Vacuum Film Forming Apparatus
    2.
    发明申请
    Vacuum Film Forming Apparatus 审中-公开
    真空成膜装置

    公开(公告)号:US20130186340A1

    公开(公告)日:2013-07-25

    申请号:US13735623

    申请日:2013-01-07

    Applicant: ULVAC, INC.

    Abstract: A stage holds the substrate inside the vacuum chamber, gas supply device alternately supplies gases to the substrate, and exhaust device exhausts gases inside the vacuum chamber. The gas supply device has at least one ejection nozzle, disposed on one side of the stage, for ejecting the gases from one side of the substrate to the other side thereof and also along an upper surface of the substrate. In this case, that surface side of the substrate held by the stage on which the thin film is formed is defined as the upper side. The exhaust device includes: an exhaust port disposed to open through a lower wall of the vacuum chamber on the other side of the stage; an exhaust chamber disposed under the vacuum chamber in communication with the exhaust port; and a vacuum pump connected to the exhaust chamber to evacuate the exhaust chamber.

    Abstract translation: 阶段保持真空室内的基板,气体供给装置交替地向基板供给气体,排气装置排出真空室内的气体。 气体供给装置具有设置在载物台的一侧的至少一个喷射喷嘴,用于将气体从基板的一侧喷射到其另一侧,并且还沿着基板的上表面喷射。 在这种情况下,将由形成有薄膜的台架保持的基板的表面侧定义为上侧。 排气装置包括:排气口,设置成穿过台架另一侧的真空室的下壁开口; 设置在与排气口连通的真空室下方的排气室; 以及连接到排气室以抽真空排气室的真空泵。

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