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1.发明授权公开(公告)号：US06440620B1
公开(公告)日：2002-08-27
申请号：US09679403
申请日：2000-10-04
IPC分类号： G03C500
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/1534 , Y10S430/143
摘要： An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.
摘要翻译： 一种聚焦装置和方法，包括用于产生电子束通过的电子束，掩模和投影柱的源，以及电子束将被聚焦的晶片。 晶片位于投影柱的球面像差减小由投影柱中的色像差引起的负散焦效应的平面中。 该装置和方法适用于通常的电子图案形成工具，其中掩模的厚度小于电子图案形成工具的电子平均自由程的电子图案形成工具，以及SCALPEL TM电子图案形成工具。
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公开(公告)号：US06420714B1
公开(公告)日：2002-07-16
申请号：US09591626
申请日：2000-06-09
IPC分类号： G21K108
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/141 , H01J2237/31791
摘要： An apparatus for projection lithography is disclosed. The apparatus has at least one magnetic doublet lens. An aperture scatter filter is interposed between the two lenses of the magnetic doublet lens. The aperture scatter filter is in the back focal plane of the magnetic doublet lens system, or in an equivalent conjugate plane thereof. The apparatus also has two magnetic clamps interposed between the two lenses in the magnetic doublet lens. The clamps are positioned and configured to prevent substantial overlap of the magnetic lens fields. The magnetic clamps are positioned so that the magnetic fields from the lenses in the magnetic doublet lens do not extend to the aperture scatter filter.
摘要翻译： 公开了一种用于投影光刻的装置。 该装置具有至少一个磁双峰透镜。 孔径散射滤光片插入在磁性双透镜透镜的两个透镜之间。 孔径散射滤光器位于磁性双透镜系统的后焦平面中或其等效的共轭平面中。 该装置还具有夹在磁性双透镜中的两个透镜之间的两个磁性夹具。 夹具被定位和配置以防止磁性透镜场的实质重叠。 磁性夹具被定位成使得来自磁性双透镜的透镜的磁场不延伸到孔径散射滤光器。
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3.发明授权Electron beam lithography apparatus focused through spherical aberration introduction 有权通过球面像差引入聚焦的电子束光刻设备公开(公告)号：US06620565B2
公开(公告)日：2003-09-16
申请号：US10188030
申请日：2002-07-03
IPC分类号： G03F900
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/1534 , Y10S430/143
摘要： An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.
摘要翻译： 一种聚焦装置和方法，包括用于产生电子束通过的电子束，掩模和投影柱的源，以及电子束将被聚焦的晶片。 晶片位于投影柱的球面像差减小由投影柱中的色像差引起的负散焦效应的平面中。 该装置和方法适用于通常的电子图案形成工具，其中掩模的厚度小于电子图案形成工具的电子平均自由程的电子图案形成工具，以及SCALPEL TM电子图案形成工具。
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公开(公告)号：US06333508B1
公开(公告)日：2001-12-25
申请号：US09580530
申请日：2000-05-30
IPC分类号： H01J37302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J3/18 , H01J37/063 , H01J37/12 , H01J37/3174 , H01J2237/065 , H01J2237/12 , H01J2237/1205 , H01J2237/3175 , H01J2237/31774
摘要： A method and apparatus for controlling beam emittance by placing a quadrupole lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The quadrupole lens array may be three or more mesh grids or a combination of grids and continuous foils. The quadrupole lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The quadrupole lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.
摘要翻译： 一种通过将四极透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 四极透镜阵列可以是三个或更多个网格或网格和连续箔片的组合。 四极透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。 四极透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。
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5.发明授权Bonded article having improved crystalline structure and work function uniformity and method for making the same 有权具有改善的晶体结构和功函数均匀性的粘合制品及其制造方法公开(公告)号：US06448569B1
公开(公告)日：2002-09-10
申请号：US09337741
申请日：1999-06-22
IPC分类号： G21G400
CPC分类号： H01J1/15 , H01J9/04 , H01J37/06 , H01J2237/3175
摘要： A bonded article including a single crystal cathode, for use in projection electron beam lithography, such as the SCALPEL™ system. Because of its single crystalline structure, the single crystal cathode has only slightly misoriented grains. As a result, the single crystal cathode has few structural non-uniformities, and therefore a uniform emission characteristic. The single crystal cathode may be made of at least one of tantalum, tungsten, rhenium, and molybdenum. A local bonding technique for bonding a single crystal cathode with a conventional member. The local bonding technique does not recrystallize a center of the single crystal cathode, and therefore produces a bonded article which is usable in a projection electron lithography system, such as the SCALPEL™ system. The local bonding technique may be laser welding and the single crystal cathode may be made of at least one of tantalum, tungsten, rhenium, and molybdenum. The member may be a conventional filament and the filament may be made of one of tungsten, a tungsten-rhenium alloy, and a tungsten-tantalum alloy.
摘要翻译： 包括用于投影电子束光刻的单晶阴极的粘合制品，例如SCALPEL TM系统。 由于其单晶结构，单晶阴极仅具有微小的取向差的晶粒。 结果，单晶阴极具有很小的结构不均匀性，因此具有均匀的发射特性。 单晶阴极可以由钽，钨，铼和钼中的至少一种制成。 用于将单晶阴极与常规构件结合的局部粘结技术。 局部接合技术不会使单晶阴极的中心再结晶，因此产生可用于诸如SCALPEL TM系统的投影电子光刻系统中的接合制品。 局部粘合技术可以是激光焊接，并且单晶阴极可以由钽，钨，铼和钼中的至少一种制成。 构件可以是常规的灯丝，并且灯丝可以由钨，钨 - 铼合金和钨 - 钽合金之一制成。
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公开(公告)号：US07179148B2
公开(公告)日：2007-02-20
申请号：US10963156
申请日：2004-10-12
申请人： Sungho Jin , Victor Katsap , Warren K. Waskiewicz , Wei Zhu
发明人： Sungho Jin , Victor Katsap , Warren K. Waskiewicz , Wei Zhu
IPC分类号： H01J9/04
CPC分类号： H01J1/15 , H01J9/042 , H01J37/06 , H01J2237/3175
摘要： A cathode with an improved work function, for use in a lithographic system, such as the SCALPEL™ system, which includes a buffer between a substrate and an emissive layer, where the buffer alters, randomizes, miniaturizes, and/or isolates the grain structure at a surface of the substrate to reduce the grain size, randomize crystal orientation and reduce the rate of crystal growth. The buffer layer may be a solid solution or a multiphase alloy. A method of making the cathode by depositing a buffer between a surface of the substrate and an emissive layer, where the deposited buffer alters, randomizes, miniaturizes, and/or isolates the grain structure at a surface of the substrate to reduce the grain size, randomize crystal orientation and reduce the rate of crystal growth.
摘要翻译： 具有改进的功函数的阴极，用于诸如SCALPEL TM系统的光刻系统，其包括衬底和发射层之间的缓冲器，其中缓冲区改变，随机化，小型化和/或隔离 晶粒表面的晶粒结构减小晶粒尺寸，随机化晶体取向并降低晶体生长速率。 缓冲层可以是固溶体或多相合金。 通过在衬底的表面和发射层之间沉积缓冲剂来制造阴极的方法，其中沉积的缓冲液改变，随机化，小型化和/或隔离衬底表面处的晶粒结构以减小晶粒尺寸， 随机化晶体取向并降低晶体生长速率。
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公开(公告)号：US06815876B1
公开(公告)日：2004-11-09
申请号：US09338520
申请日：1999-06-23
申请人： Sungho Jin , Victor Katsap , Warren K. Waskiewicz , Wei Zhu
发明人： Sungho Jin , Victor Katsap , Warren K. Waskiewicz , Wei Zhu
IPC分类号： H01J120
CPC分类号： H01J1/15 , H01J9/042 , H01J37/06 , H01J2237/3175
摘要： A cathode with an improved work function, for use in a lithographic system, such as the SCALPEL™ system, which includes a buffer between a substrate and an emissive layer, where the buffer alters, randomizes, miniaturizes, and/or isolates the grain structure at a surface of the substrate to reduce the grain size, randomize crystal orientation and reduce the rate of crystal growth. The buffer layer may be a solid solution or a multiphase alloy. A method of making the cathode by depositing a buffer between a surface of the substrate and an emissive layer, where the deposited buffer alters, randomizes, miniaturizes, and/or isolates the grain structure at a surface of the substrate to reduce the grain size, randomize crystal orientation and reduce the rate of crystal growth.
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公开(公告)号：US07345290B2
公开(公告)日：2008-03-18
申请号：US09414004
申请日：1999-10-07
IPC分类号： G21K5/10
CPC分类号： H01J37/065 , H01J37/12 , H01J2237/1205 , H01J2237/31774
摘要： A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.
摘要翻译： 一种通过将透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 透镜阵列可以是一个或多个网状网格或网格和连续箔片的组合。 透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。 透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。
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公开(公告)号：US07176610B2
公开(公告)日：2007-02-13
申请号：US10774693
申请日：2004-02-10
申请人： Victor Katsap
发明人： Victor Katsap
IPC分类号： H01J19/06
CPC分类号： H01J9/042 , H01J1/148 , H01J1/15 , H01J2201/19 , H01J2237/06308
摘要： An improved thermionic cathode is provided. The cathode has a carbon-coated cone surface and reduced cone angle (e.g. typically 60 degrees or less) that delivers an electron beam with high angular intensity and brightness and exhibits increased longevity.
摘要翻译： 提供了一种改进的热离子阴极。 阴极具有碳涂覆的锥形表面和减小的锥角（例如通常为60度或更小），其传送具有高角度强度和亮度的电子束，并且延长寿命。
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公开(公告)号：US20050174030A1
公开(公告)日：2005-08-11
申请号：US10774693
申请日：2004-02-10
申请人： Victor Katsap
发明人： Victor Katsap
CPC分类号： H01J9/042 , H01J1/148 , H01J1/15 , H01J2201/19 , H01J2237/06308
摘要： An improved thermionic cathode is provided. The cathode has a carbon-coated cone surface and reduced cone angle (e.g. typically 60 degrees or less) that delivers an electron beam with high angular intensity and brightness and exhibits increased longevity.
摘要翻译： 提供了一种改进的热离子阴极。 阴极具有碳涂覆的锥形表面和减小的锥角（例如通常为60度或更小），其传送具有高角度强度和亮度的电子束，并且延长寿命。
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