-
公开(公告)号:US20050145173A1
公开(公告)日:2005-07-07
申请号:US11058620
申请日:2005-02-15
申请人: William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trulli , Shouqian Shao
发明人: William Holber , Xing Chen , Andrew Cowe , Matthew Besen , Ronald Collins , Susan Trulli , Shouqian Shao
CPC分类号: H01J37/32357 , H01J37/32009 , H01J37/32091 , H01J37/321 , H01J37/32449 , H01J37/32467 , H01J37/32522
摘要: Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.
-
公开(公告)号:US20070272299A1
公开(公告)日:2007-11-29
申请号:US11640434
申请日:2006-12-15
申请人: Jack Schuss , William Holber , John Summerson , Susan Trulli , Weiguo Zhang , Xing Chen
发明人: Jack Schuss , William Holber , John Summerson , Susan Trulli , Weiguo Zhang , Xing Chen
CPC分类号: B01D53/68 , B01D53/32 , B01D53/70 , B01D2257/204 , B01D2257/206 , B01D2259/818 , Y10T137/0391
摘要: A method and apparatus for activating and dissociating gases involves generating an activated gas with a plasma located in a chamber. A downstream gas input is positioned relative to an output of the chamber to enable the activated gas to facilitate dissociation of a downstream gas introduced by the gas input, wherein the dissociated downstream gas does not substantially interact with an interior surface of the chamber.
摘要翻译: 用于激活和解离气体的方法和装置包括用位于室中的等离子体产生活化气体。 下游气体输入端相对于腔室的输出定位,以使得活化气体能够促进由气体输入引入的下游气体的解离,其中解离的下游气体基本上不与腔室的内表面相互作用。
-