DISPLAY PANEL FOR THE BLIND AND METHOD FOR MANUFACTURING THE SAME AND DISPLAY DEVICE FOR THE BLIND
    1.
    发明申请
    DISPLAY PANEL FOR THE BLIND AND METHOD FOR MANUFACTURING THE SAME AND DISPLAY DEVICE FOR THE BLIND 有权
    用于盲孔的显示面板及其制造方法及其显示装置

    公开(公告)号:US20130147737A1

    公开(公告)日:2013-06-13

    申请号:US13702111

    申请日:2012-08-30

    IPC分类号: G06F3/041 H01L33/52

    摘要: Embodiments of the present invention provide a display panel for the blind and a method for manufacturing the same and a display device for the blind. The display panel for the blind comprises: an array substrate, including a glass substrate and data lines and gate lines formed on the glass substrate, the data lines and gate lines intersecting each other so as to form pixel units, each of the pixel units including a pixel electrode; a touch substrate, including a flexible film layer and charged columnar structures provided on the flexible film layer; and an elastic film layer, provided between the array substrate and the touch substrate, wherein a side of the touch substrate on which the charged columnar structures are formed faces a side of the array substrate on which the pixel electrodes are formed, and the charged columnar structures on the touch substrate correspond to the pixel electrodes on the array substrate one to one.

    摘要翻译: 本发明的实施例提供了一种用于盲人的显示面板及其制造方法以及用于盲人的显示装置。 用于盲人的显示面板包括:阵列基板,包括玻璃基板和形成在玻璃基板上的数据线和栅极线,数据线和栅极线彼此交叉以形成像素单元,每个像素单元包括 像素电极; 触摸基板,包括柔性膜层和设置在柔性膜层上的带电柱状结构; 以及设置在所述阵列基板和所述触摸基板之间的弹性膜层,其中,形成有带电柱状结构的所述触摸基板的一侧面向形成有所述像素电极的所述阵列基板的一侧,并且所述带电柱状 触摸基板上的结构一一对应于阵列基板上的像素电极。

    Manufacture methods of thin film transistor and array substrate and mask
    2.
    发明授权
    Manufacture methods of thin film transistor and array substrate and mask 有权
    薄膜晶体管和阵列基板和掩模的制造方法

    公开(公告)号:US08691639B2

    公开(公告)日:2014-04-08

    申请号:US13484835

    申请日:2012-05-31

    IPC分类号: H01L21/00

    摘要: Embodiments of the disclosed technology disclose manufacture methods of a thin film transistor and an array substrate and a mask therefor are provided. The manufacture method of the thin film transistor comprises: patterning a wire layer by using a exposure machine and a mask with a first exposure amount larger than a normal exposure amount during formation of source and drain electrodes; forming a semiconductor layer on the patterned wire layer; patterning the semiconductor layer by using the exposure machine and the mask with a second exposure amount smaller than the first exposure amount. The mask comprises a source region for forming the source electrode, a drain region for forming the drain electrode and a slit provided between the source region and the drain region, and the width of the slit is smaller than the resolution of the exposure machine.

    摘要翻译: 所公开的技术的实施例公开了薄膜晶体管和阵列基板及其掩模的制造方法。 薄膜晶体管的制造方法包括:在源极和漏极形成期间,通过使用曝光机和具有大于正常曝光量的第一曝光量的掩模来图案化布线层; 在所述图案化的导线层上形成半导体层; 通过使用曝光机和具有小于第一曝光量的第二曝光量的掩模来图案化半导体层。 掩模包括用于形成源电极的源极区域,用于形成漏极电极的漏极区域和设置在源极区域和漏极区域之间的狭缝,并且狭缝的宽度小于曝光机器的分辨率。

    Method for fixing glass substrates and method for preparing flexible display device
    3.
    发明授权
    Method for fixing glass substrates and method for preparing flexible display device 有权
    固定玻璃基板的方法和制备柔性显示装置的方法

    公开(公告)号:US08613825B2

    公开(公告)日:2013-12-24

    申请号:US13407849

    申请日:2012-02-29

    摘要: Embodiments of the disclosed technology disclose a method for fixing glass substrates and a method for preparing a flexible display device. The method for fixing glass substrates comprises coating an edge portion of a first glass substrate corresponding to a second glass substrate with epoxy resin and screeding the coated epoxy resin layer, adhering the second glass substrate to the first glass substrate, and annealing the two glass substrates. With the technical solution of this disclosed technology, the time period for fixing the adhered glass substrates can be reduced with an improved productivity.

    摘要翻译: 所公开的技术的实施例公开了一种用于固定玻璃基板的方法和一种制备柔性显示装置的方法。 固定玻璃基板的方法包括用环氧树脂涂覆对应于第二玻璃基板的第一玻璃基板的边缘部分,并对涂覆的环氧树脂层进行刮板,将第二玻璃基板粘合到第一玻璃基板上,并对两个玻璃基板进行退火 。 利用所公开的技术的技术方案,可以提高生产率来降低粘附玻璃基板的固定时间。

    Display panel for the blind and method for manufacturing the same and display device for the blind
    4.
    发明授权
    Display panel for the blind and method for manufacturing the same and display device for the blind 有权
    盲人显示面板及其制造方法及盲人显示装置

    公开(公告)号:US09244547B2

    公开(公告)日:2016-01-26

    申请号:US13702111

    申请日:2012-08-30

    IPC分类号: G06F3/041 G09B21/00 H01L33/52

    摘要: Embodiments of the present invention include a display panel for the blind, a method for manufacturing the same and a display device for the blind. The display panel for the blind includes an array substrate, a touch substrate and an elastic film. The array substrate includes a glass substrate and data lines and gate lines formed on the glass substrate. The data lines and gate lines intersect each other so as to form pixel units, with each of the pixel units including a pixel electrode. The touch substrate includes a flexible film layer and charged columnar structures provided on the flexible film layer. The elastic film layer is provided between the array substrate and the touch substrate. The side of the touch substrate on which the charged columnar structures are formed faces the side of the array substrate on which the pixel electrodes are formed, and the charged columnar structures on the touch substrate correspond to the pixel electrodes on the array substrate one to one.

    摘要翻译: 本发明的实施例包括用于盲人的显示面板,其制造方法和盲人显示装置。 用于盲人的显示面板包括阵列基板,触摸基板和弹性膜。 阵列基板包括玻璃基板和形成在玻璃基板上的数据线和栅极线。 数据线和栅极线彼此相交以形成像素单元,其中每个像素单元包括像素电极。 触摸基板包括柔性膜层和设置在柔性膜层上的带电柱状结构。 弹性膜层设置在阵列基板和触摸基板之间。 形成带电柱状结构的触摸基板的一侧面对形成有像素电极的阵列基板的一侧,并且触摸基板上的带电柱状结构一一对应于阵列基板上的像素电极 。

    Method for preparing conducting film on ultra-thin glass substrate, LCD substrate, liquid crystal panel and LCD device
    5.
    发明授权
    Method for preparing conducting film on ultra-thin glass substrate, LCD substrate, liquid crystal panel and LCD device 有权
    在超薄玻璃基板,LCD基板,液晶面板和LCD装置上制备导电膜的方法

    公开(公告)号:US09134559B2

    公开(公告)日:2015-09-15

    申请号:US13703724

    申请日:2012-08-17

    摘要: The invention is related to a method of preparing a conducting film on an ultra-thin glass substrate. The preparing method uses magnetron sputtering, setting an initial magnetron sputtering power and/or an initial flow rate of argon to deposit the conducting film, detecting film layer stress of the conducting film by a pressure sensor on provided on the ultra-thin glass substrate, and adjusting a magnetron sputtering power and/or a flow rate of argon gas in real time according to the detected film layer stress, such that an absolute value of the film layer stress is kept below a predetermined value; the ultra-thin glass substrate has a thickness less than 0.1 mm.

    摘要翻译: 本发明涉及在超薄玻璃基板上制备导电膜的方法。 制备方法使用磁控溅射,设定初始磁控溅射功率和/或氩的初始流速以沉积导电膜,通过设置在超薄玻璃基板上的压力传感器检测导电膜的膜层应力, 并根据检测到的膜层应力实时调整磁控溅射功率和/或氩气流量,使得膜层应力的绝对值保持在预定值以下; 超薄玻璃基板的厚度小于0.1mm。

    Method For Preparing Conducting Film On Ultra-Thin Glass Substrate, LCD Substrate, Liquid Crystal Panel and LCD Device
    6.
    发明申请
    Method For Preparing Conducting Film On Ultra-Thin Glass Substrate, LCD Substrate, Liquid Crystal Panel and LCD Device 有权
    在超薄玻璃基板,LCD基板,液晶面板和LCD装置上制备导电膜的方法

    公开(公告)号:US20130148073A1

    公开(公告)日:2013-06-13

    申请号:US13703724

    申请日:2012-08-17

    IPC分类号: G02F1/1333

    摘要: The invention is related to a method of preparing a conducting film on an ultra-thin glass substrate. The preparing method uses magnetron sputtering, setting an initial magnetron sputtering power and/or an initial flow rate of argon to deposit the conducting film, detecting film layer stress of the conducting film by a pressure sensor on provided on the ultra-thin glass substrate, and adjusting a magnetron sputtering power and/or a flow rate of argon gas in real time according to the detected film layer stress, such that an absolute value of the film layer stress is kept below a predetermined value; the ultra-thin glass substrate has a thickness less than 0.1 mm.

    摘要翻译: 本发明涉及在超薄玻璃基板上制备导电膜的方法。 制备方法使用磁控溅射,设定初始磁控溅射功率和/或氩的初始流速以沉积导电膜,通过设置在超薄玻璃基板上的压力传感器检测导电膜的膜层应力, 并根据检测到的膜层应力实时调整磁控溅射功率和/或氩气流量,使得膜层应力的绝对值保持在预定值以下; 超薄玻璃基板的厚度小于0.1mm。

    Liquid crystal display panel and method for driving the same
    7.
    发明授权
    Liquid crystal display panel and method for driving the same 有权
    液晶显示面板及其驱动方法

    公开(公告)号:US09448434B2

    公开(公告)日:2016-09-20

    申请号:US13701961

    申请日:2012-07-11

    申请人: Jianshe Xue Xiang Liu

    发明人: Jianshe Xue Xiang Liu

    摘要: Embodiments of the present invention disclose a liquid crystal display panel and a method of driving the same. A subpixel unit includes a transmissive portion and a reflective portion, the transmissive portion comprises a transmissive portion thin film transistor and a transmissive pixel electrode connected to a drain of the transmissive portion thin film transistor, the reflective portion comprises a reflective layer, a reflective portion thin film transistor and a reflective pixel electrode connected to a drain of the reflective portion thin film transistor, a gate of the transmissive portion thin film transistor and a gate of the reflective portion thin film transistor each are connected to a gate line of the subpixel unit, and a source of the transmissive portion thin film transistor and a source of the reflective portion thin film transistor are connected to different data lines.

    摘要翻译: 本发明的实施例公开了一种液晶显示面板及其驱动方法。 子像素单元包括透射部分和反射部分,透射部分包括透射部分薄膜晶体管和连接到透射部分薄膜晶体管的漏极的透射像素电极,反射部分包括反射层,反射部分 薄膜晶体管和连接到反射部分薄膜晶体管的漏极的反射像素电极,透射部分薄膜晶体管的栅极和反射部分薄膜晶体管的栅极分别连接到子像素单元的栅极线 并且透射部分薄膜晶体管的源极和反射部分薄膜晶体管的源极连接到不同的数据线。

    Thin film transistor array baseplate
    8.
    发明授权
    Thin film transistor array baseplate 有权
    薄膜晶体管阵列基板

    公开(公告)号:US09263594B2

    公开(公告)日:2016-02-16

    申请号:US13701877

    申请日:2012-08-20

    申请人: Xiang Liu Jianshe Xue

    发明人: Xiang Liu Jianshe Xue

    摘要: An embodiment of the present invention provides a TFT array substrate including: a base substrate (1) and thin film transistors. The thin film transistor includes a gate electrode (2), a semiconductor layer (5), a semiconductor protective layer, a source electrode (8) and a drain electrode (9). The semiconductor protective layer is disposed adjacent to the semiconductor layer (5) and includes a composite lamination structure, which includes a protective layer formed of an insulating material capable of preventing de-oxygen of the semiconductor layer (5) and an insulating layer formed of an insulating material to be etched more easily.

    摘要翻译: 本发明的实施例提供一种TFT阵列基板,包括:基底(1)和薄膜晶体管。 薄膜晶体管包括栅电极(2),半导体层(5),半导体保护层,源电极(8)和漏电极(9)。 半导体保护层与半导体层(5)相邻设置,并且包括复合层压结构,其包括由能够防止半导体层(5)的脱氧的绝缘材料形成的保护层和由 更容易蚀刻的绝缘材料。

    THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME AND ELECTRONIC DEVICE
    9.
    发明申请
    THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME AND ELECTRONIC DEVICE 有权
    薄膜晶体管阵列基板及其制造方法及电子设备

    公开(公告)号:US20130140574A1

    公开(公告)日:2013-06-06

    申请号:US13702115

    申请日:2012-08-17

    申请人: Xiang Liu Jianshe Xue

    发明人: Xiang Liu Jianshe Xue

    IPC分类号: H01L29/66 H01L29/786

    摘要: Embodiments of the present invention disclose a thin film transistor array substrate and a method for manufacturing the same and an electronic device. The method for manufacturing the thin film transistor array substrate comprises: a first patterning process, in which a pattern of an active layer which is formed by a semiconductor layer and patterns of a source electrode and a drain electrode, which are separated from each other and are formed by a first metal layer, are formed on a transparent substrate; a second patterning process, in which a pattern of an insulating layer is formed on the transparent substrate subjected to the first patterning process, the pattern of the insulating layer comprising a contact via hole exposing the source electrode; and a third patterning process, in which a pattern of a pixel electrode, which is formed by a transparent conductive layer, and a pattern of a gate electrode, which is formed by a second metal layer, are formed on the transparent substrate subjected to the second patterning process, the pixel electrode being connected to the source electrode through the contact via hole.

    摘要翻译: 本发明的实施例公开了一种薄膜晶体管阵列基板及其制造方法和电子设备。 制造薄膜晶体管阵列基板的方法包括:第一图案化工艺,其中由半导体层形成的有源层的图案和源电极和漏电极的图案彼此分离,以及 由第一金属层形成,形成在透明基板上; 第二图案化工艺,其中在经过第一图案化工艺的透明基板上形成绝缘层的图案,所述绝缘层的图案包括暴露所述源电极的接触通孔; 以及第三图案化工艺,其中由透明导电层形成的像素电极的图案和由第二金属层形成的栅电极的图案形成在经受 第二图案化处理,像素电极通过接触通孔与源电极连接。