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1.发明授权Method of sputtering a carbon protective film on a magnetic disk by superimposing an AC voltage on a DC bias voltage 失效通过将AC电压叠加在DC偏置电压上来将碳保护膜溅射在磁盘上的方法
公开(公告)号：US5507930A
公开(公告)日：1996-04-16
申请号：US299852
申请日：1994-09-01
CPC分类号： C23C14/35 , C23C14/0605 , G11B5/722 , G11B5/8408
摘要： A carbon film for protecting a magnetic disk is sputtered by a DC magnetron sputtering method, with the addition of superimposed AC power on the DC power applied to the carbon target. When the carbon film is sputtered for extended period in a production sputtering machine, nodular growth occurs over the sputtering surface of the carbon target. Such nodules are variously called "warts" or "mushrooms" in the industry and they are detrimental to the productivity of the sputtering machine. The size and quantity of the nodules over the target surface increase as the target is sputtered longer, and because these region do not contribute to sputtering, the efficiency of the target decreases. As sputter efficiency decreases, power input must be increased to the target to make up for the loss in the effective sputtering area of the target. Eventually, the power input must be increased to a point where arcing occurs continuously and sputtering cannot be continued. By superimposing AC power onto the DC power applied to the target, virtually all arcing on the carbon target is eliminated, thereby significantly reducing the nodular growth and extending the use of the target.
摘要翻译： 通过直流磁控溅射法溅射用于保护磁盘的碳膜，对施加到碳靶的DC电力加上叠加的AC电力。 当碳膜在生产溅射机中长时间溅射时，在碳靶的溅射表面上发生结核生长。 这种结节在工业中被称为“疣”或“蘑菇”，并且它们不利于溅射机的生产率。 目标表面上的结节的大小和数量随着靶溅射时间的延长而增加，并且由于这些区域对溅射没有贡献，因此靶的效率降低。 随着溅射效率的降低，必须将功率输入增加到目标，以弥补目标有效溅射区域的损耗。 最终，电源输入必须增加到连续发生电弧的点，溅射不能继续。 通过将AC电力叠加到施加到目标的DC电力上，实际上消除了碳靶上的所有电弧，从而显着降低了结节生长并延长了靶的使用。
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2.发明授权
公开(公告)号：US5631094A
公开(公告)日：1997-05-20
申请号：US348547
申请日：1994-12-01
CPC分类号： G11B5/656 , Y10S428/90 , Y10S428/928 , Y10T428/12465 , Y10T428/12861 , Y10T428/31678
摘要： A new magnetic alloy exhibits high Hc and Ms while exhibiting excellent corrosion resistance, thereby providing ideal physical properties for high density recording applications. Other parameters of the media, such as SNR, PW50, and S are at least maintained, if not also improved. The alloy contains cobalt and up to 10 at. % Ni, up to 20 at. % Pt, up to 10 at. % Ta, up to 10 at. % Ti, and optionally up to 6 at. % B. The ratio of the tantalum to titanium in the alloy is between 3:1 and 1:3. The alloy is deposited by vacuum deposition (typically sputtering) on a similarly deposited non-magnetic Ni alloy under layer. Nitrogen and/or oxygen may be introduced into the alloy during deposition to improve SNR. Other corrosion-resistant thin film alloys may also be obtained by the inclusion of Ta and Ti.
摘要翻译： 新的磁性合金表现出高Hc和Ms，同时具有优异的耐腐蚀性，从而为高密度记录应用提供了理想的物理性能。 至少保持介质的其他参数，如SNR，PW50和S，如果不能改善。 该合金含有钴，最多可达10英寸。 ％Ni，最多20盎司。 ％Pt，最多10个。 ％Ta，高达10 at。 ％Ti，任选至多6at。 ％B。合金中钽与钛的比例为3：1至1：3。 通过真空沉积（通常是溅射）将合金沉积在类似地沉积的非磁性Ni合金层下。 可以在沉积期间将氮和/或氧引入合金以提高SNR。 也可以通过包含Ta和Ti来获得其它耐腐蚀的薄膜合金。
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3.发明授权Method for sputtering a hydrogen-doped carbon protective film on a magnetic disk 失效在磁盘上溅射氢掺杂碳保护膜的方法
公开(公告)号：US5045165A
公开(公告)日：1991-09-03
申请号：US473540
申请日：1990-02-01
申请人： Tsutomu T. Yamashita
发明人： Tsutomu T. Yamashita
CPC分类号： G11B5/8408 , Y10S428/90 , Y10T428/30
摘要： A carbon film for protecting a magnetic disk is sputtered in the presence of hydrogen. If a sufficient amount of hydrogen is present in the sputtering chamber, the resulting carbon film will exhibit superior mechanical characteristics, i.e. an enhanced wear resistance during a contact-start-stop or drag test in a disk drive. Sputtering in the presence of hydrogen can be accomplished by either DC or RF magnetron sputtering, or DC or RF diode sputtering.
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公开(公告)号：US4749459A
公开(公告)日：1988-06-07
申请号：US838220
申请日：1986-03-10
申请人： Tsutomu T. Yamashita , Ching-Cheng Shir , Tu Chen
发明人： Tsutomu T. Yamashita , Ching-Cheng Shir , Tu Chen
CPC分类号： C23C14/0036 , G11B5/851
摘要： A film of magnetic recording media is formed by sputtering an alloy of cobalt and platinum onto a substrate. The sputtering takes place in a chamber containing argon and nitrogen. The magnetic coercivity of the resulting film is controlled by varying the concentration of nitrogen in the sputtering chamber. By using this technique, the film coercivity is controlled without varying other important parameters such as the saturation magnetization.
摘要翻译： 通过将钴和铂的合金溅射到基底上来形成磁记录介质的膜。 溅射在含有氩气和氮气的室中进行。 通过改变溅射室中的氮浓度来控制所得膜的磁矫顽力。 通过使用该技术，可以控制膜矫顽力而不改变其它重要参数，例如饱和磁化强度。
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公开(公告)号：US4898774A
公开(公告)日：1990-02-06
申请号：US943333
申请日：1986-12-17
申请人： Tsutomu T. Yamashita , Ching-Cheng Shir , Tu Chen , Ga-Lane Chen
发明人： Tsutomu T. Yamashita , Ching-Cheng Shir , Tu Chen , Ga-Lane Chen
CPC分类号： G11B5/72 , Y10S428/90 , Y10T428/265
摘要： A film of magnetic recording media is covered with a layer comprising ZrO.sub.2. Advantageously, the ZrO.sub.2 layer inhibits corrosion in the underlying magnetic recording media. The ZrO.sub.2 layer is wear resistant and also exhibits reduced static friction. In one embodiment of our invention, an intermediate layer is sputtered onto the media and the ZrO.sub.2 is sputtered onto the intermediate layer. Advantageously, the intermediate layer adheres strongly to both the media and the ZrO.sub.2. We have discovered that by providing the intermediate layer, static and dynamic friction between a read-write head and the disk tends to remain consistently low, and reliability of the disk is enhanced.
摘要翻译： 磁记录介质的膜被包含ZrO 2的层覆盖。 有利地，ZrO 2层抑制下面的磁记录介质中的腐蚀。 ZrO2层具有耐磨性，并且还具有降低的静摩擦力。 在本发明的一个实施方案中，将中间层溅射到介质上，并将ZrO 2溅射到中间层上。 有利地，中间层强烈地粘附到介质和ZrO 2。 我们已经发现，通过提供中间层，读写头和磁盘之间的静态和动态摩擦趋于一直保持低，并且磁盘的可靠性得到提高。
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公开(公告)号：US5397644A
公开(公告)日：1995-03-14
申请号：US56982
申请日：1993-05-03
申请人： Tsutomu T. Yamashita
发明人： Tsutomu T. Yamashita
CPC分类号： G11B5/8408 , Y10S428/90 , Y10T428/30
摘要： A carbon film for protecting a magnetic disk is sputtered in the presence of hydrogen. If a sufficient amount of hydrogen is present in the sputtering chamber, the resulting carbon film will exhibit superior mechanical characteristics, i.e. an enhanced wear resistance during a contact-start-stop or drag test in a disk drive. Sputtering in the presence of hydrogen can be accomplished by either DC or RF magnetron sputtering, or DC or RF diode sputtering.
摘要翻译： 在氢的存在下溅射用于保护磁盘的碳膜。 如果在溅射室中存在足够量的氢气，则所得到的碳膜将表现出优异的机械特性，即在磁盘驱动器中的接触 - 停止或阻力测试期间增强的耐磨性。 在氢存在下的溅射可以通过DC或RF磁控溅射，或DC或RF二极管溅射来实现。
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公开(公告)号：US4988578A
公开(公告)日：1991-01-29
申请号：US485797
申请日：1990-02-22
申请人： Tsutomu T. Yamashita , Ching-Cheng Shir , Tu Chen
发明人： Tsutomu T. Yamashita , Ching-Cheng Shir , Tu Chen
CPC分类号： G11B5/851 , C23C14/0036 , Y10S428/928 , Y10T428/12861 , Y10T428/12931 , Y10T428/12951
摘要： A film of magnetic recording media is formed by sputtering an alloy of cobalt and platinum onto a substrate. The sputtering takes place in a chamber containing argon and nitrogen. The magnetic coercivity of the resulting film is controlled by varying the concentration of nitrogen in the sputtering chamber. By using this technique, the film coercivity is controlled without varying other important parameters such as the saturation magnetization. The film coercivity can also be controlled by varying the concentration of oxygen in the sputtering chamber.
摘要翻译： 通过将钴和铂的合金溅射到基底上来形成磁记录介质的膜。 溅射在含有氩气和氮气的室中进行。 通过改变溅射室中的氮浓度来控制所得膜的磁矫顽力。 通过使用该技术，可以控制膜矫顽力而不改变其它重要参数，例如饱和磁化强度。 也可以通过改变溅射室中的氧浓度来控制膜矫顽力。
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公开(公告)号：US4929500A
公开(公告)日：1990-05-29
申请号：US847990
申请日：1986-04-03
申请人： Tsutomu T. Yamashita , Ching-Cheng Shir , Tu Chen
发明人： Tsutomu T. Yamashita , Ching-Cheng Shir , Tu Chen
IPC分类号： G11B5/72
CPC分类号： G11B5/72 , Y10S428/90 , Y10T428/265
摘要： A film of magnetic recording media is covered with a layer comprising ZrO.sub.2. Advantageously, the ZrO.sub.2 layer inhibits corrosion in the underlying magnetic recording media. The ZrO.sub.2 layer also exhibits desirable mechanical properties, e.g. reduced stiction. In one embodiment of our invention, the ZrO.sub.2 is sputtered onto the magnetic recording media.
摘要翻译： 磁记录介质的膜被包含ZrO 2的层覆盖。 有利地，ZrO 2层抑制下面的磁记录介质中的腐蚀。 ZrO 2层也表现出所需的机械性能，例如。 减少静息 在本发明的一个实施方案中，将ZrO 2溅射到磁记录介质上。
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9.发明授权Magnetic recording media with small grain size and narrow c-axis dispersion by using dual seed layer with substrate bias 有权通过使用具有衬底偏置的双种子层，具有小晶粒尺寸和窄c轴分散的磁记录介质公开(公告)号：US08956741B1
公开(公告)日：2015-02-17
申请号：US13174604
申请日：2011-06-30
IPC分类号： G11B5/66
CPC分类号： G11B5/8404 , G11B5/732
摘要： Media may be produced with narrow c-axis dispersion while having small grain size and high grain density. A dual seed layer design and a substrate bias voltage may be applied during deposition of the seed layer are used in the media. In some embodiments, the first seed layer is an amorphous material because of a high content of elements with large atomic sizes. Application of the substrate bias during deposition of the second seed layer may reduce the grain size and may narrow c-axis dispersion.
摘要翻译： 可以生产具有窄的c轴分散体的介质，同时具有小的晶粒尺寸和高的晶粒密度。 在种子层的沉积期间可以在介质中使用双种子层设计和衬底偏置电压。 在一些实施方案中，由于具有大原子尺寸的元素的高含量，第一籽晶层是无定形材料。 在第二晶种层沉积期间施加衬底偏压可能减小晶粒尺寸并且可能缩窄c轴分散。
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10.发明授权Magnetic recording medium comprising a magnetic alloy layer of cobalt nickel, platinum and chromium formed directly on a nickel alloy amorphous underlayer 失效包含钴镍，铂和铬的磁性合金层的磁性记录介质直接在镍合金非晶形成层上形成
公开(公告)号：US5180640A
公开(公告)日：1993-01-19
申请号：US590885
申请日：1990-10-01
申请人： Tsutomu T. Yamashita , Phuong Nguyen , Tu Chen
发明人： Tsutomu T. Yamashita , Phuong Nguyen , Tu Chen
CPC分类号： G11B5/65 , G11B5/722 , G11B5/738 , G11B5/851 , Y10S428/90 , Y10S428/928 , Y10T428/12465 , Y10T428/12861 , Y10T428/12944
摘要： A magnetic thin film alloy comprising cobalt, chromium, nickel and platinum for horizontal recording has a high coercivity, good corrosion resistance, and good noise performance. The platinum has a concentration between 8 to 15 atomic percent, the chromium has a concentration of 3 to 8%, the nickel concentration is 5 to 10% and the balance consist of essentially cobalt. The magnetic alloy has a thickness less than 100 nm and is sputtered on an undercoat consisting of nickel and phosphorus. The phosphorus content is between 5 to 30 weight percent, and the nickel phosphorus has a thickness between 5 and 100 nm. Alternatively, other amorphous metallic thin film undercoats can be applied. By judicious selection of the amount of chromium and nickel in the alloy, the saturation magnetization can be kept high while still maintaining good corrosion resistance. In addition, the sputtered media exhibits low noise.
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