公开(公告)号：US20110208459A1

公开(公告)日：2011-08-25

申请号：US13018226

申请日：2011-01-31

申请人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

发明人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

IPC分类号： G06F19/00

CPC分类号： G03F7/70775 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70783

摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

摘要翻译： 光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

公开(公告)号：US08451454B2

公开(公告)日：2013-05-28

申请号：US12268659

申请日：2008-11-11

申请人： Willem Herman Gertruda Anna Koenen ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch

发明人： Willem Herman Gertruda Anna Koenen ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC分类号： G01B11/14 ,  G03B27/42 ,  G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70508 ,  G03F7/7085

摘要： A position measurement system to measure a position of a movable stage includes a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative to the reference plate, at least a subset of the plurality of sensors is configured to cooperate with the reference plate to provide for each of the sensors in the subset respective sensor signals representative of a position of the respective sensor relative to the reference plate; and a processor arranged to determine from the sensor signals a stage position, the processing device configured so as to, when the stage is in a position where an over-determined number of sensor signals is provided by at least the subset of the sensors that are in operational cooperation with the reference plate, (a) determine the stage position from a subset of the over-determined number of sensor signals, and (b) correct a sensor signal of one or more of the sensors from a discrepancy between the determined stage position and a remainder of the sensors signals.

公开(公告)号：US20130050670A1

公开(公告)日：2013-02-28

申请号：US13589775

申请日：2012-08-20

申请人： Willem Herman Gertruda Anna Koenen ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Robbert Edgar Van Leeuwen ,  Adrianus Hendrik Koevoets

发明人： Willem Herman Gertruda Anna Koenen ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Robbert Edgar Van Leeuwen ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/52 ,  G06F19/00

CPC分类号： H01L23/544 ,  G03F7/70 ,  G03F7/70775 ,  G03F9/7019 ,  H01L21/682 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

摘要： A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.

摘要翻译： 位置测量系统包括第一部分和第二部分，用于通过提供表示第一部分相对于第二部分的位置的位置信号来确定第一部件相对于第二部件的位置，以及计算单元，包括输入 端子用于接收位置信号。 计算单元被配置为在使用中将转换应用于位置信号以获得表示第一构件相对于第二构件的位置的信号; 并且对所述转换应用调整以至少部分地补偿所述第一部分或所述第二部分或两者的漂移。 该调整基于第一部分或第二部分或两者的预定漂移特性。 预定漂移特性包括第一部分和/或第二部分的一个或多个基本形状。

公开(公告)号：US07557903B2

公开(公告)日：2009-07-07

申请号：US11296871

申请日：2005-12-08

申请人： Carolus Johannes Catharina Schoormans ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Nicolas Alban Lallemant ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Mathias Theodorus Antonius Adriaens

发明人： Carolus Johannes Catharina Schoormans ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Nicolas Alban Lallemant ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Mathias Theodorus Antonius Adriaens

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/70775

摘要： A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.

摘要翻译： 一种器件制造方法包括将图案化的辐射束投射到衬底上，其中可移动物体的位置使用多个传感器以多个自由度确定，传感器的数量大于自由度的数量 其中，利用每个传感器的信号来确定可移动物体的位置，其中，所述传感器的信号是基于每个传感器的噪声水平之差而被称重的。 在光刻设备中，可移动物体的位置测量精度和/或覆盖和聚焦性能得到改善。

公开(公告)号：US08922756B2

公开(公告)日：2014-12-30

申请号：US13589775

申请日：2012-08-20

申请人： Willem Herman Gertruda Anna Koenen ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Robbert Edgar Van Leeuwen ,  Adrianus Hendrik Koevoets

发明人： Willem Herman Gertruda Anna Koenen ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Robbert Edgar Van Leeuwen ,  Adrianus Hendrik Koevoets

IPC分类号： H01L23/544 ,  G03F9/00 ,  G03F7/20 ,  H01L21/68

CPC分类号： H01L23/544 ,  G03F7/70 ,  G03F7/70775 ,  G03F9/7019 ,  H01L21/682 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

摘要： A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.

摘要翻译： 位置测量系统包括第一部分和第二部分，用于通过提供表示第一部分相对于第二部分的位置的位置信号来确定第一部件相对于第二部件的位置，以及计算单元，包括输入 端子用于接收位置信号。 计算单元被配置为在使用中将转换应用于位置信号以获得表示第一构件相对于第二构件的位置的信号; 并且对所述转换应用调整以至少部分地补偿所述第一部分或所述第二部分或两者的漂移。 该调整基于第一部分或第二部分或两者的预定漂移特性。 预定漂移特性包括第一部分和/或第二部分的一个或多个基本形状。

公开(公告)号：US08174671B2

公开(公告)日：2012-05-08

申请号：US12142271

申请日：2008-06-19

申请人： Erik Roelof Loopstra ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Erik Roelof Loopstra ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/32 ,  G01B11/14 ,  G01B11/00

CPC分类号： G03F7/709 ,  G03F7/70775 ,  G03F7/70858 ,  G03F9/7096

摘要： A control system controls a support structure of a lithographic apparatus. A first measurement system measures the position of a substrate supported by the support structure, in a first coordinate system. A second measurement system measures the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. A controller controls the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure dependent upon the position error signal.

摘要翻译： 控制系统控制光刻设备的支撑结构。 第一测量系统在第一坐标系中测量由支撑结构支撑的基板的位置。 第二测量系统测量支撑结构在第二坐标系中的位置，第一测量系统在第二坐标系中具有推测位置。 控制器基于第二测量系统的测量来控制支撑结构的位置，将基板的测量位置转换成第二坐标系中的支撑结构的转换位置，以基于转换位置定位支撑结构 以接收表示第二坐标系中的第一测量系统的推测位置与实际位置之间的差异的位置误差信号，并且根据位置误差信号定位支撑结构。

公开(公告)号：US08781775B2

公开(公告)日：2014-07-15

申请号：US13018226

申请日：2011-01-31

申请人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

发明人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

IPC分类号： G01C17/38

CPC分类号： G03F7/70775 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70783

摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

摘要翻译： 光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

公开(公告)号：US09316928B2

公开(公告)日：2016-04-19

申请号：US13194791

申请日：2011-07-29

申请人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Andre Bernardus Jeunink ,  Robbert Edgar Van Leeuwen

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Andre Bernardus Jeunink ,  Robbert Edgar Van Leeuwen

IPC分类号： G03B27/54 ,  G03B27/58 ,  G03B27/42 ,  G03B27/62 ,  G03F7/20 ,  G03B27/32

CPC分类号： G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

摘要： A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

摘要翻译： 一种测量系统，被配置为测量对象台的与位置相关的信号，所述测量系统包括可安装在所述对象台上的至少一个传感器和可安装在基本上固定的框架上的传感器目标对象;以及安装装置，其被配置为安装所述传感器目标 物体在基本上固定的框架上，其中测量系统还包括补偿器，其被配置为补偿传感器目标物体相对于基本上固定的框架的运动和/或变形。 补偿器可以包括无源或主动阻尼器和/或反馈位置控制器。 在替代实施例中，补偿器包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。

公开(公告)号：US08614783B2

公开(公告)日：2013-12-24

申请号：US12392852

申请日：2009-02-25

申请人： Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Robbert Edgar Van Leeuwen ,  Renatus Gerardus Klaver ,  Martijn Robert Hamers

发明人： Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Robbert Edgar Van Leeuwen ,  Renatus Gerardus Klaver ,  Martijn Robert Hamers

IPC分类号： G03B27/52 ,  G03B27/58

CPC分类号： G03B27/54 ,  G01D5/24461 ,  G01D5/347 ,  G03F7/70775

摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.

摘要翻译： 编码器型测量系统被配置为测量可移动物体的位置相关信号。 测量系统包括光源和传感器。 光源和传感器安装在可移动物体之一或基本上固定的框架上。 测量系统还包括参考对象，其包括安装在可移动物体或基本上固定的框架上的另一个上的光栅或栅格。 光源被配置为朝向参考对象发射光束。 传感器被配置为检测由参考对象反射的光源的光。 该测量系统还包括能够在连续生产过程中检测传感器目标物体的光栅或格栅上的误差的误差检测器。

公开(公告)号：US07474409B2

公开(公告)日：2009-01-06

申请号：US10995545

申请日：2004-11-24

申请人： Emiel Jozef Melanie Eussen ,  Marcel Hendrikus Maria Beems ,  Engelbertus Antonius Fransiscus Van Der Pasch

发明人： Emiel Jozef Melanie Eussen ,  Marcel Hendrikus Maria Beems ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC分类号： G01B11/02

CPC分类号： G03F7/70775 ,  G01B9/02018 ,  G01B9/02019 ,  G01B9/02021 ,  G01B9/02027 ,  G01B2290/70

摘要： An improved lithographic interferometer system, is presented herein. The lithographic interferometer system comprises a beam generating mechanism, mirrors which reflect those beams, and detection devices for detecting an interference pattern of overlapping reflected beams. The beam generating mechanism comprises a beam-splitter, which splits the beams into reference beams and measuring beams, a reference mirror that provides a plane mirror interferometer, and a reflective surface that emits at least one reference beam used in a differential plane mirror interferometer.

摘要翻译： 本文提出了一种改进的光刻干涉仪系统。 光刻干涉仪系统包括光束产生机构，反射这些光束的反射镜和用于检测重叠反射光束的干涉图案的检测装置。 光束产生机构包括分束器，其将光束分成参考光束和测量光束，提供平面镜干涉仪的参考镜和发射在差分平面镜干涉仪中使用的至少一个参考光束的反射表面。