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公开(公告)号：US07592063B2
公开(公告)日：2009-09-22
申请号：US11514997
申请日：2006-09-05
申请人： Yoshiaki Ikuta , Shinya Kikugawa
发明人： Yoshiaki Ikuta , Shinya Kikugawa
CPC分类号： C03B19/1453 , C03B2201/03 , C03B2201/12 , C03C3/06 , C03C2201/11 , C03C2201/12 , C03C2201/23 , Y10T428/166 , Y10T428/249969 , Y10T428/252
摘要： For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface. The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.
摘要翻译： 对于在其表面上具有细凹凸图案的基板，石英玻璃基板的垂直方向上的凸凹图案的尺寸被控制为以极高的精度和整个基板表面均匀。 使石英玻璃基板具有至多40℃的假想温度分布和小于400ppm的卤素浓度，并且使石英玻璃基板的表面的蚀刻速率均匀，由此， 在石英玻璃基板的垂直方向上的凸凹图案被控制为具有良好的精度和整个基板表面的均匀。
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公开(公告)号：US08402786B2
公开(公告)日：2013-03-26
申请号：US10283055
申请日：2002-10-30
IPC分类号： C03B25/00
CPC分类号： G03F7/70958 , C03B19/1453 , C03B32/00 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C23/00 , C03C2201/21 , C03C2201/23 , C03C2203/54 , Y02P40/57
摘要： A process for producing a synthetic silica glass optical component which contains at least 1×1017 molecules/cm3 and has an OH concentration of at most 200 ppm and substantially no reduction type defects, by treating a synthetic silica glass having a hydrogen molecule content of less than 1×1017 molecules/cm3 at a temperature of from 300 to 600° C. in a hydrogen gas-containing atmosphere at a pressure of from 2 to 30 atms.
摘要翻译： 一种合成石英玻璃光学部件的制造方法，其通过处理氢分子含量少的合成二氧化硅玻璃，其含有至少1×10 17分子/ cm 3，OH浓度为200ppm以下，基本上无还原型缺陷 在含有氢气的气氛中，在2-30atms的压力下，在300-600℃的温度下，比1×1017分子/ cm 3。
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3.发明授权Optical member made of synthetic quartz glass, and process for its production 失效由合成石英玻璃制成的光学元件及其生产工艺公开(公告)号：US07784307B2
公开(公告)日：2010-08-31
申请号：US11540760
申请日：2006-10-02
申请人： Tomonori Ogawa , Yoshiaki Ikuta , Shinya Kikugawa
发明人： Tomonori Ogawa , Yoshiaki Ikuta , Shinya Kikugawa
CPC分类号： C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/23 , C03C2203/44 , C03C2203/54
摘要： To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm.sup.2-ppb).sup.-1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm.sup.2) by the laser, to be 0.Itoreq.R.Itoreq.0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.
摘要翻译： 为了减少由诸如KrF准分子激光器或ArF准分子激光器的光源发射的高能量光的照射引起的合成石英玻璃的照射部分的折射率的变化。 一种制造由合成石英玻璃制成的光学构件的方法，其中根据所使用的激光束的能量密度设置光学构件的OH基浓度，以调节比率R（KJ / cm 2 -Pbb ）为1，光学部件的折射率与激光的累积照射能量（KJ / cm 2）的变化为0.Itoreq.R.Itore.0.0，由此控制 通过用激光束照射由合成石英玻璃制成的光学构件的折射率的变化在预定范围内。
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4.发明申请Optical member made of synthetic quartz glass, and process for its production 失效由合成石英玻璃制成的光学元件及其生产工艺公开(公告)号：US20070027018A1
公开(公告)日：2007-02-01
申请号：US11540760
申请日：2006-10-02
申请人： Tomonori Ogawa , Yoshiaki Ikuta , Shinya Kikugawa
发明人： Tomonori Ogawa , Yoshiaki Ikuta , Shinya Kikugawa
CPC分类号： C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/23 , C03C2203/44 , C03C2203/54
摘要： To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm2-ppb)−1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm2) by the laser, to be 0≦R≦0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.
摘要翻译： 为了减少由诸如KrF准分子激光器或ArF准分子激光器的光源发射的高能量光的照射引起的合成石英玻璃的照射部分的折射率的变化。 一种制造由合成石英玻璃制成的光学构件的方法，其中根据所用激光束的能量密度设置光学构件的OH基浓度，以调节比例R（KJ / cm 2）/ 光学构件的折射率与激光的累积照射能量（KJ / cm 2）之间的变化的值为0以上的SUP〜-ppb）为0 <= R <= 0.2，从而通过激光束的照射来控制由合成石英玻璃制成的光学构件的折射率的变化，使其在预定范围内。
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公开(公告)号：US07022633B2
公开(公告)日：2006-04-04
申请号：US10317068
申请日：2002-12-12
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C23/002 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2203/44 , C03C2203/54 , Y02P40/57 , Y10S65/16 , Y10S501/90 , Y10S501/905
摘要： A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.
摘要翻译： 一种用于光学用途的合成石英玻璃，其通过在含有氟的紫外区域至真空紫外区域的范围内的光照射而使用，所述氟化物具有2250cm -1的散射峰强度 （I 2250）相对于800cm -1（I 800）的散射峰强度，即I 2250 在激光拉曼光谱中，其最大吸收系数为245nm，最多为2×10 3，最大为1×10 -4， SUP> -3cm -1 -1。
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6.发明授权Synthetic quartz glass for optical member, process for producing the same, and method of using the same 失效用于光学构件的合成石英玻璃及其制造方法及其使用方法公开(公告)号：US06544914B1
公开(公告)日：2003-04-08
申请号：US09701191
申请日：2000-12-28
IPC分类号： C03C306
CPC分类号： C03C23/002 , B08B7/0057 , C03B19/1453 , C03B19/1469 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03C3/06 , C03C2201/23 , C03C2203/50 , Y02P40/57
摘要： A process for producing a synthetic quartz glass for an optical member, which comprises a step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet light having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths of not longer than 165 nm.
摘要翻译： 一种用于制造用于光学构件的合成石英玻璃的方法，其包括用波长为180nm或更短的真空紫外光照射具有50ppm或更低的OH基含量的合成石英玻璃以提高透射率的步骤 波长不超过165nm的区域。
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公开(公告)号：US06499317B1
公开(公告)日：2002-12-31
申请号：US09581263
申请日：2000-10-17
IPC分类号： G01N2300
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C23/002 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2203/44 , C03C2203/54 , Y02P40/57 , Y10S65/16 , Y10S501/90 , Y10S501/905
摘要： A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.
摘要翻译： 一种用于光学用的合成石英玻璃，其用于通过在从含有氟的紫外线区域到真空紫外线区域的光的照射下使用，其具有2250cm -1（I2250）的散射峰强度比， 对于激光拉曼光谱中至多为1×10 -4的800cm -1（I800）的散射峰强度（I800），即I2250 / I800，其吸光系数为245nm，最多为2×10 -3 cm -3， 1。
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公开(公告)号：US06475575B1
公开(公告)日：2002-11-05
申请号：US09831360
申请日：2001-08-06
申请人： Yoshiaki Ikuta , Shinya Kikugawa , Hitoshi Mishiro , Hiroshi Arishima , Kaname Okada , Katsuhiro Matsumoto
发明人： Yoshiaki Ikuta , Shinya Kikugawa , Hitoshi Mishiro , Hiroshi Arishima , Kaname Okada , Katsuhiro Matsumoto
IPC分类号： A47G112
CPC分类号： G03F1/62 , C03B33/082 , C03B2201/04
摘要： It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80%/cm at a wavelength of 157 nm.
摘要翻译： 其特征在于，具有由OH基浓度为100ppm以下且基本上不含缺氧缺陷的合成石英玻璃制成的防护薄片。 特别优选OH基浓度为10ppm以下，内部透射率为157nm以上至少80％/ cm 3。
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公开(公告)号：US06611317B1
公开(公告)日：2003-08-26
申请号：US09701180
申请日：2001-02-16
申请人： Tohru Ogawa , Hideo Hosono , Shinya Kikugawa , Yoshiaki Ikuta , Akio Masui , Noriaki Shimodaira , Shuhei Yoshizawa
发明人： Tohru Ogawa , Hideo Hosono , Shinya Kikugawa , Yoshiaki Ikuta , Akio Masui , Noriaki Shimodaira , Shuhei Yoshizawa
IPC分类号： G03B2772
CPC分类号： G03F7/70058 , G03F7/70241 , G03F7/70958
摘要： An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm−1 or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm−1.
摘要翻译： 一种曝光装置，其中构成曝光光源系统的光学部件，照明光学系统，光掩模和投影光学系统中的至少一个由用于光学部件的合成石英玻璃制成，其吸收系数为0.70 cm-1或更小，以及归因于约3640cm -1处的SiOH伸缩振动的红外吸收峰。
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公开(公告)号：US06576578B1
公开(公告)日：2003-06-10
申请号：US09762679
申请日：2001-03-01
IPC分类号： C03C306
CPC分类号： C03B19/1415 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2207/30 , C03B2207/32 , C03B2207/36 , C03C3/06 , C03C2201/12 , C03C2201/21 , C03C2201/23 , C03C2203/40 , C03C2203/54 , Y02P40/57
摘要： A synthetic quartz glass to be used for light with a wavelength of from 150 to 200 nm, wherein the OH group concentration is at most 100 ppm, the hydrogen molecule concentration is at most 1×1017 molecules/cm3, reduction type defects are at most 1×1015 defects/cm3, and the relation between &Dgr;k163 and &Dgr;k190, as between before and after irradiation of ultraviolet rays, satisfies 0
摘要翻译： 用于波长为150〜200nm的光的合成石英玻璃，OH基浓度为100ppm以下，氢分子浓度为1×10 17分子/ cm 3以下，还原型缺陷为1×1015以下的缺陷 / cm3，紫外线照射前后的DELTAk163与DELTAk190之间的关系满足0
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