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公开(公告)号:US09947830B2
公开(公告)日:2018-04-17
申请号:US15422216
申请日:2017-02-01
Inventor: Sheng-hsien Hsu , Gong Chen , Su-hui Lin , Yu-chieh Huang , Chen-ke Hsu
CPC classification number: H01L33/22 , H01L21/0242 , H01L21/0243 , H01L21/02458 , H01L21/0254 , H01L33/007 , H01L33/06 , H01L33/16 , H01L33/32 , H01L2933/0058
Abstract: A patterned sapphire substrate has a first surface and a second surface opposite to each other; the connection zone between first protrusion portions has no C surface (i.e. (0001) surface); and the patterned sapphire substrate may have no C surface on the growth surface to reduce the threading dislocation density of the GaN epitaxial material on the sapphire substrate.