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公开(公告)号：US06478834B2
公开(公告)日：2002-11-12
申请号：US09989016
申请日：2001-11-20
IPC分类号： C09K314
CPC分类号： H01L21/3212 , C09G1/02 , C23F3/00
摘要： By using a polishing slurry which comprises, at least, a polishing grain, an oxidizing agent and a higher-mono-primary amine, it is possible to suppress dishing and erosion liable to be produced in chemical mechanical polishing (CMP) for a copper-based metal film when forming a buried interconnection of a copper-based metal on a barrier metal film of a tantalum-based metal.
摘要翻译： 通过使用至少包含抛光颗粒，氧化剂和高级单伯胺的抛光浆料，可以抑制在铜 - 铜合金化学机械抛光（CMP）中容易产生的凹陷和侵蚀， 当在钽基金属的阻挡金属膜上形成铜基金属的掩埋互连时，基板上的金属膜。
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公开(公告)号：US06530968B2
公开(公告)日：2003-03-11
申请号：US09989021
申请日：2001-11-20
IPC分类号： C09G102
CPC分类号： C09K3/1463 , C09G1/02
摘要： This invention provides a chemical mechanical polishing slurry for polishing a metal film formed on an insulating film with a concave on a substrate wherein the slurry contains a thickener without an ionic group with an opposite sign to a charge on a polishing material surface to 0.001 wt % or more and less than 0.05 wt % to the total amount of the slurry and has a slurry viscosity of 1 mPa·s to 5 mPa·s both inclusive. The polishing slurry may be used in CMP to form a reliable damascene electric connection with excellent electric properties at a higher polishing rate, i.e., a higher throughput while preventing dishing or erosion.
摘要翻译： 本发明提供了一种化学机械抛光浆料，用于抛光形成在绝缘膜上的金属膜，该金属膜在基材上具有凹陷，其中浆料含有不具有与研磨材料表面上的电荷相反的离子基团的增稠剂至0.001重量％ 或更多且少于0.05重量％，并且具有1mPa.s至5mPa.s的浆液粘度。 抛光浆料可用于CMP以形成可靠的镶嵌电连接，其具有在较高抛光速率下具有优异电性能，即较高生产量，同时防止凹陷或侵蚀。
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公开(公告)号：US06585786B2
公开(公告)日：2003-07-01
申请号：US09989218
申请日：2001-11-20
IPC分类号： C09G102
CPC分类号： H01L21/3212 , C09G1/02 , C23F3/00
摘要： By using a polishing slurry which contains, at least, a polishing grain, an oxidizing agent and a basic amino acid compound, it is possible to suppress dishing and erosion liable to be produced in chemical mechanical polishing (CMP) for a copper-based metal film when forming a buried interconnection of a copper-based metal on a barrier metal film of a tantalum-based metal.
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公开(公告)号：US06585568B2
公开(公告)日：2003-07-01
申请号：US09990224
申请日：2001-11-21
IPC分类号： B24B100
CPC分类号： H01L21/3212 , C09G1/02 , C23F3/00
摘要： This invention provides a chemical mechanical polishing slurry for polishing a copper-based metal film formed on an insulating film comprising a concave on a substrate, comprising a polishing material, an oxidizing agent and water as well as a benzotriazole compound and a triazole compound. The polishing slurry may be used in CMP to form a reliable damascene electric connection with excellent electric properties at a higher polishing rate, i.e., a higher throughput while preventing dishing.
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公开(公告)号：US07229570B2
公开(公告)日：2007-06-12
申请号：US10616914
申请日：2003-07-11
申请人： Toshiji Taiji , Yasuaki Tsuchiya , Tomoyuki Ito , Kenichi Aoyagi , Shin Sakurai
发明人： Toshiji Taiji , Yasuaki Tsuchiya , Tomoyuki Ito , Kenichi Aoyagi , Shin Sakurai
IPC分类号： C09K13/00 , C09K13/06 , H01L21/302
CPC分类号： C09G1/02
摘要： The present invention relates to a slurry for chemical mechanical polishing, which contains a silica polishing material, an oxidizing agent, a benzotriazole-based compound, a diketone and water.
摘要翻译： 本发明涉及一种用于化学机械抛光的浆料，其包含二氧化硅抛光材料，氧化剂，苯并三唑类化合物，二酮和水。
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公开(公告)号：US07084268B1
公开(公告)日：2006-08-01
申请号：US09979679
申请日：2000-06-05
申请人： Hiroyuki Chiba , Masahiko Tsujii , Astsushi Koiwa , Shin Sakurai , Akio Kayano , Hiroyuki Ishizuka , Hiroyuki Saito , Taiju Nakamura , Ikuo Kushida , Yasuyuki Suzuki , Takako Yoshiba , Kazuhide Ashizawa , Masahiro Sakurai , Eiichi Yamamoto
发明人： Hiroyuki Chiba , Masahiko Tsujii , Astsushi Koiwa , Shin Sakurai , Akio Kayano , Hiroyuki Ishizuka , Hiroyuki Saito , Taiju Nakamura , Ikuo Kushida , Yasuyuki Suzuki , Takako Yoshiba , Kazuhide Ashizawa , Masahiro Sakurai , Eiichi Yamamoto
IPC分类号： C07D477/20 , A61K31/407 , A61P31/04
CPC分类号： C07D477/20 , A61K31/407
摘要： The present invention provides carbapenem hydrochloride trihydrate crystals, which are chemically stable, easily purified and useful as antimicrobial agents, a process for producing them, and a powdery charged preparation for injection containing them. That is, it provides carbapenem hydrochloride trihydrate crystals having a powdery X-ray diffraction pattern containing lattice distances (d) of 9.0, 4.1 and 2.8 Å, a process for producing them, and a powdery charged preparation for injection containing them.
摘要翻译： 本发明提供化学稳定，易于纯化和用作抗微生物剂的盐酸碳青霉烯盐酸盐三水合物晶体，其制备方法和含有它们的注射用粉末状药物制剂。 也就是说，它提供了具有包含晶格距离（d）为9.0,4.1和2.8的粉末X射线衍射图的碳青霉烯盐酸盐三水合物晶体，其制备方法和含有它们的注射用粉末状药物制剂。
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7.发明申请SODIUM SALT OF DISACCHARIDE COMPOUND, METHOD FOR PRODUCING THE SAME, AND USE OF THE SAME 审中-公开不饱和化合物的钠盐，其制备方法及其用途公开(公告)号：US20100152429A1
公开(公告)日：2010-06-17
申请号：US12516082
申请日：2007-11-21
申请人： Shin Sakurai , Ken Furukawa , Kimihiro Matsuo , Kenichi Tagami
发明人： Shin Sakurai , Ken Furukawa , Kimihiro Matsuo , Kenichi Tagami
IPC分类号： C07H13/00
CPC分类号： C07H15/12
摘要： Disclosed are a sodium salt represented by the average formula (I) below, and a method for producing such a sodium salt. (In the formula, m1, n1, m2 and n2 independently represent 0 or a positive number not greater than 2, while satisfying m1+n1=2, m2+n2=2, 0
摘要翻译： 公开了由下述平均式（I）表示的钠盐及其制备方法。 （式中，m1，n1，m2，n2独立地表示0或不大于2的正数，而满足m1 + n1 = 2，m2 + n2 = 2,0
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8.发明申请公开(公告)号：US20080227991A1
公开(公告)日：2008-09-18
申请号：US11984770
申请日：2007-11-21
申请人： Shin Sakurai , Ken Furukawa , Kimihiro Matsuo , Kenichi Tagami
发明人： Shin Sakurai , Ken Furukawa , Kimihiro Matsuo , Kenichi Tagami
IPC分类号： C07F9/06
CPC分类号： C07H15/12
摘要： The present invention relates to a sodium salt represented by average formula (I): (wherein, m1, n1, m2 and n2 respectively and independently represent a positive number of 0 0r 2 or less, provided that m1+n1=2, m2+n2=2, 0
摘要翻译： 本发明涉及由平均式（I）表示的钠盐：（其中m 1，n 1，m 2和n 分别独立地表示0或2以下的正数，条件是m 1 + n 1 = 2，m＆lt; 1＆lt; 2 + 2＆lt; 2＆gt; 2＆lt; 2＆gt; 2＆lt; 1＆lt; 1＆gt; +＆lt; 2＆lt; 4＆gt;＆lt;＆lt; N＆lt; （Ⅳ）代表的钠盐的分解方法：[化学式4]包括：使通式（Ⅳ）表示的钠盐的分解： 由通式（IV）表示的钠盐在由平均式（I）表示的钠盐存在下，根据本发明，通式（IV）表示的钠盐随时间的稳定性提高。
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9.发明授权公开(公告)号：US08207144B2
公开(公告)日：2012-06-26
申请号：US11984770
申请日：2007-11-21
申请人： Shin Sakurai , Ken Furukawa , Kimihiro Matsuo , Kenichi Tagami
发明人： Shin Sakurai , Ken Furukawa , Kimihiro Matsuo , Kenichi Tagami
IPC分类号： A61K31/7016 , C07H11/04
CPC分类号： C07H15/12
摘要： The present invention relates to a composition comprising a plurality of sodium salts represented by the formula (I): wherein, m1, n1, m2 and n2 respectively and independently represent a positive number between 0 and 2, provided that m1+n1=2, m2+n2=2, 0
摘要翻译： 本发明涉及包含多个式（I）表示的钠盐的组合物：其中，m1，n1，m2和n2分别独立地表示0和2之间的正数，条件是m1 + n1 = 2， m2 + n2 = 2,0
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公开(公告)号：US20060040916A1
公开(公告)日：2006-02-23
申请号：US11259509
申请日：2005-10-26
申请人： Hiroyuki Chiba , Masahiko Tsujii , Astsushi Koiwa , Shin Sakurai , Akio Kayano , Hiroyuki Ishizuka , Hiroyuki Saito , Taiju Nakamura , Ikuo Kushida , Yasuyuki Suzuki , Takako Yoshiba , Kazuhide Ashizawa , Masahiro Sakurai , Eiichi Yamamoto
发明人： Hiroyuki Chiba , Masahiko Tsujii , Astsushi Koiwa , Shin Sakurai , Akio Kayano , Hiroyuki Ishizuka , Hiroyuki Saito , Taiju Nakamura , Ikuo Kushida , Yasuyuki Suzuki , Takako Yoshiba , Kazuhide Ashizawa , Masahiro Sakurai , Eiichi Yamamoto
IPC分类号： C07D487/04 , A61K31/407
CPC分类号： C07D477/20 , A61K31/407
摘要： The present invention provides carbapenem hydrochloride trihydrate crystals, which are chemically stable, easily purified and useful as antimicrobial agents, a process for producing them, and a powdery charged preparation for injection containing them. That is, it provides carbapenem hydrochloride trihydrate crystals having a powdery X-ray diffraction pattern containing lattice distances (d) of 9.0, 4.1 and 2.8 Å, a process for producing them, and a powdery charged preparation for injection containing them.
摘要翻译： 本发明提供化学稳定，易于纯化和用作抗微生物剂的盐酸碳青霉烯盐酸盐三水合物晶体，其制备方法和含有它们的注射用粉末状药物制剂。 也就是说，它提供了具有包含晶格距离（d）为9.0,4.1和2.8的粉末X射线衍射图的碳青霉烯盐酸盐三水合物晶体，其制备方法和含有它们的注射用粉末状药物制剂。
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