公开(公告)号：US20160288032A1

公开(公告)日：2016-10-06

申请号：US15078017

申请日：2016-03-23

Applicant: Tokyo Electron Limited

Inventor： Hideo SHITE ,  Kazuhiko KIMURA ,  Tomoyuki YUMOTO

IPC: B01D36/00 ,  B01D37/04 ,  H01L21/67

CPC classification number: H01L21/6715 ,  H01L21/67017

Abstract: A treatment solution supply method includes: a degassed treatment solution generating step of degassing a treatment solution by a degassing mechanism to generate a degassed treatment solution; a treatment solution storing step of storing the degassed treatment solution in a container; a filter solution-passing step of bringing a downstream side from a filter connected to a downstream side from the container via a treatment solution supply pipe to a negative pressure with respect to a pressure in the container to pass the treatment solution in the container through the filter; and a negative pressure maintaining step of maintaining a state in which the downstream side from the filter is brought to the negative pressure, for a predetermined period, after stopping supply of the treatment solution from the container to the filter.

Abstract translation: 处理溶液供给方法包括：脱气处理液生成步骤，通过脱气机构对处理液进行脱气，生成脱气处理液; 将脱气后的处理液储存在容器内的处理液储存工序; 过滤器溶液通过步骤，使得从连接到下游侧的过滤器的下游侧经由处理溶液供给管相对于容器中的压力到达负压，以将容器中的处理溶液通过所述容器 过滤; 并且在停止将处理液从容器供给到过滤器之后，将从过滤器的下游侧保持为负压的状态的负压保持步骤达预定时间。

公开(公告)号：US20180065065A1

公开(公告)日：2018-03-08

申请号：US15696365

申请日：2017-09-06

Applicant: Tokyo Electron Limited

Inventor： Takashi SASA ,  Daisuke ISHIMARU ,  Katsuya HASHIMOTO ,  Hideo SHITE ,  Shinya WAKAMIZU ,  Kazuhiko KIMURA

IPC: B01D29/60 ,  G03F7/16 ,  B01D37/04 ,  B01D35/02

CPC classification number: B01D29/606 ,  B01D35/02 ,  B01D37/046 ,  B01D2201/20 ,  B01D2201/202 ,  F04B43/02 ,  F04B43/08 ,  F04B53/10 ,  F04B53/20 ,  G03F7/16 ,  G03F7/162 ,  G03F7/3021

Abstract: A treatment solution supply apparatus for supplying a treatment solution to a treatment solution discharge unit that discharges the treatment solution to a treatment body, includes: a temporary storage apparatus that temporarily stores the treatment solution supplied from a treatment solution supply source that stores the treatment solution; a filter that removes a foreign substance in the treatment solution from the temporary storage apparatus; and a pump that sends the treatment solution from which the foreign substance has been removed by the filter to the treatment solution discharge unit, wherein the temporary storage apparatus has a pressure-feeding function of pressure-feeding the treatment solution stored in the temporary storage apparatus.