公开(公告)号：US20110162678A1

公开(公告)日：2011-07-07

申请号：US13047370

申请日：2011-03-14

申请人： Tsuyoshi MORIYA ,  Takahiro Murakami ,  Yoshiyuki Kobayashi ,  Tetsuji Sato ,  Eiichi Sugawara ,  Shosuke Endoh ,  Masaki Fujimori

发明人： Tsuyoshi MORIYA ,  Takahiro Murakami ,  Yoshiyuki Kobayashi ,  Tetsuji Sato ,  Eiichi Sugawara ,  Shosuke Endoh ,  Masaki Fujimori

IPC分类号： F04D29/70 ,  F04D29/54 ,  B08B5/04

CPC分类号： F04D19/042 ,  F04D29/701 ,  F05D2260/607 ,  Y10T137/794

摘要： A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.

摘要翻译： 能够防止颗粒渗入处理室的反射装置。 反射装置设置在连通管中。 连通管允许基板处理装置和排气泵的处理室彼此连通。 排气泵具有至少一个旋转叶片。 反射装置包括至少一个反射表面。 至少一个反射表面被定向到排气泵。

公开(公告)号：US20120037314A1

公开(公告)日：2012-02-16

申请号：US13278765

申请日：2011-10-21

申请人： Shosuke ENDOH ,  Tsuyoshi MORIYA ,  Akitaka SHIMIZU

发明人： Shosuke ENDOH ,  Tsuyoshi MORIYA ,  Akitaka SHIMIZU

IPC分类号： H01L21/00 ,  C23F1/00

CPC分类号： H01J37/32477

摘要： A substrate processing apparatus that enables abnormal electrical discharges and metal contamination to be prevented from occurring. A processing chamber is configured to house and carry out predetermined plasma processing on a substrate. A lower electrode is disposed on a bottom portion of the processing chamber and has the substrate mounted thereon. An upper electrode is disposed in a ceiling portion of the processing chamber. A side wall component covering a side wall of the processing chamber faces onto a processing space between the upper electrode and the lower electrode. The side wall component has at least one electrode layer to which a DC voltage is applied. An insulating portion made of an insulating material is present at least between the electrode layer and the processing space and covers the electrode layer. The insulating portion is formed by thermally spraying the insulating material.

摘要翻译： 能够防止发生异常放电和金属污染的基板处理装置。 处理室配置成容纳并执行衬底上的预定等离子体处理。 下电极设置在处理室的底部，并且其上安装有基板。 上电极设置在处理室的顶部。 覆盖处理室的侧壁的侧壁部件面向上电极和下电极之间的处理空间。 侧壁部件具有至少一个施加了直流电压的电极层。 至少在电极层和处理空间之间存在由绝缘材料制成的绝缘部分并且覆盖电极层。 绝缘部分通过热喷涂绝缘材料形成。

公开(公告)号：US20120154625A1

公开(公告)日：2012-06-21

申请号：US13324485

申请日：2011-12-13

申请人： Tsuyoshi MORIYA

发明人： Tsuyoshi MORIYA

IPC分类号： H04N9/73 ,  H04N5/228

CPC分类号： H04N9/735 ,  H04N9/045

摘要： An image processing apparatus, an image processing method, and a program recording medium are provided. The image processing apparatus includes a color reproduction correction unit for correcting an image signal formed by an imaging element according to a color reproduction matrix; a color reproduction matrix storage unit for storing a registered color reproduction matrix or an inverse matrix of the registered color reproduction matrix for each light source coordinates in a color space; and a color reproduction matrix calculation unit for interpolating inverse matrices of registered color reproduction matrices corresponding to at least two light source coordinates stored in the color reproduction matrix storage unit according to estimated light source coordinates in the color space, which are obtained from the image signal, and calculating an inverse matrix of a result of the interpolation as the color reproduction matrix.

摘要翻译： 提供了图像处理装置，图像处理方法和程序记录介质。 图像处理装置包括：颜色再现校正单元，用于根据颜色再现矩阵校正由成像元件形成的图像信号; 色彩再现矩阵存储单元，用于存储颜色空间中每个光源坐标的登记颜色再现矩阵或登记颜色再现矩阵的逆矩阵; 以及颜色再现矩阵计算单元，用于根据从图像信号获得的颜色空间中估计的光源坐标，对应于存储在颜色再现矩阵存储单元中的至少两个光源坐标对应的已登记颜色再现矩阵的逆矩阵 ，并且计算插值结果的逆矩阵作为颜色再现矩阵。

公开(公告)号：US20110216322A1

公开(公告)日：2011-09-08

申请号：US13111520

申请日：2011-05-19

申请人： Tsuyoshi MORIYA ,  Takashi ENOMOTO

发明人： Tsuyoshi MORIYA ,  Takashi ENOMOTO

IPC分类号： G01N21/00

CPC分类号： G01N21/534 ,  G01N15/0205 ,  G01N21/94 ,  G01N2015/03

摘要： A particle monitor system that can detect fine particles in a substrate processing apparatus. The substrate processing apparatus has a chamber in which a substrate is housed and subjected to processing, a dry pump that exhausts gas out of the chamber, and a bypass line that communicates the chamber and the dry pump together. The particle monitor system has a laser light oscillator that irradiates laser light toward a space in which the particles may be present, and a laser power measurement device that is disposed on an optical path of the laser light having passed through the space and measures the energy of the laser light.

摘要翻译： 一种能够检测基板处理装置中的微粒子的粒子监视器系统。 基板处理装置具有容纳基板并经受处理的室，将气体排出室的干燥泵和将室与干燥泵连通的旁通管。 粒子监视器系统具有将激光照射到可能存在粒子的空间的激光振荡器，以及设置在穿过该空间的激光的光路上并测量能量的激光功率测量装置 的激光。

公开(公告)号：US20090025631A1

公开(公告)日：2009-01-29

申请号：US12174158

申请日：2008-07-16

申请人： Tsuyoshi MORIYA

发明人： Tsuyoshi MORIYA

IPC分类号： B05C11/00

CPC分类号： H01L21/67201

摘要： A gas-tight module capable of preventing the collapse of a pattern formed on a principal surface of a substrate, without lowering throughput. A load lock module of a substrate processing system includes a transfer arm, a chamber, and a load lock module exhaust system. A plate-like member is disposed in the chamber such as to face the principal surface of a wafer transferred into the chamber. An exhaust passage isolated from the remaining space in the chamber is defined by the wafer and the plate-like member at a location right above the principal surface of the wafer. The sectional area of the exhaust passage is smaller than that of the remaining space in the chamber.

摘要翻译： 一种气密模块，其能够防止在基板的主表面上形成的图案的塌陷，而不会降低生产量。 衬底处理系统的负载锁定模块包括传送臂，腔室和负载锁定模块排气系统。 板状构件设置在室中，以便面向转移到室中的晶片的主表面。 在晶片和板状构件在晶片的主表面正上方的位置限定了与腔室中的剩余空间隔离的排气通道。 排气通道的截面面积小于室内的剩余空间。

公开(公告)号：US20080031710A1

公开(公告)日：2008-02-07

申请号：US11831361

申请日：2007-07-31

申请人： Tsuyoshi MORIYA ,  Hiroyuki Nakayama ,  Keisuke Kondoh ,  Hiroki Oka

发明人： Tsuyoshi MORIYA ,  Hiroyuki Nakayama ,  Keisuke Kondoh ,  Hiroki Oka

IPC分类号： B65H1/24

CPC分类号： H01L21/67201 ,  Y10S414/135

摘要： An intermediate transfer chamber that can prevent formation of defects in substrates. The intermediate transfer chamber is provided between a loader module being in a first environment where the interior thereof is at a first pressure and contains moisture, and a chamber of a process module being in a second environment where the interior thereof is at a second pressure lower than the first pressure. The intermediate transfer chamber comprises a transfer arm comprising a pick that bidirectionally transfers a substrate between the loader module and the chamber and supports the substrate, a load-lock module exhaust system that exhausts the interior of the intermediate transfer chamber so as to reduce pressure in the intermediate transfer chamber from the first pressure to the second pressure, and a plate-like member that controls the conductance of exhaust on at least a principal surface of the substrate opposite to the pick when the interior of the intermediate transfer chamber is exhausted.

摘要翻译： 可以防止在基板中形成缺陷的中间转印室。 中间转移室设置在处于第一环境中的第一环境中的装载器模块和处于第二环境中的处于第二环境的第二环境中的第二环境中的处理模块室， 比第一个压力。 中间传送室包括传送臂，传送臂包括在装载器模块和室之间双向传送衬底并支撑衬底的拾取器，负载锁定模块排气系统，其排出中间转印室的内部，以便减少 所述中间转印室从所述第一压力到所述第二压力，以及板状构件，其在所述中间转印室的内部被耗尽时控制与所述拾取器相对的所述基板的至少主表面上的排气的电导。

公开(公告)号：US20120012254A1

公开(公告)日：2012-01-19

申请号：US13243462

申请日：2011-09-23

申请人： Tsuyoshi MORIYA ,  Hiroyuki Nakayama ,  Keisuke Kondoh ,  Hiroki Oka

发明人： Tsuyoshi MORIYA ,  Hiroyuki Nakayama ,  Keisuke Kondoh ,  Hiroki Oka

IPC分类号： B08B13/00 ,  C23F1/08

CPC分类号： H01L21/67126

摘要： A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.

摘要翻译： 一种闸阀清洗方法，其能够清洁使大气传送室和内部压力可变转移室的闸阀彼此连通或彼此连通或将它们彼此关闭，而不会导致生产量的降低 基板处理系统。 在闸阀将大气传送室和内压可变传送室彼此连通之前，内压可变传送室中的压力增加，使得内压可变传送室中的压力可以变得高于压力 在大气传递室。

公开(公告)号：US20100216082A1

公开(公告)日：2010-08-26

申请号：US12712547

申请日：2010-02-25

申请人： Tsuyoshi MORIYA ,  Yuki Hosaka

发明人： Tsuyoshi MORIYA ,  Yuki Hosaka

IPC分类号： B23Q41/00

CPC分类号： H01L21/67109

摘要： A work station is installed in a clean room for assembling or storing a component thereon. The work station includes a mounting member for mounting thereon the component, a heating device for heating to maintain an atmosphere surrounding the component mounted on the mounting member at a high temperature and a cover having an uneven structure for preventing a direct contact between the mounting member and the component by covering the mounting member. Further, at least a part of the uneven structure of the cover, the part being in contact with the component, is made of a material without containing a metal atom.

摘要翻译： 工作站安装在洁净室中，用于组装或存储组件。 工作站包括用于在其上安装组件的安装构件，用于加热以保持安装在安装构件上的部件周围的高温的加热装置和具有不平坦结构的盖，用于防止安装构件之间的直接接触 以及通过覆盖安装构件的部件。 此外，盖的不均匀结构的至少一部分与部件接触的部分由不含有金属原子的材料制成。

公开(公告)号：US20100083982A1

公开(公告)日：2010-04-08

申请号：US12632559

申请日：2009-12-07

申请人： Tsuyoshi MORIYA ,  Hiroshi NAGAIKE

发明人： Tsuyoshi MORIYA ,  Hiroshi NAGAIKE

IPC分类号： B08B6/00

CPC分类号： H01J37/32431 ,  C23C16/4401 ,  H01J2237/022

摘要： A particle removal apparatus for removing particles from a chamber of a plasma processing apparatus, wherein the chamber is connected to a gas exhaust port and a plasma of a processing gas is generated in the chamber to plasma process a substrate to be processed, includes a particle charging control member for positively charging particles generated within the chamber by positive ions of an ion sheath region formed in a region other than the vicinity of the substrate to be processed, wherein positively charged particles are discharged from the chamber via the gas exhaust port. Therefore, there is no plasma disturbance or metal contamination, and thus can be applied to a practical use.

摘要翻译： 一种用于从等离子体处理装置的室中除去颗粒的颗粒去除装置，其中所述室连接到排气口，并且在所述室中产生处理气体的等离子体，以等离子体处理待处理的基板，包括颗粒 充电控制构件，用于通过形成在除被处理基板附近的区域中的离子鞘区域的正离子正向地对室内产生的颗粒进行充电，其中带正电的颗粒经由排气口从室排出。 因此，没有等离子体干扰或金属污染，因此可以应用于实际应用。

公开(公告)号：US20100018332A1

公开(公告)日：2010-01-28

申请号：US12506440

申请日：2009-07-21

申请人： Tsuyoshi MORIYA ,  Eiichi NISHIMURA

发明人： Tsuyoshi MORIYA ,  Eiichi NISHIMURA

IPC分类号： G01N33/00 ,  G01M19/00

CPC分类号： G01M99/002 ,  H01L22/12 ,  H01L22/24 ,  H01L2924/0002 ,  H01L2924/00

摘要： A foreign matter detecting method of detecting foreign matter attached to a peripheral edge of a substrate, which makes it possible to accurately detect foreign matter attached to the peripheral edge of the substrate even if the foreign matter is of a minute size below the detection limit of an existing measuring instrument, and which is highly versatile and suitable for mass production of substrates. The substrate is cooled to condense moisture around the foreign matter attached to the peripheral edge of the substrate, and then the condensed moisture is iced to grow an ice crystal. Then, the foreign matter attached to the peripheral edge of the substrate, which is emphasized by the ice crystal, is detected.

摘要翻译： 检测附着于基板的周缘的异物的异物检测方法，即使异物的检测极限低于检测限的微小尺寸，也能够准确地检测附着在基板的周缘的异物 现有的测量仪器，并且是高度通用性的并且适合于大量生产基板。 将基板冷却以冷凝附着在基板的周边边缘的异物，然后冷凝的水分被冰化以生长冰晶。 然后，检测附着在基板的周缘的异物，其被冰晶强调。