公开(公告)号：US20230264233A1

公开(公告)日：2023-08-24

申请号：US18004132

申请日：2021-06-22

Applicant: Tokyo Electron Limited

Inventor： Kazuki KOSAI ,  Taisei INOUE ,  Yusuke TAKAMATSU ,  Takahisa OTSUKA ,  Masaru AMAI ,  Itaru KANNO ,  Hiroshi YANO

IPC: B08B3/14 ,  H01L21/67 ,  B01D29/56 ,  B01D29/60 ,  B01D35/143

CPC classification number: B08B3/14 ,  H01L21/67017 ,  B01D29/56 ,  B01D29/60 ,  B01D35/143 ,  B08B3/022

Abstract: A liquid processing apparatus includes: a storage tank that stores a processing liquid; a first circulation line that causes the processing liquid sent from the storage tank to pass through a first filter and to return to the storage tank; and at least one second circulation line that causes the processing liquid to pass through a second filter and to return to the storage tank, wherein the second circulation line is shorter in a flow path than the first circulation line, a second flow rate of the processing liquid flowing into the second circulation line is smaller than a first flow rate of the processing liquid flowing into the first circulation line at a downstream side of a location where the first circulation line and the second circulation line are joined, and the second filter is smaller in a filtration amount per unit time than the first filter.

公开(公告)号：US20210111043A1

公开(公告)日：2021-04-15

申请号：US16603044

申请日：2018-03-23

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yusuke TAKAMATSU ,  Yasuhiro TAKAKI ,  Shinichi UMENO ,  Shogo FUKUI

IPC: H01L21/67 ,  H01L21/687 ,  B08B3/08 ,  B01D19/02 ,  B01D19/00 ,  B01D29/52 ,  B05C11/10 ,  B05C5/02

Abstract: A liquid supply device includes: a storage tank configured to store a processing liquid including a first processing liquid (sulfuric acid) and a second processing liquid (hydrogen peroxide solution); a circulation path having a first pipeline through which the processing liquid passes in a horizontal direction, and configured to circulate the processing liquid stored in the storage tank; a branch path configured to supply the processing liquid to a processing unit; and a branching part having an opening for allowing the processing liquid to flow out from the first pipeline to the branch path, wherein the opening is formed in the branching part and formed below a periphery of the first pipeline when the first pipeline is viewed in section.

公开(公告)号：US20210210363A1

公开(公告)日：2021-07-08

申请号：US17141670

申请日：2021-01-05

Applicant: Tokyo Electron Limited

Inventor： Hiroki SAKURAI ,  Daisuke GOTO ,  Takashi NAKAZAWA ,  Yusuke TAKAMATSU ,  Yusuke HASHIMOTO

IPC: H01L21/67 ,  H01L21/687 ,  B08B3/02 ,  B08B3/08 ,  B08B3/10

Abstract: A substrate processing apparatus includes: a temperature raising part for raising a temperature of a first sulfuric acid; a mixing part for mixing the first sulfuric acid where the temperature is raised by the temperature raising part with a moisture-containing liquid to generate a mixed solution; and a discharging part for discharging the mixed solution onto a substrate inside a substrate processing part. The mixing part includes: a joining portion where a sulfuric acid supply line through which the first sulfuric acid where the temperature is raised by the temperature raising part flows and a liquid supply line through which the first sulfuric acid where the temperature is raised by the temperature raising part and the moisture-containing liquid flows are joined; and a reaction suppression mechanism for suppressing a reaction between the first sulfuric acid and the moisture-containing liquid in the joining portion.