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    Methods and systems for processing a microelectronic topography
    2.
    发明授权
    Methods and systems for processing a microelectronic topography 有权
    用于处理微电子拓扑的方法和系统

    公开(公告)号：US08003159B2

    公开(公告)日：2011-08-23

    申请号：US11108589

    申请日：2005-04-18

    申请人： Igor C. Ivanov ,  Weiguo Zhang

    发明人： Igor C. Ivanov ,  Weiguo Zhang

    IPC分类号： B05D3/04

    CPC分类号： H01L21/68728 ,  H01L21/67051 ,  H01L21/6708 ,  Y02P80/30

    摘要： Methods and systems are provided which are adapted to process a microelectronic topography, particularly in association with an electroless deposition process. In general, the methods may include loading the topography into a chamber, closing the chamber to form an enclosed area, and supplying fluids to the enclosed area. In some embodiments, the fluids may fill the enclosed area. In addition or alternatively, a second enclosed area may be formed about the topography. As such, the provided system may be adapted to form different enclosed areas about a substrate holder. In some cases, the method may include agitating a solution to minimize the accumulation of bubbles upon a wafer during an electroless deposition process. As such, the system provided herein may include a means for agitating a solution in some embodiments. Such a means for agitation may be distinct from the inlet/s used to supply the solution to the chamber.

    摘要翻译： 提供了适于处理微电子拓扑的方法和系统，特别是与无电沉积工艺相关联。 通常，方法可以包括将形貌加载到腔室中，关闭腔室以形成封闭区域，并将流体供应到封闭区域。 在一些实施例中，流体可以填充封闭区域。 另外或替代地，围绕地形可以形成第二封闭区域。 因此，所提供的系统可以适于在基板保持器周围形成不同的封闭区域。 在一些情况下，该方法可以包括搅拌溶液以在无电沉积工艺期间使气泡在晶片上的累积最小化。 因此，本文提供的系统可以包括在一些实施例中用于搅拌溶液的装置。 用于搅拌的这种手段可能不同于用于将溶液供应到室的入口。

    Method and system for measuring and compensating for eddy currents induced during NMR imaging operations
    4.
    发明授权
    Method and system for measuring and compensating for eddy currents induced during NMR imaging operations 有权
    用于测量和补偿在NMR成像操作期间引起的涡流的方法和系统

    公开(公告)号：US06448773B1

    公开(公告)日：2002-09-10

    申请号：US09512323

    申请日：2000-02-24

    申请人： Weiguo Zhang

    发明人： Weiguo Zhang

    IPC分类号： G01V300

    CPC分类号： G01R33/56518

    摘要： A method and apparatus is disclosed for measuring and compensating the effects of eddy currents induced during NMR imaging operations. A cubic or cylindrical sample is placed in the imaging volume of a MRI system at a position centrally located with respect to the main magnetic field and oriented with its longitudinal axis parallel to a desired measuring direction. A magnetic field gradient pulse is applied for inducing eddy currents as well as for generating a slice-selective spin-echo signal. The spin-echo signal is acquired immediately after the termination of each eddy-current inducing gradient pulse. Two slices are selected along the desired measurement direction at symmetrical equal distance from the center of the main magnetic field. Two spin-echo signals are acquired for each slice with the polarity of the eddy-current inducing gradient pulse reversed between the two echo signals. Quantitative values for eddy-current induced field gradients and B0 oscillations are determined based on the precessing frequencies of the acquired NMR signals. NMR imaging is improved by compensating for eddy currents effects by applying the quantified values of the field gradients and B0 oscillations to set an appropriate pre-emphasis network. Gradient pulses in MRI/MRS pulse sequences may also be selectively pre-distorted or modified to compensate for resulting gradient-switching induced eddy currents. Other aspects of the disclosed method include measuring the time course of gradient switching, altering the pulse sequences to measure eddy currents having long time constants, repeatedly measuring the eddy currents to assist in pre-emphasis adjustments, and measuring EC-induced field gradients and B0 oscillation in the presence of moderately large background field inhomogeneities.

    摘要翻译： 公开了用于测量和补偿在NMR成像操作期间感应的涡流的影响的方法和装置。 将立方体或圆柱形样品放置在相对于主磁场中心定位的位置处的MRI系统的成像体积中，并且其纵向轴线平行于期望的测量方向。 施加磁场梯度脉冲以诱导涡流以及用于产生切片选择性自旋回波信号。 在每个涡电流感生梯度脉冲终止之后立即获取自旋回波信号。 沿着与主磁场中心对称等距的所需测量方向选择两个切片。 对于每个切片获取两个自旋回波信号，其中涡电流感应梯度脉冲的极性在两个回波信号之间相反。 基于获取的NMR信号的进动频率来确定涡流感应场梯度和B0振荡的定量值。 通过应用场梯度和B0振荡的量化值来补偿涡流效应来改善NMR成像，以设置适当的预加重网络。 MRI / MRS脉冲序列中的梯度脉冲也可以被选择性地预失真或修改以补偿所得到的梯度切换感应涡流。 所公开方法的其他方面包括测量梯度切换的时间过程，改变脉冲序列以测量具有长时间常数的涡流，重复测量涡流以辅助预加重调整，以及测量EC诱导的场梯度和B0 存在中等大背景场不均匀性的情况下的振荡。

    Methods and System for Processing a Microelectronic Topography
    6.
    发明申请
    Methods and System for Processing a Microelectronic Topography 审中-公开
    微电子地形处理方法与系统

    公开(公告)号：US20110271905A1

    公开(公告)日：2011-11-10

    申请号：US13185638

    申请日：2011-07-19

    申请人： Igor C. Ivanov ,  Weiguo Zhang

    发明人： Igor C. Ivanov ,  Weiguo Zhang

    IPC分类号： B05C11/00

    CPC分类号： H01L21/68728 ,  H01L21/67051 ,  H01L21/6708 ,  Y02P80/30

    摘要： Methods and systems are provided which are adapted to process a microelectronic topography, particularly in association with an electroless deposition process. In general, the methods may include loading the topography into a chamber, closing the chamber to form an enclosed area, and supplying fluids to the enclosed area. In some embodiments, the fluids may fill the enclosed area. In addition or alternatively, a second enclosed area may be formed about the topography. As such, the provided system may be adapted to form different enclosed areas about a substrate holder. In some cases, the method may include agitating a solution to minimize the accumulation of bubbles upon a wafer during an electroless deposition process. As such, the system provided herein may include a means for agitating a solution in some embodiments. Such a means for agitation may be distinct from the inlet/s used to supply the solution to the chamber.

    摘要翻译： 提供了适于处理微电子拓扑的方法和系统，特别是与无电沉积工艺相关联。 通常，方法可以包括将形貌加载到腔室中，关闭腔室以形成封闭区域，并将流体供应到封闭区域。 在一些实施例中，流体可以填充封闭区域。 另外或替代地，围绕地形可以形成第二封闭区域。 因此，所提供的系统可以适于在基板保持器周围形成不同的封闭区域。 在一些情况下，该方法可以包括搅拌溶液以在无电沉积工艺期间使气泡在晶片上的累积最小化。 因此，本文提供的系统可以包括在一些实施例中用于搅拌溶液的装置。 用于搅拌的这种手段可能不同于用于将溶液供应到室的入口。

    Methods and systems for processing a microelectronic topography
    8.
    发明授权
    Methods and systems for processing a microelectronic topography 有权
    用于处理微电子拓扑的方法和系统

    公开(公告)号：US07393414B2

    公开(公告)日：2008-07-01

    申请号：US11102143

    申请日：2005-04-08

    申请人： Igor C. Ivanov ,  Weiguo Zhang

    发明人： Igor C. Ivanov ,  Weiguo Zhang

    IPC分类号： B05B1/28 ,  B05B15/12 ,  B05C11/02 ,  C25C14/00

    CPC分类号： H01L21/68728 ,  H01L21/67051 ,  H01L21/6708 ,  Y02P80/30

    摘要： Methods and systems are provided which are adapted to process a microelectronic topography, particularly in association with an electroless deposition process. In general, the methods may include loading the topography into a chamber, closing the chamber to form an enclosed area, and supplying fluids to the enclosed area. In some embodiments, the fluids may fill the enclosed area. In addition or alternatively, a second enclosed area may be formed about the topography. As such, the provided system may be adapted to form different enclosed areas about a substrate holder. In some cases, the method may include agitating a solution to minimize the accumulation of bubbles upon a wafer during an electroless deposition process. As such, the system provided herein may include a means for agitating a solution in some embodiments. Such a means for agitation may be distinct from the inlet/s used to supply the solution to the chamber.

    摘要翻译： 提供了适于处理微电子拓扑的方法和系统，特别是与无电沉积工艺相关联。 通常，方法可以包括将形貌加载到腔室中，关闭腔室以形成封闭区域，并将流体供应到封闭区域。 在一些实施例中，流体可以填充封闭区域。 另外或替代地，围绕地形可以形成第二封闭区域。 因此，所提供的系统可以适于在基板保持器周围形成不同的封闭区域。 在一些情况下，该方法可以包括搅拌溶液以在无电沉积工艺期间使气泡在晶片上的累积最小化。 因此，本文提供的系统可以包括在一些实施例中用于搅拌溶液的装置。 用于搅拌的这种手段可能不同于用于将溶液供应到室的入口。

    Automated analysis tasks of complex computer system
    9.
    发明申请
    Automated analysis tasks of complex computer system 有权
    复杂计算机系统的自动分析任务

    公开(公告)号：US20070159643A1

    公开(公告)日：2007-07-12

    申请号：US11327042

    申请日：2006-01-06

    申请人： John Bennetto ,  Jon Avner ,  Kevin Chase ,  Nicole Allen ,  Paul Bowden ,  Weiguo Zhang

    发明人： John Bennetto ,  Jon Avner ,  Kevin Chase ,  Nicole Allen ,  Paul Bowden ,  Weiguo Zhang

    IPC分类号： G06F15/00

    CPC分类号： G06F11/3476

    摘要： Automated multiple step tasks are executed on a computing device to analyze a computer system. A step engine performs a complex task such as troubleshooting, performance analysis, or disaster recovery as defined by an input file. The step engine parses the input file into individual steps and dispatches actions of the steps to another device for execution. The device returns a file with the results of the action. The step engine progresses through the list of steps and generates a log file representative of the actions taken and data collected during performance of the task.

    摘要翻译： 在计算设备上执行自动多步骤任务以分析计算机系统。 步骤引擎执行复杂任务，例如由输入文件定义的故障排除，性能分析或灾难恢复。 步骤引擎将输入文件解析成单独的步骤，并将步骤的操作分派到另一个设备执行。 设备将返回一个带有该操作结果的文件。 步骤引擎通过步骤列表进行演示，并生成代表在执行任务期间采集的操作和数据的日志文件。

    Microelectronic fabrication system components and method for processing a wafer using such components
    10.
    发明申请
    Microelectronic fabrication system components and method for processing a wafer using such components 有权
    微电子制造系统部件和使用这些部件处理晶片的方法

    公开(公告)号：US20050160974A1

    公开(公告)日：2005-07-28

    申请号：US11034363

    申请日：2005-01-10

    申请人： Igor Ivanov ,  Weiguo Zhang

    发明人： Igor Ivanov ,  Weiguo Zhang

    IPC分类号： C23C18/16 ,  H01L21/00 ,  H01L21/288 ,  H01L21/768 ,  C23C14/00

    CPC分类号： H01L21/76843 ,  C23C18/1619 ,  H01L21/288 ,  H01L21/6715 ,  H01L21/76802 ,  H01L21/76831 ,  H01L21/76834 ,  H01L21/76849 ,  H01L21/76855 ,  H01L21/76856 ,  H01L21/76862 ,  H01L21/76864 ,  H01L21/76874

    摘要： A process chamber is provided which includes a gate configured to align barriers with an opening of the gate and an opening of the process chamber such that the two openings are either sealed or provide an air passage to the chamber. A method is provided and includes sealing an opening of a chamber with a gate latch and exposing a topography to a first set of process steps, opening the gate latch such that an air passage is provided to the process chamber, and exposing the topography to a second set of process steps without allowing liquids within the chamber to flow through the air passage. A substrate holder comprising a clamping jaw with a lever and a support member coupled to the lever is also contemplated herein. A process chamber with a reservoir arranged above a substrate holder is also provided herein.

    摘要翻译： 提供了一种处理室，其包括门，所述门被配置为使障碍物与门的开口和处理室的开口对齐，使得两个开口被密封或提供​​到腔室的空气通道。 提供了一种方法，包括用门闩将密封一个开口的腔室，并将地形暴露于第一组工艺步骤，打开门闩，使得空气通道被提供到处理室，并将该地形暴露于 第二组处理步骤，而不允许室内的液体流过空气通道。 包括具有杠杆的夹爪和联接到杠杆的支撑构件的衬底保持器也在本文中考虑。 本文还提供了一种具有布置在衬底保持器上方的储存器的处理室。