公开(公告)号：US4597669A

公开(公告)日：1986-07-01

申请号：US539760

申请日：1983-10-07

申请人： Tsuneo Terasawa ,  Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka

发明人： Tsuneo Terasawa ,  Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka

IPC分类号： G01B11/00 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  G01N21/86

CPC分类号： G03F9/70 ,  H01L21/30

摘要： A pattern detector according to the present invention adopts a processing method wherein means is provided anew with which the intensity distribution of light reflected from or transmitted through an illuminated specimen is photoelectrically converted, and a pattern position is detected at high speed from the ratio between the primary moment and integral value of a detection signal thus derived, whereupon a symmetry calculation is executed within a narrow range around the detected value, whereby the pattern position is found fast and precisely.

摘要翻译： 根据本发明的图案检测器采用一种处理方法，其中重新提供装置，其中从被照射的样品反射或透射的光的光强分布被光电转换，并且以高速的比例检测图案位置 这样得到的检测信号的初始矩和积分值，由此在检测值附近的窄范围内执行对称计算，从而快速且精确地找到图案位置。

公开(公告)号：US4614432A

公开(公告)日：1986-09-30

申请号：US545642

申请日：1983-10-26

申请人： Shinji Kuniyoshi ,  Tsuneo Terasawa ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka ,  Akihiro Takanashi

发明人： Shinji Kuniyoshi ,  Tsuneo Terasawa ,  Toshiei Kurosaki ,  Yoshio Kawamura ,  Sumio Hosaka ,  Akihiro Takanashi

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F9/70

摘要： A pattern detector for precise position measurement of a wafer, used in a mask aligner used in manufacturing a semiconductor device is disclosed. A positioning pattern on the wafer is magnified and projected by a magnifying optical system and the magnified projected image is precisely detected to determine a position of the positioning pattern. As a light to form the magnified projected image, plurality of monochromatic lights of different wavelengths are available through optical filters and the magnifying optical systems are arranged one for each of the monochromatic lights. By selecting one of the optical filters, the magnified projected image of the positioning pattern is formed by the monochromatic light having an optimum wavelength to the wafer and the precise position of the positioning pattern on the wafer can be detected.

摘要翻译： 公开了一种用于在用于制造半导体器件的掩模对准器中使用的用于晶片的精确位置测量的图案检测器。 晶片上的定位图案由放大光学系统放大和投影，并且精确地检测放大的投影图像以确定定位图案的位置。 作为形成放大投影图像的光，通过光学滤光器可以获得不同波长的多个单色光，并且放大光学系统针对每个单色光布置一个。 通过选择一个滤光器，通过对晶片具有最佳波长的单色光来形成定位图案的放大投影图像，并且可以检测晶片上的定位图案的精确位置。

公开(公告)号：US4477183A

公开(公告)日：1984-10-16

申请号：US445079

申请日：1982-11-29

申请人： Yoshio Kawamura ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Tsuneo Terasawa

发明人： Yoshio Kawamura ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Tsuneo Terasawa

IPC分类号： H01L21/30 ,  G02B7/28 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F9/7026 ,  G02B7/28 ,  G03F9/7057

摘要： An automatic focusing apparatus according to the present invention is constructed of a base on which a substrate is placed, detection means for detecting a pressure of air which is caused to flow out of an interspace between the substrate and an orifice by spurting the air from the orifice toward the substrate, reference pressure generation means for generating a reference pressure which is necessary for setting a standard distance between the substrate and the orifice, a pressure transducer which receives pressure signals from said detection means and said reference pressure generation means and which converts a pressure difference between these pressure signals into an electric signal, base drive means for moving the substrate in parallel with the orifice on the basis of the output signal from said pressure transducer, and offset signal generation means for generating a signal which, when superposed on the output signal from said pressure transducer, serves to shift the substrate from the standard distance.

摘要翻译： 根据本发明的自动对焦装置由放置基板的基座构成，检测装置用于检测从基板和孔之间的空隙流出的空气的压力， 基准压力产生装置，用于产生设置基板和孔口之间的标准距离所必需的参考压力;压力传感器，其接收来自所述检测装置和所述基准压力产生装置的压力信号， 这些压力信号之间的压力差成为电信号;基础驱动装置，用于基于来自所述压力传感器的输出信号与所述孔平行地移动所述基板，以及偏移信号产生装置，用于产生当叠加在所述压力信号上时， 来自所述压力传感器的输出信号用于使衬底移动 标准距离。

公开(公告)号：US4504726A

公开(公告)日：1985-03-12

申请号：US327627

申请日：1981-12-04

申请人： Sumio Hosaka ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Yoshio Kawamura ,  Tsuneo Terasawa

发明人： Sumio Hosaka ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Yoshio Kawamura ,  Tsuneo Terasawa

IPC分类号： B23K26/08 ,  B23K26/12 ,  B41M5/24 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/428

CPC分类号： B23K26/0861 ,  B23K26/12 ,  B23K26/1224 ,  B23K26/123 ,  B41M5/24 ,  G03F1/76 ,  G03F7/704 ,  G03F7/70875 ,  H01L21/30

摘要： A pattern generator in which a workpiece to be machined into a desired pattern shape is held in vacuum and is irradiated with a laser beam condensed to be fine, while scanning the laser beam so as to depict the desired pattern shape, whereby the workpiece is directly machined in conformity with the desired pattern shape. As the workpiece, one in which a shading film (for example, chromium film) is deposited on a transparent glass substrate is employed, and it is irradiated with the laser beam in the vacuum, whereby the irradiated parts of the shading film are vaporized to fabricate a shading mask pattern of good quality.

摘要翻译： 一种图案发生器，其中待加工成所需图案形状的工件被保持在真空中并且被激光束照射以被精细地聚焦，同时扫描激光束以便描绘所需的图案形状，由此工件直接 根据所需的图案形状加工。 作为工件，使用在透明玻璃基板上沉积遮光膜（例如，铬膜）的工件，并在真空中照射激光束，使遮光膜的照射部分蒸发至 制作质量好的遮光罩图案。

公开(公告)号：US4441206A

公开(公告)日：1984-04-03

申请号：US330778

申请日：1981-12-14

申请人： Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Sumio Hosaka ,  Yoshio Kawamura ,  Tsuneo Terasawa

发明人： Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Sumio Hosaka ,  Yoshio Kawamura ,  Tsuneo Terasawa

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68 ,  G06K9/20 ,  G06K9/00 ,  H04N7/00

CPC分类号： G03F9/7088 ,  H01L21/30

摘要： A pattern detecting apparatus is disclosed which comprises, in order to detect the center of a positioning pattern on a sample with high accuracy in a wide range, means for illuminating the positioning pattern, means for defining an illumination range in which the positioning pattern is illuminated, means for focusing reflected light from the positioning pattern on a predetermined image plane, means for electrically detecting a bright and dark image on the image plane in accordance with positions on the image plane, means for removing a signal corresponding to the outside of the illumination range from the output signal of the detecting means and for holding, in place of the removed signal, a level of the output signal produced within the illumination range, and means for detecting a position of the center of the positioning pattern from the output signal of the holding means.

摘要翻译： 公开了一种图案检测装置，其包括为了在宽范围内高精度地检测样品上的定位图案的中心，用于照亮定位图案的装置，用于限定定位图案被照亮的照明范围的装置 用于将来自定位图案的反射光聚焦在预定图像平面上的装置，用于根据图像平面上的位置电学检测图像平面上的亮和暗图像的装置，用于去除对应于照明外部的信号的装置 范围从检测装置的输出信号，并且代替去除的信号，保持在照明范围内产生的输出信号的电平，以及用于从位置图的输出信号中检测定位图案的中心的位置的装置 持有手段。

公开(公告)号：US4057347A

公开(公告)日：1977-11-08

申请号：US670830

申请日：1976-03-26

申请人： Shigeo Moriyama ,  Tatsuo Harada ,  Yoshio Kawamura ,  Seiya Hashimoto ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka

发明人： Shigeo Moriyama ,  Tatsuo Harada ,  Yoshio Kawamura ,  Seiya Hashimoto ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka

IPC分类号： G03B27/32 ,  G02B27/18 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  G01B11/26 ,  G03B27/54

CPC分类号： G03F9/70

摘要： An improved optical exposure apparatus for use in exposing a workpiece to a desired light pattern with a high alignment accuracy and a high operational speed is disclosed. The apparatus comprises a moving table on which a workpiece to be exposed is disposed, a movable holder on which a mask having an original pattern is disposed, a light source for irradiating said mask, a reduction lens for projecting a reduced pattern of said original pattern onto said workpiece, means for positioning said moving table to a predetermined position, means for detecting the error of said table positioning, means for calculating a value of the error of positioning the workpiece divided by the reduction rate of the reduction lens, and means for automatically shifting said movable holder by the calculated value so as to cancel said error.

摘要翻译： 公开了一种用于以高对准精度和高操作速度将工件暴露于期望的光图案的改进的光学曝光装置。 该装置包括：移动台，设置待曝光的工件;可移动的保持器，其上设置有原始图案的掩模;用于照射所述掩模的光源;还原透镜，用于将所述原始图案的缩小图案投影 在所述工件上，用于将所述移动台定位到预定位置的装置，用于检测所述工作台定位误差的装置，用于计算所述工件定位误差值除以所述还原透镜的减速率的装置， 自动地将所述活动支架移动所述计算值，以便消除所述误差。

公开(公告)号：US4480910A

公开(公告)日：1984-11-06

申请号：US358436

申请日：1982-03-15

申请人： Akihiro Takanashi ,  Tatsuo Harada ,  Masamoto Akeyama ,  Yataro Kondo ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Yoshio Kawamura

发明人： Akihiro Takanashi ,  Tatsuo Harada ,  Masamoto Akeyama ,  Yataro Kondo ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Yoshio Kawamura

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G03B27/68

CPC分类号： G03F7/70241 ,  G03F7/2041 ,  G03F7/70341

摘要： There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).

摘要翻译： 公开了一种图案形成装置，用于将形成在掩模版上的图案投影在基板上的光致抗蚀剂层上，该基板包括用于照射用于形成光学图像的图案的照明系统，用于减少光学图案图像的缩小透镜 特定的缩小率，并且将减小的光学图案图像投影到形成在用于曝光光致抗蚀剂层的基板上的光致抗蚀剂层上;以及液体维持装置，用于用光学透明液体填充至少一部分还原透镜和光致抗蚀剂层之间的间隙 折射率大于1（1）。

公开(公告)号：US4380395A

公开(公告)日：1983-04-19

申请号：US152844

申请日：1980-05-23

申请人： Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki

发明人： Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki

IPC分类号： C07C231/00 ,  C07C67/00 ,  C07C231/02 ,  C07C233/59 ,  C07C233/60 ,  G03F9/00 ,  G01B11/27

CPC分类号： G03F9/70

摘要： In a reduction projection aligner system wherein a pattern on a reticle is formed directly on a wafer by reducing, projecting and printing it, a positioning pattern on the wafer is optically magnified and projected and then focused onto a focal plane where a slit scans the projected image. The distance from a mechanical origin provided on the supporting body of the system to the positioning pattern on the wafer is then measured on the basis of the movement of the slit, and the reticle is then relatively moved and positioned so as to coincide with the position of the wafer relative to the body of the system, thereby bringing the wafer and the reticle into coincidence.

摘要翻译： 在缩小投影对准器系统中，其中通过减少，投影和印刷直接在晶片上形成标线上的图案，将晶片上的定位图案光学放大和投影，然后聚焦到焦平面上，其中狭缝扫描投影 图片。 然后根据狭缝的运动测量从系统的支撑体上的机械原点到晶片上的定位图案的距离，然后将掩模版相对移动并定位成与位置 的晶片相对于系统的主体，从而使晶片和掩模版重合。

公开(公告)号：US4317383A

公开(公告)日：1982-03-02

申请号：US125095

申请日：1980-02-27

申请人： Toshiei Kurosaki ,  Akihiro Takanashi

发明人： Toshiei Kurosaki ,  Akihiro Takanashi

IPC分类号： G01D5/02 ,  F16H21/44 ,  F16H35/16 ,  G01D5/04 ,  G05G7/02 ,  F16H21/54

CPC分类号： F16H35/16 ,  G01D5/04 ,  Y10T74/18992 ,  Y10T74/20582

摘要： A proportional linear output system in which a second link mechanism consisting of a link and a slider is coupled to a portion of a link of a first link mechanism consisting of a link and a slider, so that the individual link mechanisms describe geometrically similar figures, and in which an input displacement fed to one slider is converted into an output displacement and is produced by another slider, the quantity of output displacement being reduced according to a ratio of similar figures of the first link mechanism to the second link mechanism.

摘要翻译： 一种比例线性输出系统，其中由链路和滑块组成的第二连杆机构联接到由链接和滑块组成的第一连杆机构的连杆的一部分，使得各个连杆机构描述几何相似的图形， 并且其中馈送到一个滑动器的输入位移被转换为输出位移并且由另一个滑块产生，输出位移量根据第一连杆机构与第二连杆机构的类似图形的比例而减小。

公开(公告)号：US4455485A

公开(公告)日：1984-06-19

申请号：US324791

申请日：1981-11-25

申请人： Sumio Hosaka ,  Tatsuo Harada ,  Akihiro Takanashi

发明人： Sumio Hosaka ,  Tatsuo Harada ,  Akihiro Takanashi

IPC分类号： H01S3/00 ,  G02B26/10 ,  G02F1/33 ,  G03F7/20 ,  H01J3/14

CPC分类号： G03F7/704 ,  G02B26/108 ,  G02F1/33

摘要： A laser beam scanning system for focusing a laser beam to a fine spot and for scanning precisely a large field includes an acousto-optical deflector enabled to deflect a laser beam in the direction of one axis or in the directions of two axes, while maintaining the fine spot diameter, to scan a small field, a relay lens for projecting said deflection point to the center of an objective lens, to effect the focusing of the beam to a fine spot, a high speed carriage enabled to move with high accuracy in biaxial directions, a precise position detector enabled to detect the position of the carriage, and a controller for organically controlling the aforementioned respective functions thereby to make it possible to precisely deflect the laser beam over a large field, whereby a scanning operation of a large field at a high speed and with a high accuracy is performed by the laser beam.

摘要翻译： 用于将激光束聚焦到细小点并且精确地扫描大场的激光束扫描系统包括能够使激光束沿着一个轴线或两个轴线的方向偏转的声光偏转器，同时保持 精细直径，扫描小场，用于将所述偏转点投影到物镜中心的中继透镜，以实现将光束聚焦到细微点，能够以双轴向高精度移动的高速滑架 方向，能够检测托架的位置的精确位置检测器和用于有机地控制上述各个功能的控制器，从而使得可以在大场上精确地偏转激光束，由此大场的扫描操作 通过激光束执行高速度和高精度。