公开(公告)号：US20240094644A1

公开(公告)日：2024-03-21

申请号：US18465420

申请日：2023-09-12

Applicant: Tokyo Electron Limited

Inventor： Makoto OGATA ,  Katsuya HASHIMOTO ,  Katsunori ICHINO ,  Masataka TANAKA ,  Kazuya KUDO

IPC: G03F7/00

CPC classification number: G03F7/70808 ,  G03F7/7085 ,  G03F7/70925

Abstract: A substrate treatment apparatus includes: a plurality of solution treatment modules stacked at multiple stages, each configured to perform a treatment using a treatment solution on a substrate; and a solution supply unit configured to supply the treatment solution to the plurality of solution treatment modules, wherein: the solution supply unit includes supply pipelines provided with a solution feeder corresponding to the solution treatment modules; and the solution feeder includes a pump configured to pressure-feed the treatment solution to the corresponding solution treatment module and a filter configured to filtrate the treatment solution, and is arranged adjacent to the corresponding solution treatment module in a horizontal direction.

公开(公告)号：US20200256330A1

公开(公告)日：2020-08-13

申请号：US16775468

申请日：2020-01-29

Applicant: Tokyo Electron Limited

Inventor： Daisuke ISHIMARU ,  Katsuya HASHIMOTO ,  Yasuhiro TAKAKI

IPC: F04B43/107

Abstract: There is disclosed a hollow tube body used for a liquid feeding member and deformable by pressurization, wherein: an axial cross-section of the tube body has two opposing long side parts and two opposing short side parts; four corner portions formed by the long side parts and the short side parts each have a shape curved to protrude outward; each of the long side parts has a recessed part recessed inward and continuing from the corner portions; and a portion other than the corner portions of each of the short side parts is in a flat shape.

公开(公告)号：US20180065065A1

公开(公告)日：2018-03-08

申请号：US15696365

申请日：2017-09-06

Applicant: Tokyo Electron Limited

Inventor： Takashi SASA ,  Daisuke ISHIMARU ,  Katsuya HASHIMOTO ,  Hideo SHITE ,  Shinya WAKAMIZU ,  Kazuhiko KIMURA

IPC: B01D29/60 ,  G03F7/16 ,  B01D37/04 ,  B01D35/02

CPC classification number: B01D29/606 ,  B01D35/02 ,  B01D37/046 ,  B01D2201/20 ,  B01D2201/202 ,  F04B43/02 ,  F04B43/08 ,  F04B53/10 ,  F04B53/20 ,  G03F7/16 ,  G03F7/162 ,  G03F7/3021

Abstract: A treatment solution supply apparatus for supplying a treatment solution to a treatment solution discharge unit that discharges the treatment solution to a treatment body, includes: a temporary storage apparatus that temporarily stores the treatment solution supplied from a treatment solution supply source that stores the treatment solution; a filter that removes a foreign substance in the treatment solution from the temporary storage apparatus; and a pump that sends the treatment solution from which the foreign substance has been removed by the filter to the treatment solution discharge unit, wherein the temporary storage apparatus has a pressure-feeding function of pressure-feeding the treatment solution stored in the temporary storage apparatus.