公开(公告)号：US20170352521A1

公开(公告)日：2017-12-07

申请号：US15170570

申请日：2016-06-01

Applicant: Veeco Instruments Inc.

Inventor： Boris Druz ,  Rustam Yevtukhov ,  Robert Hieronymi ,  Alan V. Hayes ,  Mathew Levoso ,  Peter Porshnev

IPC: H01J37/305 ,  H01J37/08

CPC classification number: H01J37/3053 ,  H01J27/18 ,  H01J37/08 ,  H01J2237/0802

Abstract: The presently disclosed ion sources include one or more electromagnets for changing the distribution of plasma within a discharge space of an ion source. At least one of the electromagnets is oriented about an outer periphery of a tubular sidewall of the ion source and changes a distribution of the plasma in a peripheral region of the discharge space.

公开(公告)号：US10128083B2

公开(公告)日：2018-11-13

申请号：US15170570

申请日：2016-06-01

Applicant: Veeco Instruments Inc.

Inventor： Boris Druz ,  Rustam Yevtukhov ,  Robert Hieronymi ,  Alan V. Hayes ,  Mathew Levoso ,  Peter Porshnev

IPC: H01J37/08 ,  H01J37/305 ,  H01J27/18

Abstract: The presently disclosed ion sources include one or more electromagnets for changing the distribution of plasma within a discharge space of an ion source. At least one of the electromagnets is oriented about an outer periphery of a tubular sidewall of the ion source and changes a distribution of the plasma in a peripheral region of the discharge space.

公开(公告)号：US20130206583A1

公开(公告)日：2013-08-15

申请号：US13802828

申请日：2013-03-14

Applicant: Veeco Instruments, Inc.

Inventor： Boris L. Druz ,  Viktor Kanarov ,  Hariharakeshave S. Hegde ,  Alan V. Hayes ,  Emmanuel Lakios ,  Mario Roque

IPC: C23C14/50 ,  C23C14/54 ,  C23C14/46

CPC classification number: C23C14/505 ,  C23C14/044 ,  C23C14/221 ,  C23C14/225 ,  C23C14/46 ,  C23C14/542 ,  H01J37/08 ,  H01J37/20 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221

Abstract: Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.