利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

15 条记录 (耗时 0.056 秒)

    Charged-particle-beam exposure device and method capable of high-speed data reading
    8.
    发明授权
    Charged-particle-beam exposure device and method capable of high-speed data reading 失效
    带电粒子束曝光装置和方法能够进行高速数据读取

    公开(公告)号：US6072185A

    公开(公告)日：2000-06-06

    申请号：US971917

    申请日：1997-11-18

    申请人： Soichiro Arai ,  Kenichi Miyazawa ,  Hidefumi Yabara ,  Hiroshi Yasuda

    发明人： Soichiro Arai ,  Kenichi Miyazawa ,  Hidefumi Yabara ,  Hiroshi Yasuda

    IPC分类号： G03F7/20 ,  G06F5/00 ,  H01J37/302 ,  H01J37/317 ,  H01L21/027 ,  H01J37/304

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/31762

    摘要： A device exposing a wafer to charged-particle beams in an exposure process generates a plurality of micro beams and controls deflection of each of the micro beams, relative to whether or not the micro beams reach the wafer, in accordance with control data. A data processing unit inserts data-position-adjustment data into the control data for each exposure. A first data-storage unit stores the control data, inserted with the data-position-adjustment data, and outputs the control data at a time of the exposure process. Storage positions of the control data in the first data-storage unit are adjusted by the data-position-adjustment data so that the control data can be continuously read from the first data-storage unit for maintaining a continuous exposure process.

    摘要翻译： 根据控制数据，在曝光处理中将晶片暴露于带电粒子束的装置产生多个微束并相对于微束是否到达晶片来控制每个微束的偏转。 数据处理单元将数据位置调整数据插入到每次曝光的控制数据中。 第一数据存储单元存储插入数据位置调整数据的控制数据，并在曝光处理时输出控制数据。 通过数据位置调整数据来调整第一数据存储单元中的控制数据的存储位置，使得能够从第一数据存储单元连续读取控制数据，以保持连续曝光处理。

    Method and system for changed particle beam exposure
    9.
    发明授权
    Method and system for changed particle beam exposure 失效
    带电粒子束曝光的方法和系统

    公开(公告)号：US5910658A

    公开(公告)日：1999-06-08

    申请号：US27470

    申请日：1998-02-20

    申请人： Soichiro Arai ,  Kenichi Miyazawa ,  Hidefumi Yabara ,  Hiroshi Yasuda ,  Takayuki Nakatani

    发明人： Soichiro Arai ,  Kenichi Miyazawa ,  Hidefumi Yabara ,  Hiroshi Yasuda ,  Takayuki Nakatani

    IPC分类号： H01J37/305 ,  G03F7/20 ,  H01J37/04 ,  H01J37/317 ,  H01L21/027 ,  H01J37/302

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/2059 ,  H01J37/045 ,  H01J37/3174 ,  H01J2237/0435

    摘要： Adjusting variable delay circuit 311, receiving signal S1, is connected to the input of drive circuit 312. A time point t1, when the output potential of drive circuit 312 traverses reference potential VA between the potential Va of traveling wave V1F of the output potential and 0 V, is detected by comparator 52 for detecting the front edge of V1F, detecting variable delay circuit 50 for delaying signal S1 and D flip-flop 51 for holding the output of comparator 52 at the timing of front edge of the signal outputted from delay circuit 50. A time point t2, when the output potential of drive circuit 312 traverses reference potential VB between the superimposed potential of traveling wave V1F and reflected wave V1B and VA, is detected by comparator 62 for detecting the front edge of V1B, detecting variable delay circuit 60 for delaying signal S1 and D flip-flop 61 for holding the output of comparator 62 at the timing of front edge of the signal outputted from delay circuit 60. The delay time of adjusting variable delay circuit 311 is set so that value {t1+(t2-t1)/2} becomes substantially same as to all the output potentials of drive circuit 31 and so on.

    摘要翻译： 调节可变延迟电路311，接收信号S1连接到驱动电路312的输入端。时间点t1，当驱动电路312的输出电位在输出电位的行波V1F的电位Va和 0 V被比较器52检测，用于检测V1F的前沿，检测可变延迟电路50用于延迟信号S1和D触发器51，用于保持比较器52的输出在从延迟输出的信号的前沿的定时 当驱动电路312的输出电位在行波V1F和反射波V1B与VA之间的叠加电位之间经过参考电位VB时，由比较器62检测V1B的前沿，检测变量 延迟电路60，用于在从延迟电路60输出的信号的前沿的定时处延迟用于保持比较器62的输出的信号S1和D触发器61.延迟时间 设定调节可变延迟电路311的e值使得值{t1 +（t2-t1）/ 2}与驱动电路31的所有输出电位等基本相同。

    Charged particle beam exposure method and charged particle beam exposure apparatus
    10.
    发明授权
    Charged particle beam exposure method and charged particle beam exposure apparatus 失效
    带电粒子束曝光方法和带电粒子束曝光装置

    公开(公告)号：US5808313A

    公开(公告)日：1998-09-15

    申请号：US892976

    申请日：1997-07-15

    申请人： Akio Yamada ,  Hiroshi Yasuda ,  Hidefumi Yabara ,  Atsushi Saito

    发明人： Akio Yamada ,  Hiroshi Yasuda ,  Hidefumi Yabara ,  Atsushi Saito

    IPC分类号： H01L21/027 ,  H01J37/304 ,  H01J37/317 ,  H01J37/00

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174

    摘要： The object of the present invention is to ensure a correct exposure even when a single exposure apparatus is used to expose a predetermined pattern, and an exposure apparatus therefor. According to the present invention, a charged particle beam exposure method, wherein a charged particle beam having a predetermined shape is irradiated to a sample to have the surface of the sample be exposed, comprises the steps of: storing a record of a first quantity of reflected electrons or a first sample current, which is detected in accordance with the charged particle beam irradiatd to the sample when a first exposure pattern is formed in a first area of the sample; and comparing a second quantity of reflected electrons or a second sample current, which is detected in accordance with the charged particle beam irradiated to the sample when the first exposure pattern is formed in a second area of the sample, with the first quantity of the reflected electrons or the first sample current which is stored when the first area is exposed, and generating a matched or unmatched signal therefor.

    摘要翻译： 本发明的目的在于即使使用单一的曝光装置来曝光预定图案也能确保正确的曝光及其曝光装置。 根据本发明，一种带电粒子束曝光方法，其中对样品照射具有预定形状的带电粒子束以暴露样品的表面，包括以下步骤：将第一量的 反射电子或第一样品电流，当在样品的第一区域中形成第一曝光图案时，其根据被照射到样品的带电粒子束来检测; 并且比较第二量的反射电子或第二样品电流，其在样品的第二区域中形成第一曝光图案时根据照射到样品的带电粒子束检测到的第一数量的反射电子或第二样品电流， 电子或第一采样电流，其在第一区域被暴露时存储，并且产生匹配或不匹配的信号。