 ,  C23C16/455

CPC classification number: C23C16/4584 ,  C23C16/401 ,  C23C16/455 ,  C23C16/45551 ,  C23C16/52

Abstract: A film deposition apparatus includes a chamber and a turntable provided in the chamber. The turntable includes a concave portion in its upper surface. A bottom portion of the concave portion has a through hole. A substrate supporting member is detachably placed on the concave portion so that a lower surface thereof is exposed from the through hole, and includes a substrate receiving portion. A drive mechanism moves up and down and rotates the turntable. A rotary unit rotatable by air is provided under the turntable. An air supply unit is provided. A controller causes the drive mechanism to rotate and move down the turntable so that the rotary unit supports the exposed lower surface of the substrate supporting member. The controller causes the air supply unit to supply air to the rotary unit so that the substrate supporting member rotates a predetermined angle relative to the turntable.

公开(公告)号：US20160122872A1

公开(公告)日：2016-05-05

申请号：US14926017

申请日：2015-10-29

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hitoshi KATO ,  Shigehiro MIURA ,  Hiroyuki KIKUCHI ,  Katsuyoshi AIKAWA

IPC: C23C16/455 ,  C23C16/52 ,  C23C16/458

CPC classification number: C23C16/52 ,  C23C16/4409 ,  C23C16/45542 ,  C23C16/45551 ,  C23C16/4584 ,  H01J37/321 ,  H01J37/32926 ,  H01L21/67253 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68792

Abstract: A film forming apparatus includes a rotary table having a loading area at a first surface side thereof and revolving a substrate loaded on the loading area, a rotation mechanism rotating the loading area such that the substrate rotates around its axis, a processing gas supply mechanism supplying a processing gas to a processing gas supply area so that a thin film is formed on the substrate which repeatedly passes through the processing gas supply area the revolution of the substrate, and a control part configured to perform a calculation of a rotation speed of the substrate based on a parameter including a rotation speed of the rotary table to allow an orientation of the substrate to be changed whenever the substrate is positioned in the processing gas supply area, and to output a control signal for rotating the substrate at a calculated rotation speed.

Abstract translation: 一种成膜装置，包括：旋转台，其具有在其第一表面侧的装载区域，并且旋转装载在所述装载区域上的基板;旋转机构，使所述装载区域旋转，使得所述基板绕其轴线旋转，供给处理气体供给机构 对处理气体供给区域的处理气体，使得在基板上形成薄膜，所述薄膜重复地通过处理气体供给区域旋转基板的旋转;以及控制部，被配置为执行基板的旋转速度的计算 基于包括旋转台的旋转速度的参数，以便每当基板位于处理气体供应区域中时，基板的取向被改变，并且以计算的旋转速度输出用于旋转基板的控制信号。