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    Illumination system for a microlithography projection exposure installation
    2.
    发明授权
    Illumination system for a microlithography projection exposure installation 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US07714983B2

    公开(公告)日：2010-05-11

    申请号：US10571475

    申请日：2004-09-13

    申请人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    发明人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    IPC分类号： G03B27/54 ,  G03B27/72 ,  G03B27/42

    CPC分类号： G03F7/70116 ,  G03F7/702

    摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

    摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

    Illumination system particularly for microlithography
    6.
    发明授权
    Illumination system particularly for microlithography 失效
    照明系统特别适用于微光刻

    公开(公告)号：US06947124B2

    公开(公告)日：2005-09-20

    申请号：US10381625

    申请日：2001-09-28

    申请人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

    发明人： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

    IPC分类号： G03F7/20 ,  G21K1/06 ,  G03B27/54 ,  G03B27/42 ,  G21K5/00

    CPC分类号： B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06

    摘要： There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The plurality of first raster elements are rectangular. The field is a segment of an annulus, and the second optical component includes a first field mirror with negative optical power for shaping the field to the segment of the annulus and a second field mirror with positive optical power. Each of a plurality of rays intersects the first field mirror with an incidence angle greater than 70° and each of the plurality of rays intersects the second field mirror with an incidence angle of less than 25°.

    摘要翻译： 提供了一种用于微波光刻的照明系统，其波长<= 193nm。 照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，产生至少部分地叠加在图像平面中的场上的多个图像。 多个第一光栅元件是矩形的。 该场是环的一段，并且第二光学部件包括具有负光学功率的第一场反射镜，用于将场成形为环形部分，以及具有正光焦度的第二场反射镜。 多个光线中的每一个与第一场反射镜相交，入射角大于70°，并且多个光线中的每一个与第二场反射镜相交，入射角小于25°。

    ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION
    8.
    发明申请
    ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION 审中-公开
    用于微观投影曝光安装的照明系统

    公开(公告)号：US20100195077A1

    公开(公告)日：2010-08-05

    申请号：US12758554

    申请日：2010-04-12

    申请人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    发明人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70116 ,  G03F7/702

    摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

    摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。