Film-Forming Product, Film-Forming Method and Mold Release Agent
    9.
    发明申请
    Film-Forming Product, Film-Forming Method and Mold Release Agent 审中-公开
    成膜产品,成膜方法和脱模剂

    公开(公告)号:US20080206444A1

    公开(公告)日:2008-08-28

    申请号:US11659707

    申请日:2005-08-04

    IPC分类号: C23C26/00 C09D1/00

    摘要: There is provided a film-forming product used for forming a film containing fullerenes as a main component. The film containing fullerenes as a main component may be used as a mold release agent and a lubricant as well as a colorant, a writing utensil, cosmetics and a mending material. The present invention relates to a film-forming product constituted of a molded product containing fullerenes as a main component. In the preferred embodiment of the present invention, the film-forming product has a bar shape, and used for forming a mold releasing film or a lubricating film.

    摘要翻译: 提供了用于形成含有富勒烯作为主要成分的膜的成膜产品。 含有富勒烯作为主要成分的薄膜可以用作脱模剂和润滑剂以及着色剂,书写用具,化妆品和修补材料。 本发明涉及由含有富勒烯作为主要成分的成型品构成的成膜产品。 在本发明的优选实施方案中,成膜产品具有棒状,并用于形成脱模膜或润滑膜。

    Radiation sensitive composition
    10.
    发明授权
    Radiation sensitive composition 失效
    辐射敏感组合物

    公开(公告)号:US6090518A

    公开(公告)日:2000-07-18

    申请号:US72970

    申请日:1998-05-06

    IPC分类号: G03F7/004

    CPC分类号: G03F7/0045 Y10S430/106

    摘要: A radiation sensitive composition comprising a film-forming resin and a bis(sulfonyl)diazomethane compound of the following formula (1) or (2): ##STR1## wherein each of R.sup.1 and R.sup.3 is a linear, branched or cyclic alkyl group which may be substituted, R.sup.2 is a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group, and each of R.sup.4, R.sup.5 and R.sup.6 which are independent of one another, is a linear, branched or cyclic alkyl group which may be substituted, a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group.

    摘要翻译: 一种辐射敏感性组合物,其包含成膜树脂和下式(1)或(2)的双(磺酰基)重氮甲烷化合物:其中R 1和R 3各自为可被取代的直链,支链或环状烷基, R 2为卤素原子,可以被取代的烷氧基,硝基,氰基,腈基或酰胺基,R 4,R 5和R 6各自独立地为直链状,支链状 或可被取代的环状烷基,卤素原子,可被取代的烷氧基,硝基,氰基,腈基或酰胺基。