Organic light-emitting display device and method of manufacturing the same
    1.
    发明授权
    Organic light-emitting display device and method of manufacturing the same 有权
    有机发光显示装置及其制造方法

    公开(公告)号:US08835205B2

    公开(公告)日:2014-09-16

    申请号:US13022530

    申请日:2011-02-07

    申请人: Yong-Woo Park

    发明人: Yong-Woo Park

    IPC分类号: H01L21/00

    CPC分类号: H01L27/3246

    摘要: An organic light-emitting display device including a pixel-defining layer and a spacer, and a method of manufacturing the same. The method includes: forming an organic insulating material layer on a pixel electrode; placing a half-tone mask including a light-blocking portion, a partial-transmitting portion, and a light-transmitting portion on the organic insulating material layer and performing an exposure process so that the pixel electrode corresponds to the light-transmitting portion, a pixel-defining layer at least partially surrounding the pixel electrode corresponds to the partial-transmitting portion, and a spacer adjacent to the pixel-defining layer corresponds to the light-blocking portion; and etching a portion of the organic insulating material layer that is exposed so that a pixel area on the pixel electrode is at least partially surrounded by the pixel-defining layer and the spacer. A taper angle of the pixel-defining layer is between about 15 degrees to about 30 degrees.

    摘要翻译: 包括像素限定层和间隔物的有机发光显示装置及其制造方法。 该方法包括:在像素电极上形成有机绝缘材料层; 将有遮光部分,部分透光部分和透光部分的半色调掩模放置在有机绝缘材料层上,并进行曝光处理,使得像素电极对应于透光部分, 至少部分地围绕像素电极的像素限定层对应于部分透射部分,并且与像素限定层相邻的间隔物对应于遮光部分; 并且蚀刻暴露的有机绝缘材料层的一部分,使得像素电极上的像素区域至少部分地被像素限定层和间隔物包围。 像素限定层的锥角在约15度至约30度之间。

    Flat panel display and method of fabricating the same
    3.
    发明授权
    Flat panel display and method of fabricating the same 有权
    平板显示器及其制造方法

    公开(公告)号:US07875475B2

    公开(公告)日:2011-01-25

    申请号:US12379817

    申请日:2009-03-02

    摘要: A flat panel display apparatus includes a gate insulating layer having openings which define pixels. The flat panel display apparatus includes: a substrate; a source electrode and a drain electrode formed on the substrate; a semiconductor layer contacting the source electrode and the drain electrode; a gate formed on the substrate; an insulating layer formed between the source and drain electrodes and the gate, and including an opening; and a pixel electrode partially exposed by the opening of the insulating layer. The insulating layer acts as a gate insulating layer and a pixel definition layer defining the pixel electrode.

    摘要翻译: 平板显示装置包括具有限定像素的开口的栅极绝缘层。 平板显示装置包括:基板; 形成在所述基板上的源电极和漏电极; 与源电极和漏极接触的半导体层; 形成在基板上的栅极; 形成在所述源极和漏极之间的绝缘层和所述栅极,并且包括开口; 以及由绝缘层的开口部分地露出的像素电极。 绝缘层用作限定像素电极的栅极绝缘层和像素限定层。

    Flat panel display and method of fabricating the same
    4.
    发明申请
    Flat panel display and method of fabricating the same 有权
    平板显示器及其制造方法

    公开(公告)号:US20070007515A1

    公开(公告)日:2007-01-11

    申请号:US11480549

    申请日:2006-07-05

    IPC分类号: H01L29/08

    摘要: A flat panel display apparatus includes a gate insulating layer having openings which define pixels. The flat panel display apparatus includes: a substrate; a source electrode and a drain electrode formed on the substrate; a semiconductor layer contacting the source electrode and the drain electrode; a gate formed on the substrate; an insulating layer formed between the source and drain electrodes and the gate, and including an opening; and a pixel electrode partially exposed by the opening of the insulating layer. The insulating layer acts as a gate insulating layer and a pixel definition layer defining the pixel electrode.

    摘要翻译: 平板显示装置包括具有限定像素的开口的栅极绝缘层。 平板显示装置包括:基板; 形成在所述基板上的源电极和漏电极; 与源电极和漏极接触的半导体层; 形成在基板上的栅极; 形成在所述源极和漏极之间的绝缘层和所述栅极,并且包括开口; 以及由绝缘层的开口部分地露出的像素电极。 绝缘层用作限定像素电极的栅极绝缘层和像素限定层。

    Apparatus and method for measuring residual stress and photoelastic effect of optical fiber
    5.
    发明授权
    Apparatus and method for measuring residual stress and photoelastic effect of optical fiber 有权
    用于测量光纤的残余应力和光弹效应的装置和方法

    公开(公告)号:US06647162B2

    公开(公告)日:2003-11-11

    申请号:US09803873

    申请日:2001-03-13

    IPC分类号: G01N2100

    CPC分类号: G01L1/242 G01L5/0047

    摘要: Disclosed is an apparatus for measuring a residual stress and a photoelastic effect of an optical fiber, which includes: a light source; a rotary type optical diffuser distanced from the light source in a predetermined distance for suppressing the spatial coherence of a light radiated in the light source; an optical condenser for condensing the radiated light passed through the optical diffuser into a spot where the optical fiber is located; a polarizer for polarizing the light passed through the optical condenser into a 45° linear polarized light from an axis of the optical fiber; a polarization analyzer, installed at 90° angle with respect to the polariscope and attached closely with the optical fiber, to prevent the penetration by the background image of the optical fiber; an optical fiber strain unit including a strain sensor for straining the optical fiber on the polarization analyzer toward a longitudinal direction and measuring the strain on the optical fiber; an object lens for magnifying the image of the light penetrated through the optical fiber; and a charge coupled device (CCD) array for measuring the penetration variation of the optical fiber caused from the strain caused by the optical fiber strain unit over the optical fiber.

    摘要翻译: 公开了一种用于测量光纤的残余应力和光弹性效应的装置,其包括:光源; 旋转型光学扩散器,其以预定距离从光源远离,以抑制在光源中照射的光的空间相干性; 用于将通过光漫射器的辐射光聚光到光纤所在的光点的光学冷凝器; 用于将通过所述光学冷凝器的光偏振成从所述光纤的轴线成45°线偏振光的偏振器; 极化分析仪,相对于偏振器安装在90°角并与光纤紧密连接,以防止光纤的背景图像穿透; 光纤应变单元,包括:应变传感器,用于使所述偏振分析仪上的光纤向纵向拉伸;测量所述光纤上的应变; 用于放大穿过光纤的光的图像的物镜; 以及用于测量由光纤应变单元在光纤上引起的应变引起的光纤的穿透变化的电荷耦合器件(CCD)阵列。

    Image tracking device and method for transverse measurement of optical fiber
    6.
    发明授权
    Image tracking device and method for transverse measurement of optical fiber 失效
    图像跟踪装置及光纤横向测量方法

    公开(公告)号:US06373564B1

    公开(公告)日:2002-04-16

    申请号:US09838022

    申请日:2001-04-19

    IPC分类号: G01N2100

    CPC分类号: G01M11/37

    摘要: The present invention relates generally to an image tracking device in an optical communication system, and in particular, to a device and method for measuring the transverse characteristics, including the refractive index or residual stress of an optical fiber or a fiber preform.

    摘要翻译: 本发明一般涉及光通信系统中的图像跟踪装置,特别涉及用于测量包括光纤或纤维预制棒的折射率或残余应力的横向特性的装置和方法。

    Halftone mask and manufacturing method thereof and method for forming film using the same
    7.
    发明授权
    Halftone mask and manufacturing method thereof and method for forming film using the same 有权
    半色调掩模及其制造方法和使用其形成膜的方法

    公开(公告)号:US08367278B2

    公开(公告)日:2013-02-05

    申请号:US12824086

    申请日:2010-06-25

    IPC分类号: G03F1/32

    CPC分类号: G03F1/50

    摘要: Embodiments relate to halftone masks that can uniformly form the height of an underlying layer in two regions that are spaced apart from each other, a manufacturing method thereof, and a method for forming a film using the same. The halftone mask includes a first light blocking unit and a second light blocking unit, and a semi-transmitting unit that is disposed adjacent to the side of the second light blocking unit. The first and second light blocking units block light and are spaced apart from each other at a predetermined interval. The semi-transmitting unit is positioned at a side far from the first light blocking unit and reduces intensity of light. Sum of the second length of the second light blocking unit and the third length of the semi-transmitting unit is larger than the first length of the first blocking unit.

    摘要翻译: 实施例涉及可以在彼此间隔开的两个区域中均匀地形成下层的高度的半色调掩模,其制造方法和使用其形成膜的方法。 半色调掩模包括第一遮光单元和第二遮光单元,以及邻近第二遮光单元的一侧设置的半透射单元。 第一和第二光阻挡单元阻挡光并以预定间隔彼此间隔开。 半透射单元位于远离第一遮光单元的一侧,并且减小光的强度。 第二遮光单元的第二长度和半透射单元的第三长度之和大于第一遮光单元的第一长度。

    HALFTONE MASK AND MANUFACTURING METHOD THEREOF AND METHOD FOR FORMING FILM USING THE SAME
    8.
    发明申请
    HALFTONE MASK AND MANUFACTURING METHOD THEREOF AND METHOD FOR FORMING FILM USING THE SAME 有权
    黑龙骨掩模及其制造方法及使用其形成膜的方法

    公开(公告)号:US20100330468A1

    公开(公告)日:2010-12-30

    申请号:US12824086

    申请日:2010-06-25

    IPC分类号: G03F7/20 G03F1/00

    CPC分类号: G03F1/50

    摘要: Embodiments relate to halftone masks that can uniformly form the height of an underlying layer in two regions that are spaced apart from each other, a manufacturing method thereof, and a method for forming a film using the same. The halftone mask includes a first light blocking unit and a second light blocking unit, and a semi-transmitting unit that is disposed adjacent to the side of the second light blocking unit. The first and second light blocking units block light and are spaced apart from each other at a predetermined interval. The semi-transmitting unit is positioned at a side far from the first light blocking unit and reduces intensity of light. Sum of the second length of the second light blocking unit and the third length of the semi-transmitting unit is larger than the first length of the first blocking unit.

    摘要翻译: 实施例涉及可以在彼此间隔开的两个区域中均匀地形成下层的高度的半色调掩模,其制造方法和使用其形成膜的方法。 半色调掩模包括第一遮光单元和第二遮光单元,以及邻近第二遮光单元的一侧设置的半透射单元。 第一和第二光阻挡单元阻挡光并以预定间隔彼此间隔开。 半透射单元位于远离第一遮光单元的一侧,并且减小光的强度。 第二遮光单元的第二长度和半透射单元的第三长度之和大于第一遮光单元的第一长度。