公开(公告)号：US20050041226A1

公开(公告)日：2005-02-24

申请号：US10091325

申请日：2002-03-06

申请人： Yasuaki Tanaka ,  Michio Noboru

发明人： Yasuaki Tanaka ,  Michio Noboru

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70558 ,  G03F7/70241 ,  G03F7/70358 ,  H01L21/027

摘要： A method for exposure control comprising the steps of measuring the change of the transmissivity or transmittance for the light incident to the projection optical system prior to the exposure operation effected by illuminating a pattern on a reticle to form an image of the pattern on a photosensitive wafer through the projection optical system, storing the measured change of the transmissivity, sequentially measuring the amount of the light incident to the projection optical system during the exposure operation, calculating the exposure light amount for the photosensitive wafer from the exposure light amount based on the stored change of the transmissivity, and integrating the exposure from the start of the exposure operation to terminate the exposure operation when the total exposure light amount has reached a predetermined value. The total exposure light amount for the wafer surface can be controlled even if the transmissivity of the projection optical system fluctuates.

摘要翻译： 一种用于曝光控制的方法，包括以下步骤：测量在曝光操作之前入射到投影光学系统的光的透射率或透射率的变化，通过照射掩模版上的图案，以在感光晶片上形成图案的图像 通过投影光学系统，存储所测量的透射率的变化，顺序地测量在曝光操作期间入射到投影光学系统的光量，根据所存储的曝光量计算感光晶片的曝光量 透射率的变化，以及从曝光操作开始的曝光积分，当总曝光量达到预定值时终止曝光操作。 即使投影光学系统的透射率波动，也可以控制晶片表面的总曝光量。

公开(公告)号：US08139199B2

公开(公告)日：2012-03-20

申请号：US12039083

申请日：2008-02-28

申请人： Michio Noboru

发明人： Michio Noboru

IPC分类号： G03B27/42

CPC分类号： G03F7/70191 ,  G03F7/70275 ,  G03F7/7035 ,  G03F7/70466 ,  Y10T29/49

摘要： An exposure method includes a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern formation member, which is arranged near the plate and includes a plurality of light converging portions, with exposure light and exposing a light converging pattern having a predetermined shape onto the plate. At least part of the predetermined pattern exposed onto the plate in the first exposure step and at least part of the light converging pattern formed on the plate in the second exposure step overlap each other.

摘要翻译： 曝光方法包括：第一曝光步骤，用曝光光照射布置在板附近的掩模，并将形成在掩模上的预定图案曝光在板上; 以及第二曝光步骤，其照射设置在所述板附近并且包括多个聚光部分的曝光光并将具有预定形状的聚光图案曝光在所述板上的聚光图案形成部件。 在第一曝光步骤中暴露于板上的预定图案的至少一部分和在第二曝光步骤中形成在该板上的聚光图案的至少一部分彼此重叠。

公开(公告)号：US07884921B2

公开(公告)日：2011-02-08

申请号：US11783557

申请日：2007-04-10

申请人： Michio Noboru ,  Naomasa Shiraishi

发明人： Michio Noboru ,  Naomasa Shiraishi

IPC分类号： G02B27/10 ,  G03B27/42 ,  G03B27/44 ,  G03B27/54 ,  G03B27/52

CPC分类号： G02B27/145 ,  G02B27/108 ,  G02B27/1093 ,  G02B27/126 ,  G02B27/143 ,  G02B27/144 ,  G03F7/70066 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70466

摘要： An illumination optical apparatus, used in a projection exposure apparatus for projecting and exposing a pattern arranged in a first plane to a second plane, for supplying the first surface with illumination light from a light source comprises an optical path combiner arranged in an optical path between the light source and the first surface, for combining a plurality of light beams different from each other from the light source such that the first and second light beams illuminate the first surface closely to each other. The optical path combiner includes a discrete point positioned on or near a third surface optically conjugate with the first surface. The plurality of light beams travel by way of a plurality of regions sectioned by the discrete point, respectively.

摘要翻译： 一种照明光学装置，其用于将布置在第一平面中的图案投影和曝光到第二平面的用于向第一表面提供来自光源的照明光的投影曝光装置，包括：光路组合器， 光源和第一表面，用于将彼此不同的多个光束与光源组合，使得第一和第二光束彼此紧密地照射第一表面。 光路组合器包括位于与第一表面光学共轭的第三表面上或附近的离散点。 多个光束分别通过由离散点分割的多个区域行进。

公开(公告)号：US20080165333A1

公开(公告)日：2008-07-10

申请号：US11987779

申请日：2007-12-04

申请人： Masato Kumazawa ,  Michio Noboru

发明人： Masato Kumazawa ,  Michio Noboru

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70791 ,  G03F7/70275

摘要： When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, the mask pattern is minimized in size. A projection exposure apparatus relatively moves a mask and a substrate and forms a magnified image of a pattern of the mask. The apparatus includes projection optical systems, each having an enlargement magnification and forming an image of a pattern of the mask on the substrate. A first line segment formed by connecting view points of the projection optical systems on the mask and a second line segment formed by connecting conjugate points of the view points on the substrate form corresponding sides of two similar figures of which magnification ratio is the magnification.

摘要翻译： 当在具有多个投影光学系统的物体上形成掩模图案的放大图像时，掩模图案的尺寸最小化。 投影曝光装置相对地移动掩模和基板，并形成掩模图案的放大图像。 该装置包括投影光学系统，每个投影光学系统具有放大倍率并且在衬底上形成掩模图案的图像。 通过将掩模上的投影光学系统的视点连接而形成的第一线段和通过连接基板上的视点的共轭点形成的第二线段形成两个相似的放大倍率为倍率的相似图形的相应边。

公开(公告)号：US20070242363A1

公开(公告)日：2007-10-18

申请号：US11783557

申请日：2007-04-10

申请人： Michio Noboru ,  Naomasa Shiraishi

发明人： Michio Noboru ,  Naomasa Shiraishi

IPC分类号： G02B27/10

CPC分类号： G02B27/145 ,  G02B27/108 ,  G02B27/1093 ,  G02B27/126 ,  G02B27/143 ,  G02B27/144 ,  G03F7/70066 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70466

摘要： An illumination optical apparatus, used in a projection exposure apparatus for projecting and exposing a pattern arranged in a first plane to a second plane, for supplying the first surface with illumination light from a light source comprises an optical path combiner arranged in an optical path between the light source and the first surface, for combining a plurality of light beams different from each other from the light source such that the first and second light beams illuminate the first surface closely to each other. The optical path combiner includes a discrete point positioned on or near a third surface optically conjugate with the first surface. The plurality of light beams travel by way of a plurality of regions sectioned by the discrete point, respectively.

摘要翻译： 一种照明光学装置，其用于将布置在第一平面中的图案投影和曝光到第二平面的用于向第一表面提供来自光源的照明光的投影曝光装置，包括：光路组合器， 光源和第一表面，用于将彼此不同的多个光束与光源组合，使得第一和第二光束彼此紧密地照射第一表面。 光路组合器包括位于与第一表面光学共轭的第三表面上或附近的离散点。 多个光束分别通过由离散点分割的多个区域行进。