公开(公告)号：US20170352521A1

公开(公告)日：2017-12-07

申请号：US15170570

申请日：2016-06-01

Applicant: Veeco Instruments Inc.

Inventor： Boris Druz ,  Rustam Yevtukhov ,  Robert Hieronymi ,  Alan V. Hayes ,  Mathew Levoso ,  Peter Porshnev

IPC: H01J37/305 ,  H01J37/08

CPC classification number: H01J37/3053 ,  H01J27/18 ,  H01J37/08 ,  H01J2237/0802

Abstract: The presently disclosed ion sources include one or more electromagnets for changing the distribution of plasma within a discharge space of an ion source. At least one of the electromagnets is oriented about an outer periphery of a tubular sidewall of the ion source and changes a distribution of the plasma in a peripheral region of the discharge space.

公开(公告)号：US10014164B2

公开(公告)日：2018-07-03

申请号：US15592426

申请日：2017-05-11

Applicant: Veeco Instruments Inc.

Inventor： Boris Druz ,  Rustam Yevtukhov ,  Rhodri Elliott ,  James M. Best, Jr. ,  Peter Porshnev

IPC: H01J37/36 ,  H01J37/30 ,  G01R19/165 ,  H01J37/32

CPC classification number: H01J37/36 ,  G01R19/16533 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/32018 ,  H01J37/32944 ,  H01J2237/0206 ,  H01J2237/0213 ,  H01J2237/18 ,  H01J2237/335

Abstract: Embodiments relate to a grid short clearing system is provided for gridded ion beam sources used in industrial applications for materials processing systems that reduces grid damage during operation. In various embodiments, the ion source is coupled to a process chamber and a grid short clearing system includes methods for supplying a gas to the process chamber and setting the gas pressure to a predetermined gas pressure in the range between 50 to 750 Torr, applying an electrical potential difference between each adjacent pair of grids using a current-limited power supply, and detecting whether or not the grid shorts are cleared. The electrical potential difference between the grids is at least 10% lower than the DC electrical breakdown voltage between the grids with no contaminants.

公开(公告)号：US20170330738A1

公开(公告)日：2017-11-16

申请号：US15592426

申请日：2017-05-11

Applicant: Veeco Instruments Inc.

Inventor： Boris Druz ,  Rustam Yevtukhov ,  Rhodri Elliott ,  James M. Best, JR. ,  Peter Porshnev

IPC: H01J37/36 ,  G01R19/165 ,  H01J37/30

CPC classification number: H01J37/36 ,  G01R19/16533 ,  H01J37/3007 ,  H01J37/3178 ,  H01J37/32018 ,  H01J37/32944 ,  H01J2237/18 ,  H01J2237/335

Abstract: Embodiments relate to a grid short clearing system is provided for gridded ion beam sources used in industrial applications for materials processing systems that reduces grid damage during operation. In various embodiments, the ion source is coupled to a process chamber and a grid short clearing system includes methods for supplying a gas to the process chamber and setting the gas pressure to a predetermined gas pressure in the range between 50 to 750 Torr, applying an electrical potential difference between each adjacent pair of grids using a current-limited power supply, and detecting whether or not the grid shorts are cleared. The electrical potential difference between the grids is at least 10% lower than the DC electrical breakdown voltage between the grids with no contaminants.

公开(公告)号：US10128083B2

公开(公告)日：2018-11-13

申请号：US15170570

申请日：2016-06-01

Applicant: Veeco Instruments Inc.

Inventor： Boris Druz ,  Rustam Yevtukhov ,  Robert Hieronymi ,  Alan V. Hayes ,  Mathew Levoso ,  Peter Porshnev

IPC: H01J37/08 ,  H01J37/305 ,  H01J27/18

Abstract: The presently disclosed ion sources include one or more electromagnets for changing the distribution of plasma within a discharge space of an ion source. At least one of the electromagnets is oriented about an outer periphery of a tubular sidewall of the ion source and changes a distribution of the plasma in a peripheral region of the discharge space.