公开(公告)号：US20130220806A1

公开(公告)日：2013-08-29

申请号：US13883539

申请日：2011-11-02

申请人： Toru Iwaya ,  Hirobumi Muto ,  Hisayuki Takasu ,  Atsushi Kamino ,  Asako Kaneko

发明人： Toru Iwaya ,  Hirobumi Muto ,  Hisayuki Takasu ,  Atsushi Kamino ,  Asako Kaneko

IPC分类号： H01J37/20 ,  H01J37/30 ,  H01J37/305

CPC分类号： H01J37/3053 ,  H01J37/20 ,  H01J37/3005 ,  H01J37/3007 ,  H01J37/304 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/26

摘要： An ion milling device of the present invention is provided with a tilt stage (8) which is disposed in a vacuum chamber (15) and has a tilt axis parallel to a first axis orthogonal to an ion beam, a drive mechanism (9, 51) which has a rotation axis and a tilt axis parallel to a second axis orthogonal to the first axis and rotates or tilts a sample (3), and a switching unit which enables switching between a state in which the ion beam is applied while the sample is rotated or swung while the tilt stage is tilted, and a state in which the ion beams is applied while the tilt stage is brought into an untilted state and the sample is swung. Consequently, the ion milling device capable of performing cross-section processing and flat processing of the sample in the same vacuum chamber is implemented.

摘要翻译： 本发明的离子铣削装置设置有倾斜台（8），其设置在真空室（15）中并具有平行于与离子束正交的第一轴线的倾斜轴线，驱动机构（9,51 ），其具有旋转轴线和平行于与所述第一轴线正交的第二轴线的倾斜轴线，并且使样本（3）旋转或倾斜;以及切换单元，其能够在所述样本之间切换所述离子束的状态 在倾斜台倾斜时旋转或摆动，并且在倾斜台进入直到状态并且样品摆动的同时施加离子束的状态。 因此，实现了能够在相同的真空室中对样品进行横截面加工和平坦处理的离子铣削装置。

公开(公告)号：US08552407B2

公开(公告)日：2013-10-08

申请号：US13386980

申请日：2010-07-14

申请人： Asako Kaneko ,  Hirobumi Muto ,  Atsushi Kamino

发明人： Asako Kaneko ,  Hirobumi Muto ,  Atsushi Kamino

IPC分类号： G01N1/32

CPC分类号： H01J37/09 ,  G01N1/286 ,  H01J37/20 ,  H01J37/305 ,  H01J37/31

摘要： Disclosed is a shield (8, 10) disposed between an ion source (1) of an ion milling device and a sample (7) so as to be in contact with the sample. The shield is characterized by having a circular shape having an opening at the center, and by being capable of rotating about an axis (11) extending through the opening. Further, a groove is provided in the ion source-side surface of an end portion of the shield, and an inclined surface is provided on an end portion of the shield. Thus, an ion milling device having a shield, wherein the maximum number of machining operations can be increased, and the position of the shield can be accurately adjusted.

摘要翻译： 公开了设置在离子铣削装置的离子源（1）和样品（7）之间以与样品接触的屏蔽（8,10）。 该屏蔽的特征在于具有在中心具有开口的圆形形状，并且能够绕延伸穿过开口的轴线（11）旋转。 此外，在屏蔽的端部的离子源侧表面设置有槽，并且在屏蔽的端部设置有倾斜面。 因此，具有屏蔽件的离子铣削装置，其中可以增加最大数量的加工操作，并且可以精确地调节护罩的位置。

公开(公告)号：US20120126146A1

公开(公告)日：2012-05-24

申请号：US13386980

申请日：2010-07-14

申请人： Asako Kaneko ,  Hirobumi Muto ,  Atsushi Kamino

发明人： Asako Kaneko ,  Hirobumi Muto ,  Atsushi Kamino

IPC分类号： G21K5/00 ,  G21F3/00

CPC分类号： H01J37/09 ,  G01N1/286 ,  H01J37/20 ,  H01J37/305 ,  H01J37/31

摘要： Disclosed is a shield (8, 10) disposed between an ion source (1) of an ion milling device and a sample (7) so as to be in contact with the sample. The shield is characterized by having a circular shape having an opening at the center, and by being capable of rotating about an axis (11) extending through the opening. Further, a groove is provided in the ion source-side surface of an end portion of the shield, and an inclined surface is provided on an end portion of the shield. Thus, an ion milling device having a shield, wherein the maximum number of machining operations can be increased, and the position of the shield can be accurately adjusted.

摘要翻译： 公开了设置在离子铣削装置的离子源（1）和样品（7）之间以与样品接触的屏蔽（8,10）。 该屏蔽的特征在于具有在中心具有开口的圆形形状，并且能够绕延伸穿过开口的轴线（11）旋转。 此外，在屏蔽的端部的离子源侧表面设置有槽，并且在屏蔽的端部设置有倾斜面。 因此，具有屏蔽件的离子铣削装置，其中可以增加最大数量的加工操作，并且可以精确地调节护罩的位置。

公开(公告)号：US20080202920A1

公开(公告)日：2008-08-28

申请号：US12071543

申请日：2008-02-22

申请人： Toru Iwaya ,  Hirobumi Muto ,  Sakae Kobori

发明人： Toru Iwaya ,  Hirobumi Muto ,  Sakae Kobori

IPC分类号： C23C14/00

CPC分类号： H01J37/3053 ,  G01N1/32 ,  H01J37/20 ,  H01J2237/20214

摘要： In an ion milling system and an ion milling method for making unnecessary the effort of resetting a sample in a sample stage mechanism whenever a machining region is changed, the system includes an ion gun that generates an ion beam with which a sample is to be irradiated, a sample chamber within which the sample to be subjected to irradiation processing by the ion beam is put, an exhaust that evacuates air in order to maintain vacuum in the sample chamber, a gas injection mechanism that injects ion-generating gas, and a sample stage mechanism in which the sample is placed and which rotates with the sample set thereon. The sample stage mechanism has a rotary table that rotates with the sample set thereon, a rotating mechanism that drives the rotary table, an eccentric mechanism capable of eccentrically adjusting a positional relationship between a rotation center axis of the rotary table and a centerline of the ion beam, and a sample position adjusting mechanism capable of eccentrically adjusting a positional relationship between a centerline of the sample set on the sample stage and the rotation center axis of the rotary table.

摘要翻译： 在离子铣削系统和离子铣削方法中，每当加工区域改变时，不需要在样品台机构中复位样品的努力，该系统包括产生离子束的离子枪，样品将被照射 放置用于通过离子束进行照射处理的样品的样品室，排出空气以在样品室中保持真空的排气，注入离子产生气体的气体注入机构和样品 其中样品被放置并且随着样品在其上旋转而旋转。 样品台机构具有旋转台，其上设置有样品，旋转台，驱动旋转台的旋转机构，能够偏心地调节旋转台的旋转中心轴与离子的中心线之间的位置关系的偏心机构 光束和样品位置调节机构，其能够偏心地调节样品台上的样品集合的中心线与旋转台的旋转中心轴线之间的位置关系。