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公开(公告)号：US09899193B1
公开(公告)日：2018-02-20
申请号：US15341040
申请日：2016-11-02
发明人： Bon-Woong Koo , Yong-Seok Hwang , Kyong-Jae Chung
CPC分类号： H01J37/32458 , H01J27/16 , H01J37/08 , H01J37/321 , H01J37/3211 , H01J37/32412 , H01J37/32422 , H01J37/3244 , H01J37/32449 , H01J37/32623 , H01J37/32669 , H01J2237/024 , H01J2237/065 , H01J2237/31701 , H01J2237/327 , H01J2237/3365
摘要： Provided herein are approaches for dynamically modifying plasma volume in an ion source chamber by positioning an end plate and radio frequency (RF) antenna at a selected axial location. In one approach, an ion source includes a plasma chamber having a longitudinal axis extending between a first end wall and a second end wall, and an RF antenna adjacent a plasma within the plasma chamber, wherein the RF antenna is configured to provide RF energy to the plasma. The ion source may further include an end plate disposed within the plasma chamber, adjacent the first end wall, the end plate actuated along the longitudinal axis between a first position and a second position to adjust a volume of the plasma. By providing an actuable end plate and RF antenna, plasma characteristics may be dynamically controlled to affect ion source characteristics, such as composition of ion species, including metastable neutrals.
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公开(公告)号：US08895922B2
公开(公告)日：2014-11-25
申请号：US14003030
申请日：2012-03-15
申请人： Jean Berney
发明人： Jean Berney
IPC分类号： G21K5/04 , H01J37/073
CPC分类号： G21K5/04 , H01J37/073 , H01J2201/342 , H01J2237/06333 , H01J2237/065
摘要： A method suitable for preparing a specimen for inspection, the method comprising the steps of: irradiating a photocathode so that the photocathode emits electrons from a surface of the photocathode, wherein the emitted electrons each follow a trajectory, and the trajectories of the electrons are such that they can be extrapolated to intersect at a region within the photocathode, the region defining a virtual source, and wherein the photocathode comprises a rounded tip which has a radius of curvature; configuring the emitted electrons so that they form an electron beam; focusing the electron beam onto a specimen to form an image of the virtual source on the specimen. There is further provided a corresponding electron beam apparatus.
摘要翻译： 一种适于制备用于检查的样品的方法，所述方法包括以下步骤：照射光电阴极，使得光电阴极从光电阴极的表面发射电子，其中发射的电子各自遵循轨迹，并且电子的轨迹为 它们可以外推到在光电阴极内的区域相交，所述区域限定虚拟源，并且其中所述光电阴极包括具有曲率半径的圆形尖端; 配置发射的电子，使它们形成电子束; 将电子束聚焦到样本上以形成样本上的虚拟源的图像。 还提供了相应的电子束装置。
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公开(公告)号：US08669535B2
公开(公告)日：2014-03-11
申请号：US13322025
申请日：2010-04-14
IPC分类号： H01J1/50
CPC分类号： H01J37/063 , H01J37/073 , H01J37/141 , H01J2237/06316 , H01J2237/06341 , H01J2237/065 , H01J2237/26
摘要： The present invention has an object to provide a cold cathode field-emission electron gun with low aberration, to thereby provide a high-brightness electron gun even in the case of a large current. The present invention provides a field-emission electron gun which extracts an electron beam from a cathode and converges the extracted electron beam, the field-emission electron gun including: a magnetic field lens which is provided such that the cathode is disposed inside of a magnetic field of the lens; and an extraction electrode for extracting electrons from the cathode, the extraction electrode being formed into a cylindrical shape without an aperture structure. The present invention can provide an electron gun having a function of converging an electron beam using a magnetic field, the electron gun which is capable of reducing an incidental electrostatic lens action and has small aberration and high brightness.
摘要翻译： 本发明的目的是提供一种具有低像差的冷阴极场致发射电子枪，从而即使在大电流的情况下也提供高亮度电子枪。 本发明提供一种场致发射电子枪，其从阴极提取电子束并使所提取的电子束会聚，该场发射电子枪包括：磁场透镜，其被设置为使得阴极设置在磁性 镜头领域; 以及用于从阴极提取电子的引出电极，所述引出电极形成为没有孔结构的圆筒形状。 本发明可以提供一种电子枪，其具有使用磁场会聚电子束的功能，该电子枪能够减少偶然的静电透镜作用并且具有小的像差和高亮度。
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4.发明授权Small form factor plasma source for high density wide ribbon ion beam generation 有权用于高密度宽带离子束产生的小尺寸等离子体源公开(公告)号：US08590485B2
公开(公告)日：2013-11-26
申请号：US12767125
申请日：2010-04-26
申请人： Costel Biloiu , Jay Scheuer , Joseph Olson , Frank Sinclair , Daniel Distaso
发明人： Costel Biloiu , Jay Scheuer , Joseph Olson , Frank Sinclair , Daniel Distaso
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H05B31/26
CPC分类号： H01J37/08 , H01J27/16 , H01J37/3171 , H01J2237/061 , H01J2237/065 , H01J2237/0815 , H05H1/30
摘要： An ion source, capable of generating high-density wide ribbon ion beam, utilizing inductively coupled plasma production is disclosed. As opposed to conventional ICP sources, the present disclosure describes an ICP source which is not cylindrical. Rather, the source is defined such that its width, which is the dimension along which the beam is extracted, is greater than its height. The depth of the source may be defined to maximize energy transfer from the antenna to the plasma. In a further embodiment, a multicusp magnetic field surrounding the ICP source is used to further increase the current density and improve the uniformity of the extracted ion beam. Ion beam uniformity can also be controlled by means of several independent controls, including gas flow rate, and input RF power.
摘要翻译： 公开了一种能够利用电感耦合等离子体生产产生高密度宽带状离子束的离子源。 与常规ICP源相反，本公开描述了不是圆柱形的ICP源。 相反，源被限定为使得其宽度（其是提取梁的尺寸）大于其高度。 可以定义源的深度以最大化从天线到等离子体的能量传递。 在另一个实施例中，围绕ICP源的多谐振磁场用于进一步增加电流密度并提高所提取的离子束的均匀性。 离子束均匀性也可以通过几个独立的控制来控制，包括气体流速和输入射频功率。
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公开(公告)号：US20110018470A1
公开(公告)日：2011-01-27
申请号：US12896110
申请日：2010-10-01
申请人： Xu Zhang , Zhong-Wei Chen
发明人： Xu Zhang , Zhong-Wei Chen
CPC分类号： H01J37/141 , H01J37/063 , H01J2237/065 , H01J2237/083 , H01J2237/1035 , H01J2237/1405
摘要： An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. In combination with a probe forming objective lens, the electron gun apparatus can provide an electron beam of independently adjustable probe size and probe current, as is desirable in electron beam applications. The electron emitter is immersed in the magnetic field generated by a magnetic type pre-condenser lens. When activated, the pre-condenser lens collimates the beam effectively to increase its angular intensity while at the same time enlarging the virtual source as compared with non-immersion case, due to geometric magnification and aberrations of its lens action. The pre-condenser lens is followed by a condenser lens. If the condenser lens is of the magnetic type, its peak magnetic field is far enough away and thus its action does not significantly affect the size of the virtual source. Independent adjustment of the lenses, combined with suitable selection of final probe forming objective aperture size, allows various combination of the final probe size and probe current to be obtained in a range sufficient for most electron beam applications.
摘要翻译： 电子枪包括电子发射器，围绕电子发射体的电极，引出电极和双重聚光透镜组件，双重聚光透镜组件包括磁性浸入式预聚光透镜和聚光透镜。 与形成物镜的探针组合，如在电子束应用中所希望的那样，电子枪装置可以提供独立可调的探针尺寸和探针电流的电子束。 将电子发射器浸入由磁式预聚光透镜产生的磁场中。 当激活时，由于几何放大和其透镜作用的像差，预聚焦透镜有效地准直光束以增加其角度强度，同时与非浸没情况相比放大虚拟光源。 预聚光透镜之后是聚光透镜。 如果聚光透镜是磁性的，则其峰值磁场足够远，因此其作用不会显着影响虚拟源的尺寸。 透镜的独立调整结合适当选择最终探针形成物镜孔径的尺寸允许在足以满足大多数电子束应用的范围内获得最终探针尺寸和探针电流的各种组合。
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公开(公告)号：US07767977B1
公开(公告)日：2010-08-03
申请号：US12417929
申请日：2009-04-03
CPC分类号： H01J37/08 , H01J27/024 , H01J37/09 , H01J2237/0451 , H01J2237/0453 , H01J2237/0456 , H01J2237/065 , H01J2237/08 , H01J2237/083 , H01J2237/31 , H01J2237/31701 , Y10S438/961
摘要： An ion source includes an arc chamber having an extraction aperture, and a plasma sheath modulator. The plasma sheath modulator is configured to control a shape of a boundary between plasma and a plasma sheath proximate the extraction aperture. The plasma sheath modulator may include a pair of insulators positioned in the arc chamber and spaced apart by a gap positioned proximate the extraction aperture. A well focused ion beam having a high current density can be generated by the ion source. A high current density ion beam can improve the throughput of an associated process. The emittance of the ion beam can also be controlled.
摘要翻译： 离子源包括具有提取孔的电弧室和等离子体鞘调制器。 等离子体鞘调制器被配置为控制等离子体和靠近提取孔的等离子体鞘之间的边界的形状。 等离子体鞘调制器可以包括位于电弧室中的一对绝缘体，并且间隔开位于靠近提取孔的间隙。 可以通过离子源产生具有高电流密度的良好聚焦的离子束。 高电流密度离子束可以提高相关过程的吞吐量。 也可以控制离子束的发射。
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公开(公告)号：US20100019648A1
公开(公告)日：2010-01-28
申请号：US12586792
申请日：2009-09-28
IPC分类号： H01J29/54
CPC分类号： H01J37/063 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/06316 , H01J2237/06375 , H01J2237/065
摘要： An electron gun includes: an electron source; an accelerating electrode; an extraction electrode for extracting electrons from an electron emission surface of the electron source; a suppressor electrode for suppressing emission of electrons from a side surface of the electron source; and an electron beam converging unit for converging an electron beam of thermal field emission electrons emitted from the electron emission surface by applying an electric field to the electron emission surface. The electron beam converging unit is an electrostatic lens electrode which is placed between the extraction electrode and the accelerating electrode and having an opening portion in its center. A voltage is applied to the electrostatic lens electrode to converge the electron beam.
摘要翻译： 电子枪包括：电子源; 加速电极; 用于从电子源的电子发射表面提取电子的提取电极; 用于抑制从电子源的侧表面发射电子的抑制电极; 以及电子束会聚单元，用于通过向电子发射表面施加电场而会聚从电子发射表面发射的热场发射电子的电子束。 电子束会聚单元是放置在提取电极和加速电极之间并且在其中心具有开口部分的静电透镜电极。 电压施加到静电透镜电极以会聚电子束。
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公开(公告)号：US07095186B2
公开(公告)日：2006-08-22
申请号：US11070741
申请日：2005-03-01
申请人： Jörg Eichholz
发明人： Jörg Eichholz
IPC分类号： G05F1/00
CPC分类号： B82Y10/00 , G09G3/22 , H01J2201/30469 , H01J2237/0635 , H01J2237/065 , H05G1/30
摘要： A control circuit for controlling an electron-emitting device is formed to draw, with a voltage applied, an excitation current being related to a number of electrons emitted. The inventive control circuit includes a first determinator for determining whether an amount of charge transported by the excitation current has reached a predetermined charge threshold value, a second determinator for determining whether a magnitude of the excitation current has reached a predetermined current threshold value, and a switch for switching off the excitation current as soon as the first determinator determines that the amount of charge has reached a predetermined charge threshold value, or as soon as the second determinator determines that the magnitude of the excitation current is smaller than the predetermined current threshold value. The control circuit allows the usage of, for example, CNT arrays for irradiation and operates on the basis of the current drawn by the electron-emitting device, which makes possible a simple setup.
摘要翻译： 形成用于控制电子发射器件的控制电路，以施加电压来绘制与所发射的电子数量有关的激励电流。 本发明的控制电路包括用于确定由激励电流传输的电荷量是否已经达到预定充电阈值的第一确定器，用于确定励磁电流的大小是否已经达到预定电流阈值的第二确定器，以及 一旦第一确定器确定电荷量已经达到预定电荷阈值，或者一旦第二确定器确定激励电流的大小小于预定电流阈值，则一旦关闭激励电流， 。 控制电路允许使用例如CNT阵列进行照射，并且基于由电子发射器件绘制的电流进行操作，这使得可以进行简单的设置。
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公开(公告)号：US06456019B1
公开(公告)日：2002-09-24
申请号：US09775762
申请日：2001-02-03
IPC分类号： G09G104
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , H01J2237/065
摘要： A method and a apparatus are provided for operating an E-beam system including an E-beam source for generating an E-beam directed along a column axis and an electrode aligned with the column axis direct the E-beam towards means for measuring the E-beam. A signal proportional to leakage current emitted from the E-beam is generated. When the result of a comparison with a desired value is excessive, an excess leakage signal is generated. The excess leakage signal can be provided as an emergency output signal and/or produce an OFF signal for stopping production of the E-beam by turning OFF voltage/power sources for producing the E-beam in response to the excess leakage signal. Preferably, a filament is heated by an electric current and a cathode is bombarded with electrons from the filament to produce the E-beam. Then a filament control signal is employed for controlling the filament heating current.
摘要翻译： 提供了一种用于操作电子束系统的电子束系统的方法和装置，所述电子束系统包括用于产生沿着列轴线定向的电子束的电子束源和与所述列轴对准的电极，所述电子束系统将所述电子束指向用于测量所述E的装置 -光束。 产生与从电子束发射的泄漏电流成比例的信号。 当与期望值的比较结果过大时，产生过量的泄漏信号。 可以根据过量的泄漏信号，通过关闭用于产生电子束的电压/电源来提供过量的泄漏信号作为紧急输出信号和/或产生用于停止电子束的产生的OFF信号。 优选地，灯丝被电流加热，并且阴极被来自灯丝的电子轰击以产生电子束。 然后使用灯丝控制信号来控制灯丝加热电流。
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公开(公告)号：US20180138020A1
公开(公告)日：2018-05-17
申请号：US15863326
申请日：2018-01-05
发明人： Bon-Woong Koo , Yong-Seok Hwang , Kyong-Jae Chung
IPC分类号： H01J37/32
CPC分类号： H01J37/32458 , H01J27/16 , H01J37/08 , H01J37/321 , H01J37/3211 , H01J37/32412 , H01J37/32422 , H01J37/3244 , H01J37/32449 , H01J37/32623 , H01J37/32669 , H01J2237/024 , H01J2237/065 , H01J2237/31701 , H01J2237/327 , H01J2237/3365
摘要： Provided herein are approaches for dynamically modifying plasma volume in an ion source chamber by positioning an end plate and radio frequency (RF) antenna at a selected axial location. In one approach, an ion source includes a plasma chamber having a longitudinal axis extending between a first end wall and a second end wall, and an RF antenna adjacent a plasma within the plasma chamber, wherein the RF antenna is configured to provide RF energy to the plasma. The ion source may further include an end plate disposed within the plasma chamber, adjacent the first end wall, the end plate actuated along the longitudinal axis between a first position and a second position to adjust a volume of the plasma. By providing an actuable end plate and RF antenna, plasma characteristics may be dynamically controlled to affect ion source characteristics, such as composition of ion species, including metastable neutrals.
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