Semiconductor laser device and method of fabricating the same
    9.
    发明申请
    Semiconductor laser device and method of fabricating the same 失效
    半导体激光器件及其制造方法

    公开(公告)号:US20080198887A1

    公开(公告)日:2008-08-21

    申请号:US11907016

    申请日:2007-10-09

    IPC分类号: H01S5/22 H01L33/00

    摘要: A semiconductor laser device includes a first cavity and a second cavity formed apart from each other over a semiconductor substrate. The first cavity includes a first buffer layer and a first semiconductor layer including a first active layer, and the second cavity includes a second buffer layer and a second semiconductor layer including a second active layer. A window structure is provided in a region near an end face of each of the first semiconductor layer and the second semiconductor layer. A band gap of the first buffer layer is greater than that of the first active layer, and a band gap of the second buffer layer is greater than that of the second active layer.

    摘要翻译: 半导体激光器件包括在半导体衬底上彼此分开形成的第一腔和第二腔。 第一腔包括第一缓冲层和包括第一有源层的第一半导体层,第二腔包括第二缓冲层和包括第二有源层的第二半导体层。 在第一半导体层和第二半导体层的端面附近的区域设置有窗口结构。 第一缓冲层的带隙大于第一缓冲层的带隙,第二缓冲层的带隙大于第二有源层的带隙。

    Semiconductor laser device
    10.
    发明授权
    Semiconductor laser device 失效
    半导体激光器件

    公开(公告)号:US07653104B2

    公开(公告)日:2010-01-26

    申请号:US12246859

    申请日:2008-10-07

    IPC分类号: H01S5/00

    摘要: A red laser portion and an infrared laser portion are integrated on an n-type GaAs substrate. A p-type cladding layer made of p-type AlGaInP in the red laser portion and a p-type cladding layer made of p-type AlGaInP in the infrared laser portion have a ridge stripe portion having a light emitting point. A current block layer made of SiNx is formed on both sides of each ridge stripe portion, and a strain relaxing layer made of ZrO2 is selectively formed on an outer side of each ridge stripe region on the current block layer. Provided that Tc is a thermal expansion coefficient of the p-type cladding layers, Tb is a thermal expansion coefficient of the current block layer, and Ts is a thermal expansion coefficient of the strain relaxing layer, the relation of Tb

    摘要翻译: 红色激光部分和红外激光部分集成在n型GaAs衬底上。 在红外激光部中由p型AlGaInP构成的p型覆层和在红外线激光部中由p型AlGaInP构成的p型覆层具有具有发光点的脊条部。 在每个脊条部分的两侧形成由SiNx形成的电流阻挡层,并且在当前阻挡层上的每个脊条区域的外侧选择性地形成由ZrO 2制成的应变缓和层。 假设Tc是p型覆层的热膨胀系数,Tb是当前阻挡层的热膨胀系数,Ts是应变缓和层的热膨胀系数,Tb