公开(公告)号：US20150108897A1

公开(公告)日：2015-04-23

申请号：US14512655

申请日：2014-10-13

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Yunosuke HASHIMOTO ,  Yohei ISHIDA

IPC: H05H1/46

CPC classification number: H05H1/46 ,  H01J37/32192 ,  H01J37/3222 ,  H01J37/32229 ,  H01J37/32935 ,  H01J37/3299 ,  H05H2001/4607

Abstract: Disclosed is a microwave plasma processing apparatus including: a processing container configured to define a processing space a microwave generator configured to generate microwaves for generating plasma of a processing gas introduced into the processing space, a distributor configured to distribute the microwaves to a plurality of waveguides using a variable distribution ratio, an antenna installed in the processing container to seal the processing space and configured to radiate the microwaves distributed to each of the plurality of waveguides by the distributor to the processing space, a monitor unit configured to monitor a power of the microwaves distributed to each of the plurality of waveguides by the distributor, and a distribution ratio control unit configured to correct the distribution ratio used for distribution of the microwaves by the distributor based on a difference between a ratio of the power of the microwaves monitored by the monitor unit and a previously designated distribution ratio.

Abstract translation: 公开了一种微波等离子体处理装置，包括：处理容器，被配置为限定处理空间，微波发生器被配置为产生用于产生引入到处理空间中的处理气体的等离子体的微波;分配器，被配置为将微波分布到多个波导 使用可变分配比率，安装在所述处理容器中的天线以密封所述处理空间并且被配置为将由所述分配器分配到所述多个波导中的每一个的微波辐射到所述处理空间;监视单元，被配置为监视所述处理空间的功率 通过分配器分配给多个波导中的每一个的微波，以及分配比率控制单元，其被配置为基于由所述分配器监视的微波的功率的比率来校正由分配器用于分配微波的分配比率 监控单元和以前指定的 分配比例。

公开(公告)号：US20200341043A1

公开(公告)日：2020-10-29

申请号：US16848483

申请日：2020-04-14

Applicant: Tokyo Electron Limited

Inventor： Kazushi KANEKO ,  Yohei ISHIDA

IPC: G01R29/02 ,  G01R29/08

Abstract: A method includes measuring first travelling wave power of a microwave having a single frequency peak and second travelling wave power having a single frequency peak, acquiring duty ratios of the first travelling wave power and the second travelling wave power based on measured values and a first determination threshold value, measuring third travelling wave power of a microwave having a bandwidth and fourth travelling wave power having a bandwidth, acquiring duty ratios of the third travelling wave power and the fourth travelling wave power based on measured values and a second determination threshold value, approximating a pulse width error between the first travelling wave power and the third travelling wave power and a pulse width error between the second travelling wave power and the fourth travelling wave power with linear functions, and determining the correction function based on the linear functions.

公开(公告)号：US20200035462A1

公开(公告)日：2020-01-30

申请号：US16523066

申请日：2019-07-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Yohei ISHIDA

IPC: H01J37/32 ,  H01P5/18 ,  H01P3/06

Abstract: A detection device includes a substrate on which a connector connected to a transmission line for microwaves, a detection circuit configured to convert the microwaves inputted from the transmission line via the connector to a detection value indicating power of the microwaves, and an output port configured to output the detection value obtained by the detection circuit are disposed. The detection device further includes a housing that has a first opening and a second opening and accommodates the substrate in a state where the connector is inserted into the first opening and the output port is inserted into the second opening. The detection device further includes a first sealing member provided at the first opening of the housing to seal a periphery of the connector; and a second sealing member provided at the second opening of the housing to seal a periphery of the output port.

公开(公告)号：US20180277339A1

公开(公告)日：2018-09-27

申请号：US15922215

申请日：2018-03-15

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Yohei ISHIDA ,  Hajime TAMURA

IPC: H01J37/32 ,  C23C16/511

CPC classification number: H01J37/32238 ,  C23C16/511 ,  H01J37/3211 ,  H01J37/32119 ,  H01J37/3222 ,  H01J37/32394 ,  H01J37/32577

Abstract: A microwave generator of a plasma processing apparatus of an embodiment includes a first module, a second module, and a combiner. The first module includes a distributor which distributes a high-frequency electric signal, and outputs a plurality of high-frequency electric signals. A plurality of amplifier modules of the second module respectively amplify the plurality of high-frequency electric signals from the first module to output a plurality of microwaves. The combiner combines the plurality of microwaves from the plurality of amplifier modules to output a microwave. Each of the plurality of amplifier modules has a DC/DC converter and an amplifier. The DC/DC converter steps down the voltage of a first direct-current power from an external direct-current power supply to output a second direct-current power. The amplifier amplifies a high-frequency electric signal by using the second direct-current power to output a microwave.

公开(公告)号：US20220130643A1

公开(公告)日：2022-04-28

申请号：US17513711

申请日：2021-10-28

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Yohei ISHIDA

IPC: H01J37/32

Abstract: There is provided a plasma processing apparatus. The apparatus comprises: a chamber body; and a power supply unit configured to output power for exciting a gas supplied to an inside of the chamber body. The power supply unit supplies, as power having a center frequency, a bandwidth, and a carrier pitch respectively corresponding to a set frequency, a set bandwidth, and a set carrier pitch that are indicated by a controller, power which is pulse-modulated so as to be a pulse frequency, a duty ratio, a high level, and a low level respectively corresponding to a set pulse frequency, a set duty ratio, a high-level set power, and a low-level set power indicated by the controller, and in which a pulse on time determined by the set pulse frequency and the set duty ratio is longer than a power fluctuation cycle of the power having the bandwidth.

公开(公告)号：US20150194292A1

公开(公告)日：2015-07-09

申请号：US14588114

申请日：2014-12-31

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Yunosuke HASHIMOTO ,  Yohei ISHIDA

IPC: H01J37/32 ,  G01R23/02 ,  C23C16/511 ,  H03L7/00

Abstract: Disclosed is a plasma processing apparatus including a processing container, a plasma generation mechanism, a regulation unit, a detection unit, and a determination unit. The plasma generation mechanism includes a microwave oscillator, and generates plasma within the processing container using microwaves oscillated by the microwave oscillator. The regulation unit regulates an oscillation frequency, which corresponds to a frequency of the microwaves oscillated by the microwave oscillator, to a predetermined frequency. The detection unit detects the oscillation frequency regulated to the predetermined frequency by the regulation unit. The determination unit determines the success/failure of regulation of the oscillation frequency by the regulation unit, using the oscillation frequency detected by the detection unit, or using a parameter which is changed depending on a difference between the oscillation frequency and the predetermined frequency.

Abstract translation: 公开了一种包括处理容器，等离子体产生机构，调节单元，检测单元和确定单元的等离子体处理装置。 等离子体产生机构包括微波振荡器，并使用由微波振荡器振荡的微波在处理容器内产生等离子体。 调节单元将对应于由微波振荡器振荡的微波的频率的振荡频率调节到预定频率。 检测单元通过调节单元检测调节到预定频率的振荡频率。 确定单元使用由检测单元检测到的振荡频率或使用根据振荡频率和预定频率之间的差异而改变的参数来确定调节单元调节振荡频率的成功/失败。

公开(公告)号：US20250006464A1

公开(公告)日：2025-01-02

申请号：US18830640

申请日：2024-09-11

Applicant: Tokyo Electron Limited

Inventor： Kazushi KANEKO ,  Yohei ISHIDA

IPC: H01J37/32

Abstract: A plasma processing apparatus performs plasma processing in a manner that first and second radio-frequency power supplies generate pulses, respectively, and a matching box controls load-side impedance of the second radio-frequency power supply, and includes: a calculation circuit that acquires power of corresponding reflected wave when the first radio-frequency power supply generates continuous pulse, and the second radio-frequency power supply generates intermittent pulse, based on different set parameters, and calculates an index value indicating the state of reflected wave; and a determination circuit that determines set parameters to be specified in the first and second radio-frequency power supplies, based on variation of each calculated index value, and derives a range to be excluded from a calculation target when the index value to be used for controlling the matcher is calculated.

公开(公告)号：US20200341106A1

公开(公告)日：2020-10-29

申请号：US16848510

申请日：2020-04-14

Applicant: Tokyo Electron Limited

Inventor： Kazushi KANEKO ,  Yohei ISHIDA

IPC: G01R35/00 ,  G01R29/08

Abstract: A method includes setting a setting duty ratio of a pulse to a predefined first setting duty ratio, detecting a measured value of power of a microwave, and calculating an error of the measured value of the power with respect to the setting power level for each setting power level, calculating a correction value for the power for each setting power level on the basis of the error, and determining a first function indicating a relationship between the setting power level and the correction value by logarithmically approximating the relationship between the setting power level and the correction value, and determining the correction function indicating a relationship among the setting duty ratio, the setting power level, and the correction value by approximating the correction value defined by the first function, and the predefined correction value at a setting duty ratio of 100%, with a linear function.

公开(公告)号：US20190057844A1

公开(公告)日：2019-02-21

申请号：US15999015

申请日：2018-08-20

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Yohei ISHIDA

IPC: H01J37/32

Abstract: A device includes a microwave generation unit that generates a microwave having a bandwidth, an output unit, a directional coupler, and a measurement unit. The microwave generation unit generates a microwave of which power is pulse-modulated to have a high level and a low level. The measurement unit determines a first high measured value and a first low measured value respectively indicating a high level and a low level of power of travelling waves in the output unit on the basis of parts of the travelling waves output from the directional coupler. The microwave generation unit controls high level power of the pulse-modulated microwave on the basis of and averaged first high measured value and high level setting power, and controls low level power of the pulse-modulated microwave on the basis of an averaged first low measured value and low level setting power.