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185 条记录 (耗时 0.036 秒)

    Top Coating Composition
    1.
    发明申请
    Top Coating Composition 有权
    顶涂层组成

    公开(公告)号：US20120040294A1

    公开(公告)日：2012-02-16

    申请号：US13264285

    申请日：2010-04-20

    申请人： Kazuhiko Maeda ,  Takamasa Kitamoto ,  Haruhiko Komoriya ,  Satoru Narizuka ,  Yoshimi Isono ,  Kazunori Mori

    发明人： Kazuhiko Maeda ,  Takamasa Kitamoto ,  Haruhiko Komoriya ,  Satoru Narizuka ,  Yoshimi Isono ,  Kazunori Mori

    IPC分类号： G03F7/20 ,  C08K5/05 ,  C09D135/02

    CPC分类号： C08F20/22 ,  G03F7/11 ,  G03F7/2041

    摘要： Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, R1 represents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, R2 represents a heat-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.]

    摘要翻译： 公开了一种形成在抗蚀剂膜上的用于保护抗蚀剂膜的顶部涂料组合物，该顶部涂料组合物是用于光致抗蚀剂的顶部涂料组合物，其特征在于含有具有由以下通式（1）表示的重复单元的含氟聚合物 ）。 该组合物能够控制显影溶液的溶解度并具有高斥水性。 [式中，R1表示氢原子，氟原子，甲基或三氟甲基，R2表示热不稳定保护基，R3表示氟原子或含氟烷基，W表示二价连接基。

    Water Repellent Additive for Immersion Resist
    2.
    发明申请
    Water Repellent Additive for Immersion Resist 审中-公开
    防水添加剂

    公开(公告)号：US20120064459A1

    公开(公告)日：2012-03-15

    申请号：US13320871

    申请日：2010-05-14

    申请人： Kazuhiko Maeda ,  Takamasa Kitamoto ,  Haruhiko Komoriya ,  Satoru Narizuka ,  Yoshimi Isono ,  Kazunori Mori

    发明人： Kazuhiko Maeda ,  Takamasa Kitamoto ,  Haruhiko Komoriya ,  Satoru Narizuka ,  Yoshimi Isono ,  Kazunori Mori

    IPC分类号： G03F7/039 ,  C08F20/22 ,  G03F7/38

    CPC分类号： G03F7/20 ,  C08F20/26 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： Disclosed is a water repellent additive for an immersion resist, which is composed of a fluorine-containing polymer that has a repeating unit represented by general formula (1). By adding the water repellent additive to a resist composition, the resist composition can be controlled to have high water repellency during exposure and to exhibit improved solubility in a developing solution during development. [In the formula, R1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; R2 represents a heat-labile protecting group; R3 represents a fluorine atom or a fluorine-containing alkyl group; and W represents a divalent linking group.]

    摘要翻译： 公开了一种浸渍抗蚀剂的防水添加剂，其由具有由通式（1）表示的重复单元的含氟聚合物组成。 通过将防水添加剂添加到抗蚀剂组合物中，可以将抗蚀剂组合物控制为在曝光期间具有高的拒水性，并且在显影期间在显影液中表现出改善的溶解性。 [式中，R 1表示氢原子，氟原子，甲基或三氟甲基。 R2代表热不稳定保护基; R3表示氟原子或含氟烷基; W表示二价连接基。]

    Top coating composition
    3.
    发明授权
    Top coating composition 有权
    顶涂层组成

    公开(公告)号：US08663903B2

    公开(公告)日：2014-03-04

    申请号：US13264285

    申请日：2010-04-20

    申请人： Kazuhiko Maeda ,  Takamasa Kitamoto ,  Haruhiko Komoriya ,  Satoru Narizuka ,  Yoshimi Isono ,  Kazunori Mori

    发明人： Kazuhiko Maeda ,  Takamasa Kitamoto ,  Haruhiko Komoriya ,  Satoru Narizuka ,  Yoshimi Isono ,  Kazunori Mori

    IPC分类号： G03F7/11 ,  C08F20/22

    CPC分类号： C08F20/22 ,  G03F7/11 ,  G03F7/2041

    摘要： Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, R1 represents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, R2 represents a heat-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.]

    摘要翻译： 公开了一种形成在抗蚀剂膜上的用于保护抗蚀剂膜的顶部涂料组合物，该顶部涂料组合物是用于光致抗蚀剂的顶部涂料组合物，其特征在于含有具有由以下通式（1）表示的重复单元的含氟聚合物 ）。 该组合物能够控制显影溶液的溶解度并具有高斥水性。 [式中，R1表示氢原子，氟原子，甲基或三氟甲基，R2表示热不稳定保护基，R3表示氟原子或含氟烷基，W表示二价连接基。

    Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent
    8.
    发明申请
    Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent 有权
    新型磺酸盐及其衍生物，光酸发生剂和抗光材料和图案形成方法使用光酸发生剂

    公开(公告)号：US20100304303A1

    公开(公告)日：2010-12-02

    申请号：US12740780

    申请日：2008-10-31

    申请人： Kazuhiko Maeda ,  Yoshimi Isono ,  Satoru Narizuka

    发明人： Kazuhiko Maeda ,  Yoshimi Isono ,  Satoru Narizuka

    IPC分类号： G03F7/004 ,  C07C271/24 ,  G03F7/20

    CPC分类号： C07C309/59 ,  C07C309/12 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D207/46 ,  C09D133/14 ,  C09D133/16 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A). In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.

    摘要翻译： 公开了具有由以下通式（A）表示的结构的氟化磺酸盐或含氟磺酸基化合物。 在该式中，n表示1〜10的整数， R表示取代或未取代的C1-C20直链，支链或环状烷基，取代或未取代的C1-C20直链，支链或环状烯基，取代或未取代的C6-C15芳基或C4-C15杂芳基; a表示1或0.含有上述含氟磺酸盐或含氟磺酸基的化合物的光酸产生剂对ArF准分子激光等具有高灵敏度，不关于人体积累，可产生酸（ 光酸），并且在抗蚀剂溶剂中表现出高溶解性和与抗蚀剂树脂的良好相容性。

    Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent
    9.
    发明授权
    Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent 有权
    磺酸盐及其衍生物，光酸发生剂，以及使用光致酸发生剂的抗蚀剂材料和图案形成方法

    公开(公告)号：US08283106B2

    公开(公告)日：2012-10-09

    申请号：US12740780

    申请日：2008-10-31

    申请人： Kazuhiko Maeda ,  Yoshimi Isono ,  Satoru Narizuka

    发明人： Kazuhiko Maeda ,  Yoshimi Isono ,  Satoru Narizuka

    IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C271/24 ,  C07C309/15

    CPC分类号： C07C309/59 ,  C07C309/12 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D207/46 ,  C09D133/14 ,  C09D133/16 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A). In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.

    摘要翻译： 公开了具有由以下通式（A）表示的结构的氟化磺酸盐或含氟磺酸基化合物。 在该式中，n表示1〜10的整数， R表示取代或未取代的C1-C20直链，支链或环状烷基，取代或未取代的C1-C20直链，支链或环状烯基，取代或未取代的C6-C15芳基或C4-C15杂芳基; a表示1或0.含有上述含氟磺酸盐或含氟磺酸基的化合物的光酸产生剂对ArF准分子激光等具有高灵敏度，不关于人体积累，可产生酸（ 光酸），并且在抗蚀剂溶剂中表现出高溶解性和与抗蚀剂树脂的良好相容性。