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公开(公告)号：US20080205472A1
公开(公告)日：2008-08-28
申请号：US11796065
申请日：2007-04-25
申请人： Wayne J. Dunstan , Kevin M. O'Brien , Robert N. Jacques , Herve A. Besaucele , Daniel J. Riggs , Aravind Ratnam
发明人： Wayne J. Dunstan , Kevin M. O'Brien , Robert N. Jacques , Herve A. Besaucele , Daniel J. Riggs , Aravind Ratnam
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , G03F7/70025 , G03F7/70525 , G03F7/70975 , H01S3/0014 , H01S3/1305 , H01S3/1306 , H01S3/134 , H01S3/2251 , H01S3/2256
摘要： A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.
摘要翻译： 公开了一种方法和装置，其可以包括预测用于光刻工艺的气体放电激光光源的气体寿命，包括含卤素的激光气体的光源可以包括：利用多个激光操作输入和/ 或输出参数; 在光刻工艺中利用一组至少一个利用参数来确定相对于相应输入或输出参数的气体使用模型; 基于模型和相应的输入或输出参数的测量来预测气体寿命的结束。 该参数可以包括脉冲利用模式。 该方法和装置可以包括对用于光刻工艺的气体放电激光光源执行气体管理，该光源包括含卤素的激光气体，其包括：利用周期性和频繁的部分气体再填充，其包括含有卤素气体和体积的混合物 气体通常与在全气体再填充中提供给激光器的预混合比率相同，并且其量小于喷射前的总气体压力的2％。
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公开(公告)号：US07835414B2
公开(公告)日：2010-11-16
申请号：US11796065
申请日：2007-04-25
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , G03F7/70025 , G03F7/70525 , G03F7/70975 , H01S3/0014 , H01S3/1305 , H01S3/1306 , H01S3/134 , H01S3/2251 , H01S3/2256
摘要： A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.
摘要翻译： 公开了一种方法和装置，其可以包括预测用于光刻工艺的气体放电激光光源的气体寿命，包括含卤素的激光气体的光源可以包括：利用多个激光操作输入和/ 或输出参数; 在光刻工艺中利用一组至少一个利用参数来确定相对于相应输入或输出参数的气体使用模型; 基于模型和相应的输入或输出参数的测量来预测气体寿命的结束。 该参数可以包括脉冲利用模式。 该方法和装置可以包括对用于光刻工艺的气体放电激光光源执行气体管理，该光源包括含卤素的激光气体，其包括：利用周期性和频繁的部分气体再填充，其包括含有卤素气体和体积的混合物 气体通常与在全气体再填充中提供给激光器的预混合比率相同，并且其量小于喷射前的总气体压力的2％。
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公开(公告)号：US08098698B2
公开(公告)日：2012-01-17
申请号：US12925860
申请日：2010-11-01
CPC分类号： H01S3/13 , G03F7/70575 , H01S3/134 , H01S3/136
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output light pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.
摘要翻译： 根据所公开主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出光脉冲带宽的带宽测量模块 由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。 精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。 粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。
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公开(公告)号：US20090067457A1
公开(公告)日：2009-03-12
申请号：US11900527
申请日：2007-09-11
IPC分类号： H01S3/10
CPC分类号： H01S3/225 , H01S3/1305 , H01S3/134
摘要： A method and apparatus is disclosed which may comprise: a gas discharge laser system energy controller which may comprise: a laser system energy controller providing a first laser operating parameter control signal based on an error signal related to a value of the output energy of the laser system compared to a target value for output energy and an energy controller model of the value of the first laser operating parameter necessary to change the value of the laser system output energy to the target value; a first laser system operating parameter control signal modifier providing a modification to the first laser system operating parameter control signal based upon a controller signal modification model of the impact of a second laser system operating parameter on the value of the first laser system operating parameter necessary to change the value of the output energy to the target value.
摘要翻译： 公开了一种方法和装置，其可以包括：气体放电激光系统能量控制器，其可以包括：激光系统能量控制器，其基于与激光器的输出能量的值相关的误差信号提供第一激光器操作参数控制信号 系统与输出能量的目标值相比，以及将激光系统输出能量的值改变为目标值所需的第一激光器操作参数的值的能量控制器模型; 第一激光系统操作参数控制信号修改器，其基于第二激光系统操作参数对第一激光系统操作参数的值的控制器信号修改模型，提供对第一激光系统操作参数控制信号的修改， 将输出能量的值更改为目标值。
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公开(公告)号：US20110051760A1
公开(公告)日：2011-03-03
申请号：US12925860
申请日：2010-11-01
IPC分类号： H01S3/10
CPC分类号： H01S3/13 , G03F7/70575 , H01S3/134 , H01S3/136
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output light pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.
摘要翻译： 根据所公开主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出光脉冲带宽的带宽测量模块 由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。 精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。 粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。
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公开(公告)号：US07852889B2
公开(公告)日：2010-12-14
申请号：US11510037
申请日：2006-08-25
IPC分类号： H01S3/086 , H01S3/097 , H01S3/1055 , H01S3/22
CPC分类号： H01S3/13 , G03F7/70575 , H01S3/134 , H01S3/136
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output flight pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.
摘要翻译： 根据所公开的主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出飞行脉冲带宽的带宽测量模块 由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。 精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。 粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。
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公开(公告)号：US07830942B2
公开(公告)日：2010-11-09
申请号：US11900527
申请日：2007-09-11
CPC分类号： H01S3/225 , H01S3/1305 , H01S3/134
摘要： A method and apparatus is disclosed which may comprise: a gas discharge laser system energy controller which may comprise: a laser system energy controller providing a first laser operating parameter control signal based on an error signal related to a value of the output energy of the laser system compared to a target value for output energy and an energy controller model of the value of the first laser operating parameter necessary to change the value of the laser system output energy to the target value; a first laser system operating parameter control signal modifier providing a modification to the first laser system operating parameter control signal based upon a controller signal modification model of the impact of a second laser system operating parameter on the value of the first laser system operating parameter necessary to change the value of the output energy to the target value.
摘要翻译： 公开了一种方法和装置，其可以包括：气体放电激光系统能量控制器，其可以包括：激光系统能量控制器，其基于与激光器的输出能量的值相关的误差信号提供第一激光器操作参数控制信号 系统与输出能量的目标值相比，以及将激光系统输出能量的值改变为目标值所需的第一激光器操作参数的值的能量控制器模型; 第一激光系统操作参数控制信号修改器，其基于第二激光系统操作参数对第一激光系统操作参数的值的控制器信号修改模型，提供对第一激光系统操作参数控制信号的修改， 将输出能量的值更改为目标值。
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8.发明授权Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control 有权多室准分子或分子氟气放电激光氟注射控制公开(公告)号：US07741639B2
公开(公告)日：2010-06-22
申请号：US10953100
申请日：2004-09-29
申请人： Herve A. Besaucele , Wayne J. Dunstan , Toshihiko Ishihara , Robert N. Jacques , Fedor B. Trintchouk
发明人： Herve A. Besaucele , Wayne J. Dunstan , Toshihiko Ishihara , Robert N. Jacques , Fedor B. Trintchouk
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/225 , H01S3/2316 , H01S3/2366
摘要： A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and the at least one amplifier chamber, and producing an output representative of an estimated halogen gas consumption in the at least one oscillator chamber and of the halogen gas consumption in the at least one amplifier chamber, and a halogen gas injection controller determining the amount of halogen gas injection for the at least one oscillator chamber and the at least one amplifier chamber based upon the estimated fluorine consumption outputs from the fluorine consumption estimator and a cost function comprising a plurality of weighted injection decision determinations.
摘要翻译： 一种多腔准分子或分子卤素气体放电激光系统，包括至少一个振荡器室和至少一个产生振荡器的放大器室输出在至少一个功率室中放大的激光脉冲，具有氟注入控制系统和方法 其中可以包括：卤素气体消耗估计器：基于至少一个振荡器之一的至少一个振荡器中的至少一个振荡器的至少一个振荡器的至少第一操作参数来估计在所述至少一个振荡器腔室中的一个中消耗的卤素气体的量 室和至少一个放大器室，以及所述至少一个振荡器室和所述至少一个放大器室的第二操作参数之间的差异，并且估计至少在另一个中消耗的卤素气体的量 基于所述至少一个的另一个的至少第三操作参数，所述至少一个振荡器室和所述至少一个放大器室 e振荡器室和所述至少一个放大器室，并且产生代表所述至少一个振荡器室中的估计的卤素气体消耗量的输出和所述至少一个放大器室中的卤素气体消耗量，以及卤素气体注入控制器确定 基于来自氟消耗估计器的估计的氟消耗量输出和包括多个加权喷射判定确定的成本函数，至少一个振荡室和至少一个放大器室的卤素气体喷射量。
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公开(公告)号：US20070195836A1
公开(公告)日：2007-08-23
申请号：US11510037
申请日：2006-08-25
IPC分类号： H01S3/13
CPC分类号： H01S3/13 , G03F7/70575 , H01S3/134 , H01S3/136
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output flight pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.
摘要翻译： 根据所公开的主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出飞行脉冲带宽的带宽测量模块 由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。 精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。 粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。
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10.发明授权System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet light production 有权系统和方法适应性地预补偿目标材料推出，以优化极紫外光生产公开(公告)号：US09238243B2
公开(公告)日：2016-01-19
申请号：US13631645
申请日：2012-09-28
CPC分类号： G03F7/70033 , B05B17/00 , H05G2/006 , H05G2/008 , H05H1/24
摘要： Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.
摘要翻译： 来自激光产生的等离子体（LPP）极紫外光（EUV）系统的能量输出基于激光束聚焦在目标材料的液滴上以在主要焦点产生等离子体的程度而变化。 在爆发射击过程中，在主焦点处保持液滴是困难的，因为来自前面的液滴的所产生的等离子体将后续的液滴推出主焦点。 将液滴重新对准主要焦点的当前液滴到液滴的反馈控制相对较慢。 本文所述的系统和方法通过将液滴引导到偏离主要焦点的目标位置来自适应地预补偿液滴推出，使得当液滴被照射时，液滴被激光束推动到主要焦点 点产生等离子体。 随着时间的推移，EUV系统学会保持液滴位置的实时对准，从而在主焦点内始终产生等离子体。
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