Acidic cleaning aqueous solution for aluminum and aluminum alloy and
process for cleaning the same
    1.
    发明授权
    Acidic cleaning aqueous solution for aluminum and aluminum alloy and process for cleaning the same 失效
    用于铝和铝合金的酸性清洗水溶液及其清洗方法

    公开(公告)号:US5514293A

    公开(公告)日:1996-05-07

    申请号:US219283

    申请日:1994-03-28

    IPC分类号: C23G1/12 C09K13/06

    CPC分类号: C23G1/125

    摘要: Disclosed is an acidic cleaning aqueous solution for aluminum and aluminum alloy and a process for cleaning the same, intended to execute acidic cleaning without using harmful fluoride and chloride ions.The oxidation-reduction potential of a cleaning bath is controlled to be at 0.5 to 0.8 V (vs. Ag-AgCl). The cleaning bath is obtained by diluting an acidic cleaning aqueous solution for aluminum and aluminum alloy to a predetermined volume. The acidic cleaning aqueous solution contains specified amounts of at least one of inorganic acids, Br.sup.- ions and oxidized metal ions, with the addition of a surfactant and oxidizing agent if necessary.It is thus possible to present a uniform etching effect irrespective of low temperature (below 60.degree. C.) without containing fluoride ions and chromic ions within the acidic cleaning aqueous solution. Br.sup.- also has an effect of inhibiting the oxidation-decomposition reaction of the surfactant arising from the oxidizing agent and oxidized metal ions, thereby obtaining a long-life acidic cleaning aqueous solution.

    摘要翻译: 公开了一种用于铝和铝合金的酸性清洗水溶液及其清洗方法,其目的是在不使用有害的氟化物和氯离子的情况下进行酸性清洗。 将清洗液的氧化还原电位控制在0.5〜0.8V(相对于Ag-AgCl)。 通过将铝和铝合金的酸性清洗水溶液稀释至预定体积来获得清洗浴。 酸性清洗水溶液含有规定量的无机酸,Br离子和氧化金属离子中的至少一种,如果需要加入表面活性剂和氧化剂。 因此,在酸性清洗水溶液中不含氟离子和铬离子的情况下,不管低温(低于60℃)都不会出现均匀的蚀刻效果。 Br-还具有抑制由氧化剂和氧化金属离子引起的表面活性剂的氧化分解反应的效果,从而得到长寿命的酸性清洗水溶液。

    Rust inhibiting coating composition for zinc, zinc alloy plated or
unplated steel
    2.
    发明授权
    Rust inhibiting coating composition for zinc, zinc alloy plated or unplated steel 失效
    锌,锌合金电镀或未镀钢的防锈涂料组合物

    公开(公告)号:US5731372A

    公开(公告)日:1998-03-24

    申请号:US626930

    申请日:1996-04-03

    CPC分类号: C09D5/08

    摘要: The invention provides a rust inhibiting technology for zinc-coated and uncoated steel which insures at least the equivalent of results obtainable by the technology using a Cr-containing coating composition. This method comprises coating a zinc-coated or uncoated steel substrate with a water-based resin composition comprising a carboxylated polyolefin resin and 70-0 part by weight of solid matter of at least one member selected from the group consisting of polyurethane resin, polyester resin, acrylic resin, epoxy resin, and alkyd resin as supplemented with 0.01-0.5 part by weight of phosphate ion based on 100 parts by weight of total solid matter of said water-based resin composition and adjusted to a pH value of not less than 7, either followed by heating the coated substrate at 50.degree.-250.degree. C. to dry the coat or preceded by heating said steel substrate at 50.degree.-250.degree. C. to let the then-applied coat dry spontaneously.

    摘要翻译: 本发明提供了一种用于镀锌和未涂覆钢的防锈技术,其至少确保了通过使用含Cr涂料组合物的技术获得的结果的等效结果。 该方法包括用包含羧化聚烯烃树脂的水性树脂组合物涂覆锌涂层或未涂覆钢基材,和70重量份选自聚氨酯树脂,聚酯树脂中的至少一种的固体物质 ,丙烯酸树脂,环氧树脂和醇酸树脂,补充有0.01-0.5重量份磷酸根离子,基于100重量份所述水基树脂组合物的总固体物质,并调节至不小于7的pH值 然后在50-250℃下加热涂覆的基材以干燥涂层,或者在50℃-250℃之前加热所述钢基材,使随后施涂的涂层自发干燥。

    Substrate cleaning method and substrate cleaning apparatus
    3.
    发明授权
    Substrate cleaning method and substrate cleaning apparatus 有权
    基板清洗方法和基板清洗装置

    公开(公告)号:US08980013B2

    公开(公告)日:2015-03-17

    申请号:US13486084

    申请日:2012-06-01

    摘要: A substrate cleaning method that includes: a step in which, while a substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a shortest distance between an edge of a cleaning liquid flow output from the cleaning-liquid nozzle and an edge of a gas flow output from the gas nozzle is set between 9 mm and 15 mm.

    摘要翻译: 一种基板清洗方法,其特征在于,包括:在基板保持件持续旋转的同时,将基板上的清洗液的排出位置变更为偏离基板的中心部的偏心位置, 气体从气体喷嘴排出到基板的中心部分,以便在从清洗液喷嘴输出的清洗液流的边缘之间的最短距离的条件下形成清洁液体的干燥区域 并且从气体喷嘴输出的气流的边缘被设定在9mm和15mm之间。

    Developing apparatus, developing method and storage medium
    4.
    发明授权
    Developing apparatus, developing method and storage medium 有权
    显影装置,显影方法和存储介质

    公开(公告)号:US08956694B2

    公开(公告)日:2015-02-17

    申请号:US12904458

    申请日:2010-10-14

    IPC分类号: B05D3/12 G03C5/29 G03F7/30

    CPC分类号: G03F7/3021

    摘要: A pretreatment process, carried out prior to a developing process, spouts pure water, namely, a diffusion-assisting liquid for assisting the spread of a developer over the surface of a wafer, through a cleaning liquid spouting nozzle onto a central part of the wafer to form a puddle of pure water. The developer is spouted onto the central part of the wafer for prewetting while the wafer is rotated at a high rotating speed to spread the developer over the surface of the wafer. The developer dissolves the resist film partly and produces a solution. The rotation of the wafer is reversed, for example, within 7 s in which the solution is being produced to reduce the water-repellency of the wafer by spreading the solution over the entire surface of the wafer. Then, the developer is spouted onto the rotating wafer to spread the developer on the surface of the wafer.

    摘要翻译: 在显影过程之前进行的预处理过程,喷出纯水,即用于辅助显影剂在晶片表面上的扩散的扩散辅助液体,通过清洗液喷射喷嘴到达晶片的中心部分 形成一个纯净的水坑。 将显影剂喷射到晶片的中心部分以进行预润湿,同时晶片以高转速旋转以将显影剂铺展在晶片的表面上。 显影剂部分地溶解抗蚀剂膜并产生溶液。 晶片的旋转例如在7秒内相反,其中产生溶液以通过在晶片的整个表面上扩散溶液来降低晶片的拒水性。 然后,将显影剂喷射到旋转的晶片上,以将显影剂铺展在晶片的表面上。

    Liquid-crystal display and signal converting circuit
    5.
    发明授权
    Liquid-crystal display and signal converting circuit 有权
    液晶显示和信号转换电路

    公开(公告)号:US08947476B2

    公开(公告)日:2015-02-03

    申请号:US13520243

    申请日:2011-01-06

    摘要: A liquid crystal display device includes a liquid crystal display panel and a driving circuit that supplies display signals to a plurality of subpixels of the liquid crystal display panel. The plurality of subpixels are a red subpixel, a green subpixel, a blue subpixel, and a yellow subpixel. When achromatic colors of at least some gray levels among all gray levels are to be displayed by the pixel, display signals which are supplied to a first subpixel group composed of certain two subpixels are display signals of the same grayscale level, whereas display signals which are supplied to a second subpixel group composed of the other two subpixels are display signals of a different grayscale level from the grayscale level of the display signals supplied to the first subpixel group. The first subpixel group includes the yellow subpixel, and the second subpixel group includes the blue subpixel.

    摘要翻译: 液晶显示装置包括液晶显示面板和向液晶显示面板的多个子像素提供显示信号的驱动电路。 多个子像素是红色子像素,绿色子像素,蓝色子像素和黄色子像素。 当由像素显示所有灰度级中的至少一些灰度级的无彩色时,提供给由特定两个子像素构成的第一子像素组的显示信号是相同灰度级的显示信号,而显示信号 提供给由其他两个子像素构成的第二子像素组是从提供给第一子像素组的显示信号的灰度级别的不同灰度级的显示信号。 第一子像素组包括黄色子像素,第二子像素组包括蓝色子像素。

    LIQUID-CRYSTAL DISPLAY DEVICE
    6.
    发明申请
    LIQUID-CRYSTAL DISPLAY DEVICE 有权
    液晶显示装置

    公开(公告)号:US20140253422A1

    公开(公告)日:2014-09-11

    申请号:US14241766

    申请日:2012-08-28

    IPC分类号: G09G3/36

    摘要: This liquid crystal display device (100) includes a pixel defined by a plurality of subpixels that includes red, green, blue and yellow subpixels (R, G, B, Ye). As long as the sum of respective luminances of all of the subpixels but the blue subpixel (B) falls within the range of 0% to 50% while the color displayed by the pixel is changing from the color blue in which the blue subpixel (B) is at the highest grayscale level and the other subpixels are at the lowest grayscale level into the color white in which all of those subpixels are at the highest grayscale level substantially without changing its hue, the yellow subpixel (Ye) starts to increase its grayscale level at a different timing, and/or has its grayscale level increased at a different ratio with respect to an increase in the pixel's luminance, from the red and green subpixels (R, G) do.

    摘要翻译: 该液晶显示装置(100)包括由包括红色,绿色,蓝色和黄色子像素(R,G,B,Ye)的多个子像素限定的像素。 只要所有子像素而蓝色子像素(B)的各亮度的和落在0%〜50%的范围内,而由像素显示的颜色从蓝色子像素(B )处于最高灰度级,其他子像素处于最低灰度级,进入白色,其中所有这些子像素基本上处于最高灰度级,而不改变其色调,黄色子像素(Ye)开始增加其灰度 在与红色和绿色子像素(R,G)do相对于像素亮度增加的不同比例增加和/或其灰度等级增加。

    LIQUID CRYSTAL DISPLAY APPARATUS
    7.
    发明申请
    LIQUID CRYSTAL DISPLAY APPARATUS 审中-公开
    液晶显示装置

    公开(公告)号:US20140118423A1

    公开(公告)日:2014-05-01

    申请号:US14128643

    申请日:2012-06-22

    IPC分类号: G09G3/20

    摘要: Viewing angle characteristics on the entire display surface are improved while suppressing harmful effects such as flicker and banding caused by viewing angle improvement control. A liquid crystal display apparatus (1) includes: a liquid crystal panel (11) which includes a plurality of pixels arranged in a matrix; a drive control unit (24) which performs viewing angle improvement processing by converting a gradation of a video signal input to the pixel; and a processing object determination unit (22) which determines whether or not an image displayed on each of the pixels of the liquid crystal panel (11) is an image having an intermediate color. The drive control unit (24) is configured to perform the viewing angle improvement processing on the pixel determined by the processing object determination unit (22) such that the pixel displays the image having the intermediate color.

    摘要翻译: 改善了整个显示面上的视角特性,同时抑制由视角改善控制引起的闪烁和带状等有害影响。 液晶显示装置(1)包括:液晶面板(11),包括以矩阵排列的多个像素; 驱动控制单元(24),其通过转换输入到像素的视频信号的灰度来执行视角改善处理; 以及处理对象确定单元(22),其确定在液晶面板(11)的每个像素上显示的图像是否是具有中间颜色的图像。 驱动控制单元(24)被配置为对由处理对象确定单元(22)确定的像素执行视角改善处理,使得像素显示具有中间颜色的图像。

    SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS
    9.
    发明申请
    SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS 审中-公开
    基板清洗方法和基板清洗装置

    公开(公告)号:US20120234362A1

    公开(公告)日:2012-09-20

    申请号:US13486084

    申请日:2012-06-01

    IPC分类号: B08B7/04 B08B3/02 B08B5/02

    摘要: A substrate cleaning method that includes: a step in which, while a substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a shortest distance between an edge of a cleaning liquid flow output from the cleaning-liquid nozzle and an edge of a gas flow output from the gas nozzle is set between 9 mm and 15 mm.

    摘要翻译: 一种基板清洗方法,其特征在于,包括:在基板保持件持续旋转的同时,将基板上的清洗液的排出位置变更为偏离基板的中心部的偏心位置, 气体从气体喷嘴排出到基板的中心部分,以便在从清洗液喷嘴输出的清洗液流的边缘之间的最短距离的条件下形成清洁液体的干燥区域 并且从气体喷嘴输出的气流的边缘被设定在9mm和15mm之间。

    Coating and developing apparatus, developing method and non-transitory medium
    10.
    发明授权
    Coating and developing apparatus, developing method and non-transitory medium 有权
    涂层和显影装置,显影方法和非暂时介质

    公开(公告)号:US08262300B2

    公开(公告)日:2012-09-11

    申请号:US13025300

    申请日:2011-02-11

    IPC分类号: G03B13/00 G03D5/00

    摘要: A coating and developing apparatus develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table.

    摘要翻译: 涂层和显影设备开发其表面被抗蚀剂涂覆并暴露于光的基底。 涂料和显影装置包括显影模块; 清洁模块; 以及传送机构,其构造成将由显影模块显影的基板传送到清洁模块。 显影模块包括构造成形成处理气氛的气密密封处理容器; 设置在处理容器中并安装在其上的温度控制板并冷却基板; 以及气氛气体供给单元,被构造成将处理容器内的显影液的气雾气体气体供给至基板的表面。 清洁模块包括:安装台,其安装在其上; 以及清洗液供给单元,其构造成将清洗液供给到安装在所述安装台上的基板。