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公开(公告)号：US20250112066A1
公开(公告)日：2025-04-03
申请号：US18899015
申请日：2024-09-27
Applicant: Tokyo Electron Limited
Inventor： Shinichi MIZUSHINO , Shunsuke INTO , Yuichiro KUNUGIMOTO , Akihiro TOYOZAWA , Daisuke ISHIMARU , Yuki MATSUTAKE , Shigeyuki IIDA , Takafumi HAYAMA
Abstract: A liquid processing apparatus includes multiple stages on each of which a substrate is to be placed; multiple nozzles shared by the multiple stages, and each for supplying a processing liquid to the substrate; a camera shared by the multiple nozzles, and for monitoring states of the multiple nozzles; and an imaging condition changing program module for causing circuitry to change an imaging condition of the camera according to a monitoring condition.
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公开(公告)号：US20200256330A1
公开(公告)日：2020-08-13
申请号：US16775468
申请日：2020-01-29
Applicant: Tokyo Electron Limited
Inventor： Daisuke ISHIMARU , Katsuya HASHIMOTO , Yasuhiro TAKAKI
IPC: F04B43/107
Abstract: There is disclosed a hollow tube body used for a liquid feeding member and deformable by pressurization, wherein: an axial cross-section of the tube body has two opposing long side parts and two opposing short side parts; four corner portions formed by the long side parts and the short side parts each have a shape curved to protrude outward; each of the long side parts has a recessed part recessed inward and continuing from the corner portions; and a portion other than the corner portions of each of the short side parts is in a flat shape.
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Patent Agency Ranking
公开(公告)号：US20180074407A1
公开(公告)日：2018-03-15
申请号：US15816088
申请日：2017-11-17
Applicant: Tokyo Electron Limited
Inventor： Kousuke YOSHIHARA , Koji TAKAYANAGI , Toshinobu FURUSHO , Takashi SASA , Daisuke ISHIMARU
CPC classification number: G03F7/16 , H01L21/67017
Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.
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4.发明申请PROCESSING LIQUID SUPPLYING APPARATUS, PROCESSING LIQUID SUPPLYING METHOD AND STORAGE MEDIUM 有权处理液体供应装置，处理液体供应方法和储存介质公开(公告)号：US20150140485A1
公开(公告)日：2015-05-21
申请号：US14548719
申请日：2014-11-20
Applicant: TOKYO ELECTRON LIMITED
Inventor： Takashi SASA , Daisuke ISHIMARU
CPC classification number: G03F7/162 , G03F7/3021 , H01L21/67017 , H01L21/6715
Abstract: A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between the intermediate tank and the discharging part; an evacuating unit that evacuates an interior of the intermediate tank to transport the processing liquid from the processing liquid source to the intermediate tank through the transport line; and a pressure adjusting unit that supplies a gas into the intermediate tank to return a pressure in the evacuated intermediate tank from a reduced pressure to a normal pressure, thereby to place the intermediate tank ready for feeding the processing liquid, having been transported into the intermediate tank, into the feed line.
Abstract translation: 处理液供给装置经由排出部向处理对象物供给处理液。 在一个实施例中，该装置包括：提供处理液体的处理液体源; 经由输送线与处理液源连接的中间槽; 设置在中间罐和排出部之间的供给管线; 抽空单元，其抽出中间罐的内部，以将处理液体从处理液体源通过输送管路输送到中间罐; 以及压力调节单元，其将气体供应到中间罐中，以将抽真空的中间罐中的压力从减压返回到常压，从而将中间容器准备好供给已经运送到中间体的处理液 罐，进入饲料线。
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公开(公告)号：US20210020464A1
公开(公告)日：2021-01-21
申请号：US16930959
申请日：2020-07-16
Applicant: Tokyo Electron Limited
Inventor： Masayuki KAJIWARA , Katsunori ICHINO , Daisuke ISHIMARU , Takuya TAJIRI , Atsushi YAMAMOTO , Masato IMAMURA , Tomohiko MUTA , Tetsuro IRIYAMA , Takeaki SAKAMOTO , Hiroki OKAGUCHI , Kenji ADACHI
Abstract: A substrate processing apparatus includes a discharge part including a nozzle configured to discharge a processing liquid onto a substrate; a liquid feeder configured to feed the processing liquid to the discharge part; a replenishment part configured to replenish the liquid feeder with the processing liquid to be fed to the discharge part; a connector including a switching valve configured to open/close a flow path between the replenishment part and the liquid feeder; a filter configured to remove foreign matters contained in the processing liquid; a replenishment preparation part configured to open the switching valve after reducing a pressure difference between the inside of the replenishment part and the liquid feeder; and a replenishment controller configured to start replenishment of the processing liquid from the replenishment part to the liquid feeder in a state in which the switching valve is opened by the replenishment preparation part.
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公开(公告)号：US20180065065A1
公开(公告)日：2018-03-08
申请号：US15696365
申请日：2017-09-06
Applicant: Tokyo Electron Limited
Inventor： Takashi SASA , Daisuke ISHIMARU , Katsuya HASHIMOTO , Hideo SHITE , Shinya WAKAMIZU , Kazuhiko KIMURA
CPC classification number: B01D29/606 , B01D35/02 , B01D37/046 , B01D2201/20 , B01D2201/202 , F04B43/02 , F04B43/08 , F04B53/10 , F04B53/20 , G03F7/16 , G03F7/162 , G03F7/3021
Abstract: A treatment solution supply apparatus for supplying a treatment solution to a treatment solution discharge unit that discharges the treatment solution to a treatment body, includes: a temporary storage apparatus that temporarily stores the treatment solution supplied from a treatment solution supply source that stores the treatment solution; a filter that removes a foreign substance in the treatment solution from the temporary storage apparatus; and a pump that sends the treatment solution from which the foreign substance has been removed by the filter to the treatment solution discharge unit, wherein the temporary storage apparatus has a pressure-feeding function of pressure-feeding the treatment solution stored in the temporary storage apparatus.
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7.发明申请公开(公告)号：US20150125793A1
公开(公告)日：2015-05-07
申请号：US14528290
申请日：2014-10-30
Applicant: TOKYO ELECTRON LIMITED
Inventor： Kousuke YOSHIHARA , Koji TAKAYANAGI , Toshinobu FURUSHO , Takashi SASA , Daisuke ISHIMARU
IPC: G03F7/16
CPC classification number: G03F7/16 , H01L21/67017
Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.
Abstract translation: 处理液体供给装置执行喷射步骤，其中抽吸到泵中的处理液体通过过滤装置并从排出部件喷出而不将处理液体返回到泵中; 其中抽吸到泵中的处理液体返回到混合部分的处理液体源侧的返回步骤; 以及补充步骤，其中返回到处理液体源侧的处理液体与从处理液体源补充的处理液体一起被抽吸到泵中。 处理液体在返回步骤和补充步骤中的至少一个中通过过滤装置。 在返回步骤中返回到处理液体源侧的处理液的量大于在喷射步骤中从喷射部喷出的处理液的量。
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