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    Apparatus for enhancing the lifetime of stencil masks
    3.
    发明授权
    Apparatus for enhancing the lifetime of stencil masks 有权
    用于增加模板掩模寿命的装置

    公开(公告)号：US06858118B2

    公开(公告)日：2005-02-22

    申请号：US10395572

    申请日：2003-03-24

    申请人： Elmar Platzgummer ,  Hans Löschner ,  Gerhard Stengl

    发明人： Elmar Platzgummer ,  Hans Löschner ,  Gerhard Stengl

    IPC分类号： C23C14/04 ,  C23C14/32 ,  C23C14/34 ,  C23C14/46 ,  C23C14/54 ,  G03F1/00 ,  H01J37/317 ,  H01L21/027

    CPC分类号： C23C14/547 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/82 ,  H01J37/3174 ,  H01J2237/31755 ,  H01J2237/31788 ,  H01J2237/31794

    摘要： An apparatus for masked ion-beam lithography comprises a mask maintenance module for prolongation of the lifetime of the stencil mask. The module comprises a deposition means for depositing material to the side of the mask irradiated by the lithography beam, with at least one deposition source being positioned in front of the mask, and further comprises a sputter means in which at least one sputter source, positioned in front of the mask holder means and outside the path of the lithography beam, produces a sputter ion beam directed to the mask in order to sputter off material from said mask in a scanning procedure and compensate for inhomogeneity of deposition.

    摘要翻译： 用于掩模离子束光刻的装置包括用于延长模板掩模寿命的掩模维护模块。 该模块包括用于将材料沉积到由光刻光束照射的掩模侧面的沉积装置，其中至少一个沉积源位于掩模的前面，并且还包括溅射装置，其中定位至少一个溅射源 在掩模保持器装置的前面并且在光刻光束的路径之外，产生指向掩模的溅射离子束，以便在扫描过程中从所述掩模溅射材料并补偿沉积的不均匀性。

    Particle-optical system
    4.
    发明授权
    Particle-optical system 有权
    粒子光学系统

    公开(公告)号：US08368015B2

    公开(公告)日：2013-02-05

    申请号：US11990067

    申请日：2006-08-08

    申请人： Elmar Platzgummer ,  Gerhard Stengl ,  Helmut Falkner

    发明人： Elmar Platzgummer ,  Gerhard Stengl ,  Helmut Falkner

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

    摘要： The present invention relates to a multi-beamlet multi-column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non-circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.

    摘要翻译： 多子束多列粒子光学系统技术领域本发明涉及一种多子束多列粒子光学系统，该多子束多列粒子光学系统包括多个列，其被布置成阵列以同时暴露衬底，每个列具有光轴，并且包括：子束产生装置，其包括至少一个 用于产生多个带电粒子束的图案的多孔板，以及包括至少一个电极元件的静电透镜装置; 所述至少一个电极元件具有由面向光轴的内周边缘限定的孔，所述孔在与所述光轴正交的平面中具有中心和预定形状; 其中在所述多个列中的至少一个列中，所述孔的预定形状是非圆形形状，其具有围绕所述孔的中心的来自理想圆的突起和凹陷中的至少一个。

    Particle-optical projection system
    5.
    发明申请
    Particle-optical projection system 审中-公开
    粒子投影系统

    公开(公告)号：US20050201246A1

    公开(公告)日：2005-09-15

    申请号：US11080578

    申请日：2005-03-15

    申请人： Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

    发明人： Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

    IPC分类号： H01L21/027 ,  G03F7/20 ,  G11B7/09 ,  H01J37/02 ,  H01J37/147 ,  H01J37/15 ,  H01J37/20 ,  H01J37/21 ,  H01J37/304 ,  H01J37/317

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J2237/024 ,  H01J2237/10 ,  H01J2237/216 ,  H01J2237/30455

    摘要： In a particle-optical projection system (32) a pattern (B) is imaged onto a target (tp) by means of energetic electrically charged particles. The pattern is represented in a patterned beam (pb) of said charged particles emerging from the object plane through at least one cross-over (c); it is imaged into an image (S) with a given size and distortion. To compensate for the Z-deviation of the image (S) position from the actual positioning of the target (tp) (Z denotes an axial coordinate substantially parallel to the optical axis cx), without changing the size of the image (S), the system comprises a position detection means (ZD) for measuring the Z-position of several locations of the target (tp), a control means (33) for calculating modifications (cr) of selected lens parameters of the final particle-optical lens (L2) and controlling said lens parameters according to said modifications.

    摘要翻译： 在粒子光学投影系统（32）中，通过能量带电粒子将图案（B）成像到目标（tp）上。 所述图案通过至少一个交叉（c）从所述物体平面出射的所述带电粒子的图案化束（pb）中表示; 它被成像为具有给定大小和失真的图像（S）。 为了补偿图像（S）位置与目标的实际定位（tp）（Z表示基本上平行于光轴cx的轴向坐标）的Z偏差，而不改变图像（S）的尺寸， 该系统包括用于测量目标（tp）的若干位置的Z位置的位置检测装置（ZD），用于计算最终粒子光学透镜的选定透镜参数的修改（cr）的控制装置（33） L 2），并根据所述修改来控制所述透镜参数。

    Multi-beam deflector array device for maskless particle-beam processing
    6.
    发明授权
    Multi-beam deflector array device for maskless particle-beam processing 有权
    用于无掩模粒子束处理的多光束偏转器阵列器件

    公开(公告)号：US07687783B2

    公开(公告)日：2010-03-30

    申请号：US12038326

    申请日：2008-02-27

    申请人： Elmar Platzgummer ,  Hans Löschner ,  Samuel Kvasnica ,  Reinhard Springer ,  Mathias Irmscher ,  Florian Letzkus ,  Jörg Butschke

    发明人： Elmar Platzgummer ,  Hans Löschner ,  Samuel Kvasnica ,  Reinhard Springer ,  Mathias Irmscher ,  Florian Letzkus ,  Jörg Butschke

    IPC分类号： H01J3/14

    CPC分类号： G03F1/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

    摘要： The invention relates to a multi-beam deflector array device for use in a particle-beam exposure apparatus employing a beam of charged particles, the multi-beam deflector array device having a plate-like shape with a membrane region, the membrane region including a first side facing towards the incoming beam of particles, an array of apertures, each aperture allowing passage of a corresponding beamlet formed out of the beam of particles, a plurality of depressions, each depression being associated with at least one aperture, and an array of electrodes, each aperture being associated with at least one electrode and each electrode being located in a depression, the electrodes being configured to realize a non-deflecting state, wherein the particles that pass through the apertures are allowed to travel along a desired path, and a deflecting state, wherein the particles are deflected off the desired path.

    摘要翻译： 本发明涉及一种用于使用带电粒子束的粒子束曝光装置中的多光束偏转器阵列装置，该多光束偏转器阵列装置具有带有膜区域的板状形状，该膜区域包括一个 第一面朝向输入的粒子束，一组孔，每个孔允许通过由粒子束形成的对应子束，多个凹陷，每个凹陷与至少一个孔相关联，以及阵列的 电极，每个孔与至少一个电极相关联，并且每个电极位于凹陷中，电极被配置为实现非偏转状态，其中允许通过孔的颗粒沿着期望的路径行进，并且 偏转状态，其中颗粒偏离所需的路径。

    Charged particle beam exposure system and beam manipulating arrangement
    7.
    发明申请
    Charged particle beam exposure system and beam manipulating arrangement 有权
    带电粒子束曝光系统和光束操纵装置

    公开(公告)号：US20090140160A1

    公开(公告)日：2009-06-04

    申请号：US11988922

    申请日：2006-07-20

    申请人： Elmar Platzgummer ,  Gerhard Stengl

    发明人： Elmar Platzgummer ,  Gerhard Stengl

    IPC分类号： H01J3/14

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/0435

    摘要： A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.

    摘要翻译： 用于使用带电粒子的多光束施加的光束操纵装置包括具有由带电粒子束穿过的多个孔的多孔板。 加热多孔板的框架部分以降低多孔板内的温度梯度。 此外，考虑到降低温度梯度，与其他区域相比，多孔板的表面的发热率在一些区域可能更高。

    Particle-optical projection system
    8.
    发明授权
    Particle-optical projection system 有权
    粒子投影系统

    公开(公告)号：US07388217B2

    公开(公告)日：2008-06-17

    申请号：US11700468

    申请日：2007-01-31

    申请人： Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

    发明人： Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

    IPC分类号： H01J37/302 ,  H01L21/027

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J2237/024 ,  H01J2237/10 ,  H01J2237/216 ,  H01J2237/30455

    摘要： In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.

    摘要翻译： 在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。 所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。 为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。

    Ion irradiation of a target at very high and very low kinetic ion energies
    9.
    发明授权
    Ion irradiation of a target at very high and very low kinetic ion energies 有权
    在非常高和非常低的动力学离子能量下对靶进行离子照射

    公开(公告)号：US06909103B2

    公开(公告)日：2005-06-21

    申请号：US10886463

    申请日：2004-07-07

    申请人： Elmar Platzgummer ,  Gerhard Stengl ,  Hans Loeschner

    发明人： Elmar Platzgummer ,  Gerhard Stengl ,  Hans Loeschner

    IPC分类号： G03F7/20 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  H01J37/145

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/0473 ,  H01J2237/04735

    摘要： A particle-beam exposure apparatus (1) for irradiating a target (41) by means of a beam (2) of energetic electrically charged particles comprises: an illumination system (101) for generating and forming said particles into a directed beam (21); a pattern definition means (102) located after the illumination system for positioning a pattern of apertures transparent to the particles in the path of the directed beam, thus forming a patterned beam (22) emerging from the pattern definition means through the apertures; and a projection system (103) positioned after the pattern definition means (102) for projecting the patterned beam (22) onto a target (41) positioned after the projection system. The apparatus further comprises an acceleration/deceleration means (32) containing an electric potential gradient which is oriented substantially parallel to the path of the structured beam and constant over at least a cross-section of the beam.

    摘要翻译： 一种用于通过能量带电粒子的光束（2）照射目标物体的粒子束曝光装置（1）包括：用于将所述粒子产生并形成为定向光束（21）的照明系统（101） ; 位于照明系统之后的图案定义装置（102），用于定位在定向光束的路径中对颗粒透明的孔的图案，从而形成从图案定义装置通过孔排出的图案化的束（22）; 以及位于图案定义装置（102）之后的投影系统（103），用于将图案化的光束（22）投影到位于投影系统之后的目标（41）上。 该装置还包括加速/减速装置（32），该加速/减速装置（32）包含电位梯度，该电位梯度基本上平行于结构化波束的路径定向并且在至少横截面上恒定。

    Ion irradiation of a target at very high and very low kinetic ion energies
    10.
    发明申请
    Ion irradiation of a target at very high and very low kinetic ion energies 有权
    在非常高和非常低的动力学离子能量下对靶进行离子照射

    公开(公告)号：US20050012052A1

    公开(公告)日：2005-01-20

    申请号：US10886463

    申请日：2004-07-07

    申请人： Elmar Platzgummer ,  Gerhard Stengl ,  Hans Loeschner

    发明人： Elmar Platzgummer ,  Gerhard Stengl ,  Hans Loeschner

    IPC分类号： G03F7/20 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/0473 ,  H01J2237/04735

    摘要： A particle-beam exposure apparatus (1) for irradiating a target (41) by means of a beam (2) of energetic electrically charged particles comprises: an illumination system (101) for generating and forming said particles into a directed beam (21); a pattern definition means (102) located after the illumination system for positioning a pattern of apertures transparent to the particles in the path of the directed beam, thus forming a patterned beam (22) emerging from the pattern definition means through the apertures; and a projection system (103) positioned after the pattern definition means (102) for projecting the patterned beam (22) onto a target (41) positioned after the projection system. The apparatus further comprises an acceleration/ deceleration means (32) containing an electric potential gradient which is oriented substantially parallel to the path of the structured beam and constant over at least a cross-section of the beam.

    摘要翻译： 一种用于通过能量带电粒子的光束（2）照射目标物体的粒子束曝光装置（1）包括：用于将所述粒子产生并形成为定向光束（21）的照明系统（101） ; 位于照明系统之后的图案定义装置（102），用于定位在定向光束的路径中对颗粒透明的孔的图案，从而形成从图案定义装置通过孔排出的图案化的束（22）; 以及位于图案定义装置（102）之后的投影系统（103），用于将图案化的光束（22）投影到位于投影系统之后的目标（41）上。 该装置还包括加速/减速装置（32），该加速/减速装置（32）包含电位梯度，该电位梯度基本上平行于结构化波束的路径定向并且在至少横截面上恒定。