公开(公告)号：US20210185282A1

公开(公告)日：2021-06-17

申请号：US17189669

申请日：2021-03-02

Applicant: Tokyo Electron Limited

Inventor： Norihisa KOGA ,  Tadashi NISHIYAMA ,  Yasuaki NODA

IPC: H04N7/18 ,  G01N21/88 ,  G06T7/00 ,  H04N5/225

Abstract: In one embodiment, a substrate imaging apparatus includes: a rotary holding unit that holds and rotates a substrate; a mirror member having a reflecting surface that opposes an end face of the substrate and a peripheral portion of a back surface of the substrate held by the rotary holding unit, the reflecting surface being inclined with respect to a rotation axis of the rotary holding unit; and a camera having an imaging device that receives both first light and second light through a lens, the first light coming from a peripheral portion of a front surface of the substrate held by the rotary holding unit, and the second light being a reflected light of second light which comes from the end face of the substrate held by the rotary holding unit and is reflected by the reflecting surface.

公开(公告)号：US20200084422A1

公开(公告)日：2020-03-12

申请号：US16680894

申请日：2019-11-12

Applicant: Tokyo Electron Limited

Inventor： Norihisa KOGA ,  Tadashi Nishiyama ,  Yasuaki Noda

IPC: H04N7/18 ,  H04N5/225 ,  G06T7/00 ,  G01N21/88

Abstract: In one embodiment, a substrate imaging apparatus includes: a rotary holding unit that holds and rotates a substrate; a mirror member having a reflecting surface that opposes an end face of the substrate and a peripheral portion of a back surface of the substrate held by the rotary holding unit, the reflecting surface being inclined with respect to a rotation axis of the rotary holding unit; and a camera having an imaging device that receives both first light and second light through a lens, the first light coming from a peripheral portion of a front surface of the substrate held by the rotary holding unit, and the second light being a reflected light of second light which comes from the end face of the substrate held by the rotary holding unit and is reflected by the reflecting surface.

公开(公告)号：US20180095370A1

公开(公告)日：2018-04-05

申请号：US15720891

申请日：2017-09-29

Applicant: Tokyo Electron Limited

Inventor： Hideaki KASHIWAGI ,  Takafumi NIWA ,  Norihisa KOGA

IPC: G03F7/20 ,  G03F7/16 ,  H01L21/67 ,  G03F7/40 ,  H01L21/027

CPC classification number: G03F7/70991 ,  G03F7/168 ,  G03F7/2022 ,  G03F7/40 ,  H01L21/027 ,  H01L21/0274 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67248 ,  H01L21/67253 ,  H01L22/20

Abstract: An auxiliary exposure apparatus is for performing auxiliary exposure of applying light of a predetermined wavelength from a laser light source to a resist film on a wafer, separately from exposure processing of transferring a pattern of a mask to the resist film applied on the wafer, and includes: a first total reflection mirror configured to reflect the light from the laser light source toward the wafer; and an imaging device including a light receiving part configured to receive light after reflected by the wafer.

公开(公告)号：US20240022693A1

公开(公告)日：2024-01-18

申请号：US18475544

申请日：2023-09-27

Applicant: TOKYO ELECTRON LIMITED

Inventor： Norihisa KOGA ,  Tadashi NISHIYAMA ,  Yasuaki NODA

IPC: H04N7/18 ,  H04N23/56 ,  G01N21/88 ,  G06T7/00

CPC classification number: H04N7/183 ,  H04N23/56 ,  G01N21/8806 ,  G06T7/0004 ,  G01N2021/8812 ,  G06T2207/30148

Abstract: In one embodiment, a substrate imaging apparatus includes: a rotary holding unit that holds and rotates a substrate; a mirror member having a reflecting surface that opposes an end face of the substrate and a peripheral portion of a back surface of the substrate held by the rotary holding unit, the reflecting surface being inclined with respect to a rotation axis of the rotary holding unit; and a camera having an imaging device that receives both first light and second light through a lens, the first light coming from a peripheral portion of a front surface of the substrate held by the rotary holding unit, and the second light being a reflected light of second light which comes from the end face of the substrate held by the rotary holding unit and is reflected by the reflecting surface.

公开(公告)号：US20200041913A1

公开(公告)日：2020-02-06

申请号：US16521052

申请日：2019-07-24

Applicant: TOKYO ELECTRON LIMITED

Inventor： Norihisa KOGA ,  Yoshitaka KONISHI ,  Naruaki IIDA ,  Yuzo OHISHI ,  Kazuhiro TAKESHITA

IPC: G03F7/20 ,  H01L21/027

Abstract: There is provided a substrate processing apparatus including: a light radiator configured to radiate a light for processing into an irradiation area which is smaller than a processing target area of a surface of a substrate; a driver configured to move the irradiation area in two directions that cross each other in a plane along the surface of the substrate; and a controller configured to control the driver to move an irradiation position in two directions according to a movement pattern which has been set to radiate the light to an entire area of the processing target area.

公开(公告)号：US20220317575A1

公开(公告)日：2022-10-06

申请号：US17703211

申请日：2022-03-24

Applicant: Tokyo Electron Limited

Inventor： Kazuya IWATA ,  Norihisa KOGA

IPC: G03F7/20

Abstract: A substrate processing apparatus includes light source configured to irradiate a substrate having thereon a resist film made of a resist material for EUV lithography with light including vacuum ultraviolet light before an exposure process, and a light amount suppressing member provided in an optical path of the light from the light source and configured to suppress an amount of the light reaching a surface of the substrate such that the light becomes weak light as a whole in an irradiation region, wherein the light including the vacuum ultraviolet light contains a continuous spectral component of at least a portion of a band contained in a wavelength of 10 nm to 200 nm.

公开(公告)号：US20170244936A1

公开(公告)日：2017-08-24

申请号：US15437869

申请日：2017-02-21

Applicant: Tokyo Electron Limited

Inventor： Norihisa KOGA ,  Tadashi NISHIYAMA ,  Yasuaki NODA

IPC: H04N7/18 ,  G06T7/00 ,  G01N21/88 ,  H04N5/225

Abstract: In one embodiment, a substrate imaging apparatus includes: a rotary holding unit that holds and rotates a substrate; a mirror member having a reflecting surface that opposes an end face of the substrate and a peripheral portion of a back surface of the substrate held by the rotary holding unit, the reflecting surface being inclined with respect to a rotation axis of the rotary holding unit; and a camera having an imaging device that receives both first light and second light through a lens, the first light coming from a peripheral portion of a front surface of the substrate held by the rotary holding unit, and the second light being a reflected light of second light which comes from the end face of the substrate held by the rotary holding unit and is reflected by the reflecting surface.