公开(公告)号：US20100290015A1

公开(公告)日：2010-11-18

申请号：US12821033

申请日：2010-06-22

申请人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

发明人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

IPC分类号： G03F7/20 ,  G02B27/00 ,  G03B27/54 ,  B08B5/00

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US07767989B2

公开(公告)日：2010-08-03

申请号：US11527728

申请日：2006-09-27

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

IPC分类号： G03B7/20

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US08598550B2

公开(公告)日：2013-12-03

申请号：US13365758

申请日：2012-02-03

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Johannes Bernardus Ridder ,  Harm-Jan Voorma ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Johannes Bernardus Ridder ,  Harm-Jan Voorma ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer

IPC分类号： G03B7/20

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US20120140196A1

公开(公告)日：2012-06-07

申请号：US13365758

申请日：2012-02-03

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

IPC分类号： B08B3/00 ,  G03B27/54

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US08134136B2

公开(公告)日：2012-03-13

申请号：US12821033

申请日：2010-06-22

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Johannes Bernardus Ridder ,  Harm-Jan Voorma ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Johannes Bernardus Ridder ,  Harm-Jan Voorma ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer

IPC分类号： G03B7/20

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US07414700B2

公开(公告)日：2008-08-19

申请号：US11239479

申请日：2005-09-30

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/42

CPC分类号： B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

公开(公告)号：US07355672B2

公开(公告)日：2008-04-08

申请号：US10956344

申请日：2004-10-04

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/32 ,  C23G1/00 ,  G03C5/00

CPC分类号： B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

摘要翻译： 在包括光学元件的设备的光学元件上去除沉积的方法包括在至少部分设备中提供含H 2的气体，包括从H 2 来自含H 2气体; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的装置的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。

公开(公告)号：US07868304B2

公开(公告)日：2011-01-11

申请号：US11051477

申请日：2005-02-07

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Johannes Christiaan Leonardus Franken ,  Arnoud Cornelis Wassink ,  Paul Peter Anna Antonius Brom

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Johannes Christiaan Leonardus Franken ,  Arnoud Cornelis Wassink ,  Paul Peter Anna Antonius Brom

IPC分类号： A61N5/00

CPC分类号： G03F7/70175 ,  G03F7/70916

摘要： A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.

摘要翻译： 用于去除光刻设备的辐射收集器上的沉积的方法包括向辐射收集器的端部提供气体阻挡层，从而提供辐射收集器外壳体积; 向封闭体积提供气体，所述气体选自含卤素气体和含氢气体; 以及从所述辐射收集器去除所述沉积物的至少一部分。 光刻设备包括辐射收集器; 围绕辐射收集器的周向船体; 在辐射收集器的端部处的气体屏障，从而提供辐射收集器外壳体积。 辐射收集器被周向壳体和气体屏障包围。 入口为辐射收集器外壳体积提供气体，出口从辐射收集器外壳体积中除去气体。

公开(公告)号：US07935218B2

公开(公告)日：2011-05-03

申请号：US11643955

申请日：2006-12-22

申请人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Bastiaan Theodoor Wolschrijn ,  Carolus Ida Maria Antonius Spee ,  Rik Jansen

发明人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Bastiaan Theodoor Wolschrijn ,  Carolus Ida Maria Antonius Spee ,  Rik Jansen

IPC分类号： C23F1/00

CPC分类号： G03F7/2043 ,  G03F7/70041 ,  G03F7/70925

摘要： An optical apparatus includes an illumination system configured to form a pulsed radiation beam, an optical element with a surface on which the radiation beam is incident in operation, and a gas source arranged to supply a mixture of a first type of gas and a second type of gas to a space adjacent the surface. Particles of the first and second types of gas are capable of reacting with the surface, when activated by the radiation beam. The gas source is configured to generate a combination of surface occupation numbers of molecules of the first and second types of gas on the surface under operating conditions, at least prior to pulses of the radiation beam, the combination of surface occupation numbers lying in a range in which reactions of particles with the surface during pulses of the radiation beam are in majority reversed.

摘要翻译： 光学装置包括被配置为形成脉冲辐射束的照明系统，具有辐射束在其中入射的表面的光学元件，以及设置成供应第一类型气体和第二类型的混合物的气体源 的气体到邻近表面的空间。 当由辐射束激活时，第一和第二类气体的颗粒能够与表面反应。 气源被配置成至少在辐射束的脉冲之前，在工作条件下，在表面上产生第一和第二类气体的分子的表面占有数量的组合，表面占有数的组合在一个范围内 其中在辐射束的脉冲期间颗粒与表面的反应多数反转。

公开(公告)号：US08077287B2

公开(公告)日：2011-12-13

申请号：US10840508

申请日：2004-05-07

申请人： Johannes Adrianus Antonius Theodorus Dams ,  Mark Kroon ,  Harm-Jan Voorma ,  Carolus Ida Maria Antonius Spee

发明人： Johannes Adrianus Antonius Theodorus Dams ,  Mark Kroon ,  Harm-Jan Voorma ,  Carolus Ida Maria Antonius Spee

IPC分类号： G03B27/52 ,  H02K41/02

CPC分类号： G03F7/70983 ,  G03F7/70916

摘要： A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably, the coating material is a hydrogen silsesquioxane (HSQ), which may be applied via spraying, brushing, or spinning and can be treated by heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of water and hydrocarbons when subjected to a vacuum environment.

摘要翻译： 公开了一种制备用于光刻设备的真空室中的组件的方法。 该方法包括用非金属材料涂覆该组分。 该方法还可以包括处理涂层以使涂层硬化。 优选地，涂层材料是氢倍半硅氧烷（HSQ），其可以通过喷涂，刷涂或纺丝施加，并且可以通过加热或通过用电子束的照射进行处理。 所产生的组分在经受真空环境时强烈地减少了水和烃的除气。