公开(公告)号：US20150159642A1

公开(公告)日：2015-06-11

申请号：US14559950

申请日：2014-12-04

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takashi SASA ,  Daiki SHIBATA

IPC: F04B43/12 ,  F04B43/08 ,  H01L21/033 ,  G05D7/06 ,  H01L21/67 ,  F04B49/24 ,  F04B49/06

CPC classification number: F04B43/1238 ,  A61M5/14232 ,  B05C17/0333 ,  F04B43/08 ,  F04B43/1246 ,  F04B43/1253 ,  F04B43/1261 ,  F04B43/1276 ,  F04B43/1284 ,  F04B49/06 ,  F04B49/065 ,  F04B49/24 ,  G03F7/16 ,  H01L21/67017 ,  H01L21/6715 ,  Y10T137/794 ,  Y10T137/86027

Abstract: In one embodiment, a feed pump (6) of a tube pump type is used for supplying a processing liquid. The tube pump has a squeezing member (65) that moves from a first axial position of a tube (62) at which the squeezing member starts pinching of the tube, to a second axial position at which the squeezing member leaves the tube after feeding the processing liquid toward an ejecting part such as a nozzle (51). Only one pinched part pinched between the squeezing member and a guide member (61) is formed between the first axial position and the second axial position of the tube, and the only one pinched part moves along the axial direction of the tube, during feeding of a dose of the processing liquid toward the ejecting part.

Abstract translation: 在一个实施例中，管式泵的供给泵（6）用于供应处理液体。 管式泵具有挤压构件（65），挤压构件（65）从挤压构件开始挤压管的管（62）的第一轴向位置移动到第二轴向位置，在第二轴向位置，挤压构件在进给之后离开管 将处理液体朝向诸如喷嘴（51）的喷射部分。 在挤压构件和引导构件（61）之间夹紧的仅一个夹紧部分形成在管的第一轴向位置和第二轴向位置之间，并且仅一个夹紧部分沿着管的轴向方向移动， 处理液朝向喷射部的剂量。

公开(公告)号：US20180074407A1

公开(公告)日：2018-03-15

申请号：US15816088

申请日：2017-11-17

Applicant: Tokyo Electron Limited

Inventor： Kousuke YOSHIHARA ,  Koji TAKAYANAGI ,  Toshinobu FURUSHO ,  Takashi SASA ,  Daisuke ISHIMARU

IPC: G03F7/16 ,  H01L21/67

CPC classification number: G03F7/16 ,  H01L21/67017

Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.

公开(公告)号：US20150140485A1

公开(公告)日：2015-05-21

申请号：US14548719

申请日：2014-11-20

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takashi SASA ,  Daisuke ISHIMARU

IPC: G03F7/16 ,  G03F7/30

CPC classification number: G03F7/162 ,  G03F7/3021 ,  H01L21/67017 ,  H01L21/6715

Abstract: A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between the intermediate tank and the discharging part; an evacuating unit that evacuates an interior of the intermediate tank to transport the processing liquid from the processing liquid source to the intermediate tank through the transport line; and a pressure adjusting unit that supplies a gas into the intermediate tank to return a pressure in the evacuated intermediate tank from a reduced pressure to a normal pressure, thereby to place the intermediate tank ready for feeding the processing liquid, having been transported into the intermediate tank, into the feed line.

Abstract translation: 处理液供给装置经由排出部向处理对象物供给处理液。 在一个实施例中，该装置包括：提供处理液体的处理液体源; 经由输送线与处理液源连接的中间槽; 设置在中间罐和排出部之间的供给管线; 抽空单元，其抽出中间罐的内部，以将处理液体从处理液体源通过输送管路输送到中间罐; 以及压力调节单元，其将气体供应到中间罐中，以将抽真空的中间罐中的压力从减压返回到常压，从而将中间容器准备好供给已经运送到中间体的处理液 罐，进入饲料线。

公开(公告)号：US20140174475A1

公开(公告)日：2014-06-26

申请号：US14101669

申请日：2013-12-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koji TAKAYANAGI ,  Yukie MINEKAWA ,  Yuichi YOSHIDA ,  Kousuke YOSHIHARA ,  Yuichi TERASHITA ,  Toshinobu FURUSHO ,  Takashi SASA

IPC: H01L21/67

Abstract: A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit 101, a resist liquid L is sucked into a pump 70 through a filter. A part of the resist liquid sucked in the pump is discharged from a discharge nozzle 7. The remaining resist liquid is returned to a supply conduit 51b on a primary side of the filter. A process is synthesized by adding a replenishment amount equal to the discharge amount to the return amount. The discharge of the synthesized process liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.

Abstract translation: 通过一个过滤器可以获得与提供多个过滤器时获得的过滤效率相似的过滤效率，并且可以防止生产量的降低。 基于来自控制单元101的控制信号，抗蚀剂液体L通过过滤器被吸入泵70。 吸入泵中的抗蚀剂液体的一部分从排出喷嘴7排出。剩余的抗蚀剂液体返回到过滤器的一次侧的供给管51b。 通过将等于排出量的补充量加到返回量来合成过程。 进行合成处理液的排出以及过滤器的过滤，进行与排出量与返回量之间的比例对应的次数。

公开(公告)号：US20180065065A1

公开(公告)日：2018-03-08

申请号：US15696365

申请日：2017-09-06

Applicant: Tokyo Electron Limited

Inventor： Takashi SASA ,  Daisuke ISHIMARU ,  Katsuya HASHIMOTO ,  Hideo SHITE ,  Shinya WAKAMIZU ,  Kazuhiko KIMURA

IPC: B01D29/60 ,  G03F7/16 ,  B01D37/04 ,  B01D35/02

CPC classification number: B01D29/606 ,  B01D35/02 ,  B01D37/046 ,  B01D2201/20 ,  B01D2201/202 ,  F04B43/02 ,  F04B43/08 ,  F04B53/10 ,  F04B53/20 ,  G03F7/16 ,  G03F7/162 ,  G03F7/3021

Abstract: A treatment solution supply apparatus for supplying a treatment solution to a treatment solution discharge unit that discharges the treatment solution to a treatment body, includes: a temporary storage apparatus that temporarily stores the treatment solution supplied from a treatment solution supply source that stores the treatment solution; a filter that removes a foreign substance in the treatment solution from the temporary storage apparatus; and a pump that sends the treatment solution from which the foreign substance has been removed by the filter to the treatment solution discharge unit, wherein the temporary storage apparatus has a pressure-feeding function of pressure-feeding the treatment solution stored in the temporary storage apparatus.

公开(公告)号：US20170296944A1

公开(公告)日：2017-10-19

申请号：US15639010

申请日：2017-06-30

Applicant: Tokyo Electron Limited

Inventor： Kousuke YOSHIHARA ,  Katsunori ICHINO ,  Toshinobu FURUSHO ,  Takashi SASA ,  Katsuhiro TSUCHIYA ,  Yuichi TERASHITA ,  Hirofumi TAKEGUCHI

IPC: B01D19/00 ,  G03F7/16 ,  H01L21/67 ,  G03F7/30

CPC classification number: B01D19/0063 ,  B01D19/0031 ,  B01D19/0068 ,  G03F7/16 ,  G03F7/30 ,  H01L21/6715

Abstract: A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.

公开(公告)号：US20150125793A1

公开(公告)日：2015-05-07

申请号：US14528290

申请日：2014-10-30

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kousuke YOSHIHARA ,  Koji TAKAYANAGI ,  Toshinobu FURUSHO ,  Takashi SASA ,  Daisuke ISHIMARU

IPC: G03F7/16

CPC classification number: G03F7/16 ,  H01L21/67017

Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.

Abstract translation: 处理液体供给装置执行喷射步骤，其中抽吸到泵中的处理液体通过过滤装置并从排出部件喷出而不将处理液体返回到泵中; 其中抽吸到泵中的处理液体返回到混合部分的处理液体源侧的返回步骤; 以及补充步骤，其中返回到处理液体源侧的处理液体与从处理液体源补充的处理液体一起被抽吸到泵中。 处理液体在返回步骤和补充步骤中的至少一个中通过过滤装置。 在返回步骤中返回到处理液体源侧的处理液的量大于在喷射步骤中从喷射部喷出的处理液的量。