摘要:
A method for manufacturing doped substrates using a continuous large area scanning implantation process is disclosed. In one embodiment, the method includes providing a movable track member. The movable track member is provided in a chamber. The chamber includes an inlet and an outlet. In a specific embodiment, the movable track member can include one or more rollers, air bearings, belt member, and/or movable beam member to provide one or more substrates for a scanning process. The method may also include providing a first substrate. The first substrate includes a first plurality of tiles. The method maintains the first substrate including the first plurality of tiles in a vacuum. The method includes transferring the first substrate including the first plurality of tiles from the inlet port onto the movable track member. The first plurality of tiles are subjected to a scanning implant process. The method also includes maintaining a second substrate including a second plurality of tiles in the vacuum. The method includes transferring the second substrate including a second plurality of tiles from the inlet port onto the movable track member. The method includes subjecting the second plurality of tiles to an implant process using the scanning implant process.
摘要:
When writing a hard disk pattern on a substrate applied with a resist by scanning an electron beam on the substrate while rotating a rotation stage, writing is started with respect to each radial direction position of each area based on a predetermined encoder pulse for each radial direction position among those generated according to the rotational angle of the rotation stage that occurs after a predefined encoder pulse that occurs ahead in a rotational direction of a radial direction position whose write start position in a circumferential direction in each area arrives first at the writing position as the rotation stage rotates and ahead of the write start position in the circumferential direction with respect to each radial direction position, and after a predetermined time from the predetermined encoder pulse.
摘要:
When writing a hard disk pattern on a substrate applied with a resist by scanning an electron beam on the substrate while rotating a rotation stage, writing is started with respect to each radial direction position of each area based on a predetermined encoder pulse for each radial direction position among those generated according to the rotational angle of the rotation stage that occurs after a predefined encoder pulse that occurs ahead in a rotational direction of a radial direction position whose write start position in a circumferential direction in each area arrives first at the writing position as the rotation stage rotates and ahead of the write start position in the circumferential direction with respect to each radial direction position, and after a predetermined time from the predetermined encoder pulse.
摘要:
The present invention is directed to a method for irradiating of solids containing petroleum or petroleum derived compounds (PPDCs), such as soils, oily sludge, drill cuttings, sediments, and non-commercial petroleum industry products, with electron beams in order to physically and/or chemically alter the composition of the PPDCs. The method includes the step of separating PPDC gas and liquids in the presence of a gas driver. Optionally, the method includes the steps of treating off-gases and applying one or more amendments to PPCD-impacted solid material pre-irradiation, post-irradiation, or during electron beam irradiation.
摘要:
An evacuation structure of a charged particle beam device includes: a vacuum chamber provided with a charged particle source; vacuum piping connected to the vacuum chamber; a main vacuum pump which is connected via the vacuum piping and evacuates the inside of the vacuum chamber; a non-evaporable getter pump disposed at a position between the vacuum chamber and the main vacuum pump in the vacuum piping; and a coarse evacuation port connected at a position between the vacuum chamber and the non-evaporable getter pump in the vacuum piping The coarse evacuation port includes: a coarse evacuation valve that opens and closes the coarse evacuation port; and a leak valve to open the vacuum chamber to the atmosphere.
摘要:
The present invention is directed to a method for irradiating of solids containing petroleum or Petroleum derived compounds (PPDCs), such as soils, oily sludge, drill cuttings, sediments, and non-commercial petroleum industry products, with electron beams in order to physically and/or chemically alter the composition of the PPDCs. The method includes the step of separating PPDC gas and liquids in the presence of a gas driver. Optionally, the method includes the steps of treating off-gases and applying one or more amendments to PPCD-impacted solid material pre-irradiation, post-irradiation, or during electron beam irradiation.
摘要:
A high-resolution sample image is acquired by eliminating both of charge over an entire sample (global charge) and charge in a local region irradiated with a primary charged particle beam (local charge). An electrode unit (50) according to the present invention is used in a charged particle beam device. The electrode unit (50) includes a plate electrode disposed facing an insulator sample between an objective lens and the sample, and further includes: a first charge-neutralization charged particle beam source which emits a first charged particle beam to eliminate local charge on the sample; and a second charge-neutralization charged particle beam source (25) which emits a second charged particle beam to eliminate global charge on the sample. A first hole (53) through which a primary charged particle beam passes, and a second hole through which the second charged particle beam is emitted are provided in the plate electrode, and the first and second charge-neutralization charged particle beam sources are disposed at such positions as not to interfere with each other. The charged particle beam emitted from the first charge-neutralization charged particle beam source is introduced in the vicinity of the first hole (53).
摘要:
Means for achieving the purpose of the present invention includes an field emission type cathode composed of a single fibrous carbon substance and a conductive substrate supporting the same; an extraction apparatus for causing field emission of electrons; and an accelerator for accelerating electrons, wherein the aforementioned field emission type electron gun is further contains means for heating the aforementioned field emission cathode, and means for applying the voltage of the polarity that does not allow the aforementioned field emission type cathode to field-emit electrons.Thereby, the amorphous carbon is removed from the tip end of the fibrous carbon substance of the field emission type electron gun, without the tip end thereof being damaged.
摘要:
Means for achieving the purpose of the present invention includes an field emission type cathode composed of a single fibrous carbon substance and a conductive substrate supporting the same; an extraction apparatus for causing field emission of electrons; and an accelerator for accelerating electrons, wherein the aforementioned field emission type electron gun is further contains means for heating the aforementioned field emission cathode, and means for applying the voltage of the polarity that does not allow the aforementioned field emission type cathode to field-emit electrons.Thereby, the amorphous carbon is removed from the tip end of the fibrous carbon substance of the field emission type electron gun, without the tip end thereof being damaged.
摘要:
A method for manufacturing doped substrates using a continuous large area scanning implantation process is disclosed. In one embodiment, the method includes providing a movable track member. The movable track member is provided in a chamber. The chamber includes an inlet and an outlet. In a specific embodiment, the movable track member can include one or more rollers, air bearings, belt member, and/or movable beam member to provide one or more substrates for a scanning process. The method may also include providing a first substrate. The first substrate includes a first plurality of tiles. The method maintains the first substrate including the first plurality of tiles in a vacuum. The method includes transferring the first substrate including the first plurality of tiles from the inlet port onto the movable track member. The first plurality of tiles are subjected to a scanning implant process. The method also includes maintaining a second substrate including a second plurality of tiles in the vacuum. The method includes transferring the second substrate including a second plurality of tiles from the inlet port onto the movable track member. The method includes subjecting the second plurality of tiles to an implant process using the scanning implant process.