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18 条记录 (耗时 0.025 秒)

    Triazole compound and insecticide composition containing the same
    1.
    发明授权
    Triazole compound and insecticide composition containing the same 失效
    三唑化合物和含有相同的杀虫剂组合物

    公开(公告)号：US5208231A

    公开(公告)日：1993-05-04

    申请号：US870836

    申请日：1992-04-20

    申请人： Toshiya Kimata ,  Tetsuo Tsuruya ,  Shunji Hayashi ,  Kazuhiro Kojima ,  Satoshi Yamanaka ,  Kiyoshi Sakuma

    发明人： Toshiya Kimata ,  Tetsuo Tsuruya ,  Shunji Hayashi ,  Kazuhiro Kojima ,  Satoshi Yamanaka ,  Kiyoshi Sakuma

    IPC分类号： A01N47/38 ,  C07D249/12 ,  C07D417/12

    CPC分类号： C07D417/12 ,  A01N47/38 ,  C07D249/12

    摘要： A triazole compound having the formula (I): ##STR1## wherein R.sub.1 and R.sub.2 represent a hydrogen atom, a lower alkyl group or a dialkylcarbamoyl group, or R.sub.1 and R.sub.2 may be bonded to form an alkylene group, an oxyalkylene group or a thioalkylene group which may be substituted with a lower alkyl group, R.sub.3 represents a hydrogen atom or CONRR' where R and R' represent an alkyl group, an alkenyl group, an alkynyl group, a cyanoalkyl group or a phenyl group or benzyl group which may be substituted, or R and R' may be bonded to form an alkylene group, an oxyalkylene group or a thioalkylene group which may be substituted with a lower alkyl group; R.sub.4 represents ##STR2## where R.sub.5 represents a hydrogen atom, a lower alkyl group or a phenyl group, R.sub.6 represents a lower alkyl group, or R.sub.5 and R.sub.6 may be bonded to form an alkylene group, with a proviso that R.sub.1 and R.sub.2 cannot be dialkylcarbamoyl groups at the same time, and an insecticide containing the triazole compound as an active component.

    摘要翻译： 具有式（I）的三唑化合物：其中R 1和R 2表示氢原子，低级烷基或二烷基氨基甲酰基，或者R 1和R 2可以键合形成亚烷基，氧化烯基 或可以被低级烷基取代的硫代亚烷基，R3表示氢原子或CONRR'，其中R和R'表示烷基，烯基，炔基，氰基烷基或苯基或苄基 可以被取代，或者R和R'可以键合以形成可被低级烷基取代的亚烷基，氧化烯基或硫代亚烷基; R4表示其中R5表示氢原子，低级烷基或苯基，R6表示低级烷基，或R5和R6可以键合形成亚烷基，其中R1和R2不能为 二烷基氨基甲酰基，同时含有三唑化合物作为活性成分的杀虫剂。

    Triazole compound and insecticide composition containing the same
    2.
    发明授权
    Triazole compound and insecticide composition containing the same 失效
    三唑化合物和含有它们的杀虫剂组合物

    公开(公告)号：US5155124A

    公开(公告)日：1992-10-13

    申请号：US528384

    申请日：1990-05-25

    申请人： Toshiya Kimata ,  Tetsuo Tsuruya ,  Shunji Hayashi ,  Kazuhiro Kojima ,  Satoshi Yamanaka ,  Kiyoshi Sakuma

    发明人： Toshiya Kimata ,  Tetsuo Tsuruya ,  Shunji Hayashi ,  Kazuhiro Kojima ,  Satoshi Yamanaka ,  Kiyoshi Sakuma

    IPC分类号： A01N47/38 ,  C07D249/12 ,  C07D417/12

    CPC分类号： C07D417/12 ,  A01N47/38 ,  C07D249/12

    摘要： A triazole compound having the formula (I): ##STR1## wherein R.sub.1 and R.sub.2 represent a hydrogen atom, a lower alkyl group or a dialkylcarbamoyl group, or R.sub.1 and R.sub.2 may be bonded to form an alkylene group, an oxyalkylene group or a thioalkylene group which may be substituted with a lower alkyl group, R.sub.3 represents a hydrogen atom or CONRR' where R and R' represent an alkyl group, an alkenyl group, an alkynyl group, a cyanoalkyl group or a phenyl group or benzyl group which may be substituted, or R and R' may be bonded to form an alkylene group, an oxyalkylene group or a thioalkylene group which may be substituted with a lower alkyl group; R.sub.4 represents ##STR2## where R.sub.5 represents a hydrogen atom, a lower alkyl group or a phenyl group, R.sub.6 represents a lower alkyl group, or R.sub.5 and R.sub.6 may be bonded to form an alkylene group, with a proviso that R.sub.1 and R.sub.2 cannot be dialkylcarbamoyl groups at the same time, and an insecticide containing the triazole compound as an active component.

    Controlling method for manufacturing process comprising determining a priority of manufacturing process needing recovery in response to degree of risk
    5.
    发明授权
    Controlling method for manufacturing process comprising determining a priority of manufacturing process needing recovery in response to degree of risk 有权
    制造过程的控制方法包括确定响应于风险程度需要恢复的制造过程的优先级

    公开(公告)号：US07151974B2

    公开(公告)日：2006-12-19

    申请号：US11061813

    申请日：2005-02-22

    申请人： Shunji Hayashi

    发明人： Shunji Hayashi

    IPC分类号： G06F19/00

    CPC分类号： G06Q10/10 ,  G05B19/41875 ,  G05B2219/31477 ,  G05B2219/32221 ,  Y02P90/14 ,  Y02P90/22

    摘要： In a method of controlling a manufacturing process, operating conditions of plural process steps are monitored during the manufacturing process. A degree of risk is calculated for each of a malfunction operating condition step and subsequent steps. The degree of risk is classified into plural levels and is determined in accordance with a risk point on the basis of the minimum WIP, actual WIP, target WIP, and a weighting factor. A priority of the manufacturing process needing recovery is determined in response to the degree of risk, and an operating condition of the manufacturing process is controlled in response to the priority determination.

    摘要翻译： 在制造过程的控制方法中，在制造过程中监视多个工序的操作条件。 针对每个故障运行条件步骤和后续步骤计算风险程度。 风险程度分为多个等级，并根据最小WIP，实际WIP，目标WIP和权重因子根据风险点确定。 响应于风险程度确定需要恢复的制造过程的优先级，并且响应于优先级确定来控制制造过程的操作条件。

    Method and system for managing semiconductor manufacturing equipment
    6.
    发明授权
    Method and system for managing semiconductor manufacturing equipment 失效
    管理半导体制造设备的方法和系统

    公开(公告)号：US07076318B2

    公开(公告)日：2006-07-11

    申请号：US10712100

    申请日：2003-11-14

    申请人： Shunji Hayashi

    发明人： Shunji Hayashi

    IPC分类号： G06F19/00

    摘要： A management method capable of making an accurate decision about a malfunction of the semiconductor manufacturing equipment includes sampling a plurality of data of at least one parameter under normal operating conditions of the semiconductor manufacturing equipment; generating a Mahalanobis space A from a group of sampled data; calculating a Mahalanobis distance from measured values of the parameter under ordinary operating conditions of the semiconductor manufacturing equipment; and deciding that a malfunction occurred in the semiconductor manufacturing equipment when the value of the Mahalanobis distance exceeds a predetermined value.

    摘要翻译： 能够对半导体制造装置的故障作出准确判断的管理方法包括在半导体制造装置的正常工作状态下取样至少一个参数的多个数据; 从一组采样数据生成马哈拉诺比斯空间A; 根据半导体制造设备的常规操作条件下的参数的测量值计算马氏距离; 并且当所述马氏距离的距离超过预定值时，确定在所述半导体制造设备中出现故障。

    Record sheet for use in electro-coagulation method
    7.
    发明授权
    Record sheet for use in electro-coagulation method 失效
    记录片用于电凝法

    公开(公告)号：US06231720B1

    公开(公告)日：2001-05-15

    申请号：US09223250

    申请日：1998-12-30

    申请人： Toyohisa Mouri ,  Masaya Shibatani ,  Yutaka Hattori ,  Shunji Hayashi ,  Toshio Takagi

    发明人： Toyohisa Mouri ,  Masaya Shibatani ,  Yutaka Hattori ,  Shunji Hayashi ,  Toshio Takagi

    IPC分类号： D21H1936

    CPC分类号： B41M5/5218 ,  B41C1/105 ,  B41M5/508 ,  Y10T428/273 ,  Y10T428/277 ,  Y10T428/31993

    摘要： A record sheet for use in an electro-coagulation printing method, which comprises a base sheet and a layer provided thereon composed of at least one filler selected from the group consisting of alumina sol, boemite, pseudo boemite, synthetic amorphous silica, silica sol and colloidal silica and a binder, wherein said record sheet satisfies the following properties; (i) a wet time of the record sheet obtained from a liquid absorption curve of pure water measured by a dynamic scanning absorptometer being not more than 15 milliseconds, (ii) an absorption coefficient of the record sheet obtained from a liquid absorption curve of pure water measured by a dynamic scanning absorptometer being at least 10 ml/m2s−½, and (iii) a contact ratio of the record sheet with the coagulated colloids measured by a specular reflection smoothness tester under a pressure of 40 kg/cm2 with a ray having a wavelength of 0.5 &mgr;m being at least 40% and further, (iv) a Beck smoothness of the coating layer surface measured in accordance with JIS P 8119 being 250 seconds or more.

    摘要翻译： 一种用于电凝式印刷方法的记录片，其包括基片和设置在其上的层，所述层由至少一种填充剂组成，所述填料选自氧化铝溶胶，波希米特，伪波希米特，合成无定形二氧化硅，硅溶胶和 胶体二氧化硅和粘合剂，其中所述记录片材满足以下特性;（i）由动态扫描吸收计测量的纯水的液体吸收曲线获得的记录片材的湿时间不超过15毫秒，（ii） 通过动态扫描吸收计测定的从纯水的液体吸收曲线获得的记录片的吸收系数为至少10ml / m 2·s 1/2，和（iii）记录片与凝固胶体的接触比由 镜面反射平滑度测试仪在40 kg / cm2的压力下，波长为0.5μm的光线至少为40％，此外，（iv）涂层表面的贝氏平滑度 按照JIS P 8119规定的时间为250秒以上。

    Dust removing system
    8.
    发明授权
    Dust removing system 失效
    除尘系统

    公开(公告)号：US5457847A

    公开(公告)日：1995-10-17

    申请号：US169206

    申请日：1993-12-20

    申请人： Hiroshi Uzawa ,  Shunji Hayashi

    发明人： Hiroshi Uzawa ,  Shunji Hayashi

    IPC分类号： B08B5/00 ,  B08B5/02 ,  A47L5/14

    CPC分类号： B08B5/026 ,  B08B5/02

    摘要： A casing having an air discharging chamber and an air sucking chamber is provided with a first jetting nozzle and a second jetting nozzle on the underside thereof. The first jetting nozzle and the second jetting nozzle jet supersonic airs such as to approach each other. A sucking nozzle is located between the first jetting nozzle and the second jetting nozzle to allow the working air to be sucked in the casing.

    摘要翻译： 具有排气室和吸气室的壳体在其下侧设置有第一喷射喷嘴和第二喷射喷嘴。 第一喷射喷嘴和第二喷射喷嘴喷射超音速空气以彼此接近。 吸嘴位于第一喷射喷嘴和第二喷射喷嘴之间，以允许工作空气被吸入壳体中。