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    Application system and corresponding application method
    2.
    发明授权
    Application system and corresponding application method 有权

    公开(公告)号：US10076766B2

    公开(公告)日：2018-09-18

    申请号：US15022379

    申请日：2014-09-01

    申请人： Durr Systems GmbH

    发明人： Manuel Stupp

    IPC分类号： F16K31/02 ,  B05C11/10 ,  G01F25/00

    CPC分类号： B05C11/1013 ,  G01F25/0007 ,  G01F25/0015 ,  G01F25/0038

    摘要： The disclosure relates to an application system and to an application method for applying a fluid (e.g., polyvinyl chloride, adhesive, paint, lubricant, preservation wax, sealant, or PUR foam) to a component (e.g., motor vehicle body component), comprising a flow measuring cell for measuring a quantity flow of the fluid and for producing a measurement signal corresponding to the measured quantity flow, and an evaluating unit for determining the quantity flow from the measurement signal of the flow measuring cellin accordance with a measuring specification. The disclosure further provides a calibrating device for automatically calibrating the measuring specification of the evaluating unit.

    Fluid pressure regulation system for fluid-dispensing systems
    6.
    发明授权
    Fluid pressure regulation system for fluid-dispensing systems 有权
    用于流体分配系统的流体压力调节系统

    公开(公告)号：US09501067B2

    公开(公告)日：2016-11-22

    申请号：US14480961

    申请日：2014-09-09

    申请人： GPD Global, Inc.

    发明人： Christian R. Vega ,  John W. Kohler ,  Alvin R. Miller

    IPC分类号： B67D1/00 ,  G05D16/20 ,  B05C11/10

    CPC分类号： G05D16/2013 ,  B05C11/1013 ,  H05K2203/0126 ,  Y10T137/0396 ,  Y10T137/86002

    摘要： A system actively regulates the fluid pressure entering the pump of a fluid-dispensing system to provide a more uniform fluid flow exiting the pump. The pump is supplied with fluid from a pressurized reservoir (e.g., that is pressurized from an external air source, or by mechanical or electrically-driven pressurization). A pressure sensor monitors the fluid pressure in the fluid supply line between the reservoir and pump. A controller receives this fluid pressure reading as an input to regulate the pressurization of the reservoir. Optionally, a second pressure sensor can be used to monitor the fluid pressure at the pump exit to provide an additional input for the controller.

    摘要翻译： 系统主动地调节进入流体分配系统的泵的流体压力，以提供离开泵的更均匀的流体流。 泵从加压储存器（例如，从外部空气源加压，或通过机械或电驱动的加压）供应流体。 压力传感器监测储存器和泵之间的流体供应管线中的流体压力。 控制器接收该流体压力读数作为输入以调节储存器的加压。 可选地，可以使用第二压力传感器来监测泵出口处的流体压力，以为控制器提供附加输入。

    Discharge system
    7.
    发明授权
    Discharge system 有权
    放电系统

    公开(公告)号：US09463487B2

    公开(公告)日：2016-10-11

    申请号：US14433013

    申请日：2013-10-01

    申请人： HEISHIN LTD.

    发明人： Yusuke Tanaka

    IPC分类号： B05C11/10 ,  B05C5/02 ,  B05C5/00

    CPC分类号： B05C11/1013 ,  B05C5/00 ,  B05C5/001 ,  B05C5/0212 ,  B05C5/0225

    摘要： The adhesion of a fluid to a connecting device for connecting a discharge device and a filling device to each other so as to fill the fluid into the discharge device is suppressed. A discharge system includes a discharge device capable of being filled with a fluid for discharge and discharging the fluid, a filling device for filling the fluid into the discharge device, a connecting device for connecting the discharge device and the filling device to each other in a separable manner, and a control device. The control device of the discharge system controls an operation speed during a separating operation of separating the discharge device from the filling device to be equal to or less than an operation speed during a connecting operation of connecting the discharge device to the filling device.

    摘要翻译： 抑制流体与用于将排出装置和填充装置相互连接以将流体填充到排出装置中的连接装置的粘附。 排出系统包括能够填充流体以用于排出和排出流体的排出装置，用于将流体填充到排出装置中的填充装置，用于将排出装置和填充装置彼此连接的连接装置 可分离的方式，以及控制装置。 排出系统的控制装置控制在将排出装置与填充装置分离的分离操作期间的操作速度等于或小于在将排出装置连接到填充装置的连接操作期间的操作速度。

    Coating apparatus
    8.
    发明授权
    Coating apparatus 有权
    涂装设备

    公开(公告)号：US09401291B2

    公开(公告)日：2016-07-26

    申请号：US14525502

    申请日：2014-10-28

    申请人： Tokyo Electron Limited

    发明人： Yuji Mimura ,  Tetsuya Maki ,  Shigeto Tsuruta ,  Tatsumi Oonishi ,  Daisuke Ikemoto ,  Takahiro Masunaga

    IPC分类号： B05B12/02 ,  B05B1/04 ,  B05C5/02 ,  B05C11/10 ,  H01L21/67

    CPC分类号： H01L21/6715 ,  B05C5/0254 ,  B05C11/1013 ,  B05C11/1047 ,  H01L21/67253

    摘要： A coating apparatus includes: a slit nozzle including a retention chamber that retains the coating material; a moving mechanism that moves the slit nozzle; a pressure regulation unit that regulates a pressure inside the retention chamber; and a control unit that controls the moving mechanism and the pressure regulation unit to relatively move the slit nozzle with respect to the substrate while changing the pressure inside the retention chamber toward an atmospheric pressure from a negative pressure, wherein the control unit is configured to control the pressure regulation unit so that a change in the pressure inside the retention chamber in a start zone including a coating start position and an end zone including a coating end position becomes slower than a change in the pressure inside the retention chamber in a middle zone except the start zone and the end zone.

    摘要翻译： 涂布装置包括：狭缝喷嘴，其包括保持涂料的保留室; 使狭缝喷嘴移动的移动机构; 压力调节单元，其调节保持室内的压力; 以及控制单元，其控制所述移动机构和所述压力调节单元，以使所述狭缝喷嘴相对于所述基板相对移动，同时将所述保持室内的压力从负压变为大气压，其中，所述控制单元被配置为控制 压力调节单元，使得在包括涂层开始位置和包括涂层终止位置的端部区域的起始区域内的保持室内的压力变化比在中间区域中的保持室内部的压力变化慢，除了 起始区和结束区。