Lateral double diffused MOS device and method for manufacturing the same
    9.
    发明授权
    Lateral double diffused MOS device and method for manufacturing the same 有权
    横向双扩散MOS器件及其制造方法

    公开(公告)号:US08058129B2

    公开(公告)日:2011-11-15

    申请号:US12615096

    申请日:2009-11-09

    申请人: Yong-Jun Lee

    发明人: Yong-Jun Lee

    IPC分类号: H01L21/336

    摘要: A lateral double diffused metal oxide semiconductor (LDMOS) device and a method of manufacturing the same. A LDMOS device may include a high voltage well formed over a substrate, a reduced surface field region formed thereover which may be adjacent a body region, and/or an isolation layer. An isolation layer may include a predetermined area formed over a reduced surface field region, may be partially overlapped with a top surface of a substrate and/or may include an area formed adjacent a high voltage well. A low voltage well may be formed over a substrate. A gate electrode may extend from a predetermined top surface of a body region to a predetermined top surface of an isolation layer. A drain region may be formed over a low voltage well. A source region may be formed over a body region and may have at least a portion formed under a gate electrode.

    摘要翻译: 横向双扩散金属氧化物半导体(LDMOS)器件及其制造方法。 LDMOS器件可以包括在衬底上形成的高电压井,形成在其上的减小的表面场区域,其可以与身体区域相邻,和/或隔离层。 隔离层可以包括在还原表面场区域上形成的预定区域,可以与衬底的顶表面部分地重叠,和/或可以包括邻近高电压阱形成的区域。 可以在衬底上形成低电压阱。 栅电极可以从体区的预定顶表面延伸到隔离层的预定顶表面。 可以在低电压阱上形成漏极区。 源极区域可以形成在体区域上并且可以具有形成在栅电极下方的至少一部分。