公开(公告)号：US20050243328A1

公开(公告)日：2005-11-03

申请号：US11080525

申请日：2005-03-16

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Helmut Haidner ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Gobppert

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Helmut Haidner ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Gobppert

IPC分类号： G03F7/20 ,  G01B9/02

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device and a method for the optical measurement of an optical system (1), in particular an optical imaging system. The device includes one or more object-side test optics components (2a, 2b) arranged in front of the optical system to be measured, and/or one or more image-side test optics components (3, 4, 5) arranged behind the optical system to be measured. A container for use in such a device, a microlithography projection exposure machine equipped with such a device, and a method which can be carried out with the aid of this device are also disclosed. An immersion fluid is introduced adjacent to at least one of the one or more object-side test optics components and/or image-side test optics components. Such device and method provide for optical measurement by microlithography projection objectives of high numerical aperture using wavefront detection with shearing or point diffraction interferometry or a Moiré measuring technique.

摘要翻译： 一种用于光学系统（1）的光学测量的装置和方法，特别是光学成像系统。 该装置包括布置在待测量的光学系统前面的一个或多个物体侧测试光学部件（2a，2b）和/或一个或多个图像侧测试光学部件（3,4,5） 在要测量的光学系统后面。 还公开了一种用于这种装置的容器，配备有这种装置的微光刻投影曝光机以及可借助该装置进行的方法。 相邻于一个或多个物体侧测试光学部件和/或图像侧测试光学部件中的至少一个被引入浸没流体。 这种装置和方法通过使用具有剪切或点衍射干涉测量或莫尔测量技术的波前检测的高数值孔径的微光刻投影物镜提供光学测量。

公开(公告)号：US07408652B2

公开(公告)日：2008-08-05

申请号：US11080525

申请日：2005-03-16

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Helmut Haidner ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Gobppert

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Helmut Haidner ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Gobppert

IPC分类号： G01B9/02 ,  G02B27/40

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US08120763B2

公开(公告)日：2012-02-21

申请号：US12489639

申请日：2009-06-23

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/00 ,  G01B9/02 ,  G03B27/42

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US20090257049A1

公开(公告)日：2009-10-15

申请号：US12489639

申请日：2009-06-23

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/00 ,  G03B27/80

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US20120113429A1

公开(公告)日：2012-05-10

申请号：US13351710

申请日：2012-01-17

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/02

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US20090021726A1

公开(公告)日：2009-01-22

申请号：US12147034

申请日：2008-06-26

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/00

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

公开(公告)号：US20070070316A1

公开(公告)日：2007-03-29

申请号：US11458216

申请日：2006-07-18

申请人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

发明人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70591 ,  G03F7/70691 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。

公开(公告)号：US20100141912A1

公开(公告)日：2010-06-10

申请号：US12703068

申请日：2010-02-09

申请人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

发明人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70591 ,  G03F7/70691 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。

公开(公告)号：US20080180688A1

公开(公告)日：2008-07-31

申请号：US12057098

申请日：2008-03-27

申请人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

发明人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

IPC分类号： G01B11/02 ,  G01B9/02

CPC分类号： G01M11/0257 ,  G01M11/0214 ,  G01M11/0271 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/70716 ,  G03F7/70958 ,  Y10T428/31

摘要： A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid. A structure carrier to be arranged in the region of the immersion liquid is assigned a protective system in order to increase the resistance of the measuring structure to degradation caused by the immersion liquid. A measurement of immersion systems under immersion conditions is thereby possible without detrimental influence of the immersion liquid on the measuring accuracy.

摘要翻译： 一种用于光学成像系统的光学测量的测量系统，其被设置为对成像系统的图像表面中布置在成像系统的物体表面中的图案进行成像，包括：物体侧结构载体，其具有物体侧 测量结构，被布置在成像系统的物体侧; 具有图像侧测量结构的图像侧结构载体，被布置在成像系统的图像侧; 物体侧测量结构和图像侧测量结构彼此匹配，使得当物体侧测量结构借助于成像系统成像到图像侧测量结构上时，叠加 图案生产; 以及用于局部求解叠加图案的检测器。 成像系统被设计为用于借助于浸没液体进行成像的浸没系统。 布置在浸没液体区域中的结构载体被分配保护系统，以便增加测量结构对浸入液体引起的降解的阻力。 因此，在浸没条件下的浸渍系统的测量可以在浸没液体对测量精度的不利影响的情况下进行。

公开(公告)号：US08488127B2

公开(公告)日：2013-07-16

申请号：US12850740

申请日：2010-08-05

申请人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

发明人： Markus Mengel ,  Ulrich Wegmann ,  Albrecht Ehrmann ,  Wolfgang Emer ,  Reiner Clement ,  Ludo Mathijssen

IPC分类号： G01B11/02

CPC分类号： G01M11/0257 ,  G01M11/0214 ,  G01M11/0271 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/70716 ,  G03F7/70958 ,  Y10T428/31

摘要： A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid. A structure carrier to be arranged in the region of the immersion liquid is assigned a protective system in order to increase the resistance of the measuring structure to degradation caused by the immersion liquid. A measurement of immersion systems under immersion conditions is thereby possible without detrimental influence of the immersion liquid on the measuring accuracy.

摘要翻译： 一种用于光学成像系统的光学测量的测量系统，其被设置为对成像系统的图像表面中布置在成像系统的物体表面中的图案进行成像，包括物体侧结构载体，其具有物体侧 测量结构，被布置在成像系统的物体侧; 具有图像侧测量结构的图像侧结构载体，被布置在成像系统的图像侧; 物体侧测量结构和图像侧测量结构彼此匹配，使得当物体侧测量结构借助于成像系统成像到图像侧测量结构上时，叠加 图案生产; 以及用于局部求解叠加图案的检测器。 成像系统被设计为用于借助于浸没液体进行成像的浸没系统。 布置在浸没液体区域中的结构载体被分配保护系统，以便增加测量结构对浸入液体引起的降解的阻力。 因此，在浸没条件下的浸渍系统的测量可以在浸没液体对测量精度的不利影响的情况下进行。